Patents by Inventor Peter C. STAFFANSSON

Peter C. STAFFANSSON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for automated critical dimension measurement on a substrate for display manufacturing, method of inspecting a large area substrate for display manufacturing, apparatus for inspecting a large area substrate for display manufacturing and method of operating thereof
    Patent number: 11687008
    Abstract: According to an embodiment, a method for automated critical dimension measurement on a substrate for display manufacturing is provided. The method includes scanning a first field of view having a first size with a charged particle beam to obtain a first image having a first resolution of a first portion of the substrate for display manufacturing; determining a pattern within the first image, the pattern having a first position; scanning a second field of view with the charged particle beam to obtain a second image of a second portion of the substrate, the second field of view has a second size smaller than the first size and has a second position provided relative to the first position, the second image has a second resolution higher than the first resolution; and determining a critical dimension of a structure provided on the substrate from the second image.
    Type: Grant
    Filed: February 22, 2018
    Date of Patent: June 27, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Bernhard G. Mueller, Robert Trauner, Bernhard Schüler, Peter C. Staffansson, Kulpreet Singh Virdi, Volker Daiker
  • METHOD FOR AUTOMATED CRITICAL DIMENSION MEASUREMENT ON A SUBSTRATE FOR DISPLAY MANUFACTURING, METHOD OF INSPECTING A LARGE AREA SUBSTRATE FOR DISPLAY MANUFACTURING, APPARATUS FOR INSPECTING A LARGE AREA SUBSTRATE FOR DISPLAY MANUFACTURING AND METHOD OF OPERATING THEREOF
    Publication number: 20210373444
    Abstract: According to an embodiment, a method for automated critical dimension measurement on a substrate for display manufacturing is provided. The method includes scanning a first field of view having a first size with a charged particle beam to obtain a first image having a first resolution of a first portion of the substrate for display manufacturing; determining a pattern within the first image, the pattern having a first position; scanning a second field of view with the charged particle beam to obtain a second image of a second portion of the substrate, the second field of view has a second size smaller than the first size and has a second position provided relative to the first position, the second image has a second resolution higher than the first resolution; and determining a critical dimension of a structure provided on the substrate from the second image.
    Type: Application
    Filed: February 22, 2018
    Publication date: December 2, 2021
    Inventors: Bernhard G. MUELLER, Robert TRAUNER, Bernhard SCHÜLER, Peter C. STAFFANSSON, Kulpreet Singh VIRDI, Volker DAIKER