Abstract: An inertial measurement apparatus has a movable proof mass and at least one electrode with a plurality of fingers that extend at non-right angles relative to an axis of motion of the proof mass. Multiple electrodes may be utilized with the same proof mass, with each of the electrodes having electrode fingers that extend at non-right angles relative to the axis of motion of the proof mass. A single-gap shock stop structure improves vibration immunity of micro-machined in-plane sensors. The angle of the electrode fingers creates a different effective gap to reduce the probability of contact between the proof mass and the electrode during extreme operational conditions.

Abstract: A semiconductor manufacturing process enables a complex multi-layer, silicon based MEMS devices, such as a gyroscope or accelerometer to be formed without using Silicon On Insulator (SOI) substrates and obviates the need to purchase and use SOI wafers as starting materials. The disclosed techniques further allows the etching of the sacrificial oxide to be “head started” prior to fusion bonding, thereby reducing the amount of release etching required at the end of the MEMS wafer processing.

Abstract: Method and apparatus for producing glancing angle deposited thin films. There is a source of collimated vapour flux, the source of collimated vapour flux having a deposition field; and a travelling substrate disposed within the deposition field of the source of collimated vapour flux, the collimated vapor flux being collimated at a defined non-zero angle to a normal to the travelling substrate.