Patents by Inventor Peter Christiaan Tiemeijer
Peter Christiaan Tiemeijer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11587759Abstract: The invention relates to a method for electron microscopy. The method comprises providing an electron microscope, generating an electron beam and an image beam, adjusting one of the beam and of the beam and the image beam to reduce off-axial aberrations and correcting a diffraction pattern of the resulting modified beam. The invention also relates to a method for reducing throughput time in a sample image acquisition session in transmission electron microscopy. The method comprises providing an electron microscope, generating a beam and an image beam, adjusting one of the two to reduce off-axial aberrations and filtering the resulting modified image beam. The invention further relates to an electron microscope and to a non-transient computer-readable medium with a computer program for carrying out the methods.Type: GrantFiled: December 20, 2018Date of Patent: February 21, 2023Assignee: FEI CompanyInventors: Maarten Bischoff, Peter Christiaan Tiemeijer, Tjerk Gerrit Spanjer, Stan Johan Pieter Konings
-
Publication number: 20230005733Abstract: An energy spectrometer with dynamic focus for a transmission electron microscope (TEM) is disclosed herein. An example energy spectrometer and TEM at least includes a charged particle column including a projection system arranged after a sample plane, the projection system is operated in a first configuration; an energy spectrometer coupled to the charged particle column to acquire one or more energy loss spectra. The energy spectrometer including a dispersive element, a bias tube, optics for magnifying the energy loss spectrum and for correcting aberrations, and a detector arranged conjugate to a spectrum plane of the energy spectrometer, wherein the energy spectrometer further includes an optical element electrically biased to refocus at least a portion of a spectrum onto the detector, and wherein the value of the electrical bias is at least partially based on the first configuration of the charged particle column.Type: ApplicationFiled: June 30, 2021Publication date: January 5, 2023Applicant: FEI CompanyInventors: Arthur Reinout HARTONG, Alexander HENSTRA, Sorin LAZAR, Peter Christiaan TIEMEIJER
-
Publication number: 20220317067Abstract: Molecular structure of a crystal may be solved based on at least two diffraction tilt series acquired from a sample. The two diffraction tilt series include multiple diffraction patterns of at least one crystal of the sample acquired at different electron doses. In some examples, the two diffraction tilt series are acquired at different magnifications.Type: ApplicationFiled: March 31, 2021Publication date: October 6, 2022Applicant: FEI CompanyInventors: Bart BUIJSSE, Hans RAAIJMAKERS, Peter Christiaan TIEMEIJER
-
Patent number: 11450505Abstract: An adjustable magnetic field free objective lens for a charged particle microscope is disclosed herein. An example charged particle microscope at least includes first and second optical elements arranged on opposing sides of a sample plane, a third optical element arranged around the sample plane, and a controller coupled to control the first, second and third optical elements. The controller coupled to excite the first and second optical elements to generate first and second magnetic lenses, the first and second magnetic lenses formed on opposing sides of the sample plane and oriented in the same direction, and excite the third optical element to generate a third magnetic lens at the sample plane that is oriented in an opposite direction, where a ratio of the excitation of the third optical element to the excitation of the first and second optical elements adjusts a magnetic field at the sample plane.Type: GrantFiled: December 22, 2020Date of Patent: September 20, 2022Assignee: FEI CompanyInventors: Alexander Henstra, Ali Mohammadi-Gheidari, Peter Christiaan Tiemeijer
-
Publication number: 20220199353Abstract: An adjustable magnetic field free objective lens for a charged particle microscope is disclosed herein. An example charged particle microscope at least includes first and second optical elements arranged on opposing sides of a sample plane, a third optical element arranged around the sample plane, and a controller coupled to control the first, second and third optical elements. The controller coupled to excite the first and second optical elements to generate first and second magnetic lenses, the first and second magnetic lenses formed on opposing sides of the sample plane and oriented in the same direction, and excite the third optical element to generate a third magnetic lens at the sample plane that is oriented in an opposite direction, where a ratio of the excitation of the third optical element to the excitation of the first and second optical elements adjusts a magnetic field at the sample plane.Type: ApplicationFiled: December 22, 2020Publication date: June 23, 2022Applicant: FEI CompanyInventors: Alexander Henstra, Ali Mohammadi-Gheidari, Peter Christiaan Tiemeijer
-
Publication number: 20220148849Abstract: The disclosure relates to a method of determining an energy width of a charged particle beam, comprising the steps of providing a charged particle beam, directing said beam towards a specimen, and forming an energy-dispersed beam from a flux of charged particles transmitted through the specimen. As defined herein, the method comprises the steps of providing a slit element in a slit plane, and using said slit element for blocking a part of said energy-dispersed beam, as well as the step of modifying said energy-dispersed beam at the location of said slit plane in such a way that said energy dispersed beam is partially blocked at said slit element. The unblocked part of said energy-dispersed beam is imaged and an intensity gradient of said imaged energy-dispersed beam is determined, with which the energy width of the charged particle beam can be determined.Type: ApplicationFiled: November 10, 2021Publication date: May 12, 2022Applicant: FEI CompanyInventor: Peter Christiaan Tiemeijer
-
Publication number: 20210305013Abstract: The invention relates to a transmission charged particle microscope comprising a charged particle beam source for emitting a charged particle beam, a sample holder for holding a sample, an illuminator for directing the charged particle beam emitted from the charged particle beam source onto the sample, and a control unit for controlling operations of the transmission charged particle microscope. As defined herein, the transmission charged particle microscope is arranged for operating in at least two modes that substantially yield a first magnification whilst keeping said diffraction pattern substantially in focus. Said at least two modes comprise a first mode having first settings of a final projector lens of a projecting system; and a second mode having second settings of said final projector lens.Type: ApplicationFiled: March 26, 2021Publication date: September 30, 2021Applicant: FEI CompanyInventor: Peter Christiaan Tiemeijer
-
Patent number: 11114271Abstract: Correctors for correcting axial aberrations of a particle-optical lens in a charged particle microscope system, according to the present disclosure include a first primary multipole that generates a first primary multipole field when a first excitation is applied to the first primary multipole, and a second primary multipole that generates a second primary multipole field when a second excitation is applied to the second primary multipole. The first primary multipole is not imaged onto the second primary multipole such that a combination fourth-order aberration is created. The correctors further include a secondary multipole for correcting the fourth-order aberration and the sixth-order aberration. Such correctors may further include a tertiary multipole for correcting an eighth-order aberration.Type: GrantFiled: November 22, 2019Date of Patent: September 7, 2021Assignee: FEI CompanyInventors: Alexander Henstra, Peter Christiaan Tiemeijer, Marcel Niestadt
-
Publication number: 20210272767Abstract: The invention relates to a method for electron microscopy. The method comprises providing an electron microscope, generating an electron beam and an image beam, adjusting one of the beam and of the beam and the image beam to reduce off-axial aberrations and correcting a diffraction pattern of the resulting modified beam. The invention also relates to a method for reducing throughput time in a sample image acquisition session in transmission electron microscopy. The method comprises providing an electron microscope, generating a beam and an image beam, adjusting one of the two to reduce off-axial aberrations and filtering the resulting modified image beam. The invention further relates to an electron microscope and to a non-transient computer-readable medium with a computer program for carrying out the methods.Type: ApplicationFiled: December 20, 2018Publication date: September 2, 2021Applicant: FEI CompanyInventors: Maarten BISCHOFF, Peter Christiaan TIEMEIJER, Tjerk Gerrit SPANJER, Stan Johan Pieter KONINGS
-
Patent number: 11024483Abstract: A transmission charged particle microscope includes a specimen holder for holding a specimen; a source for producing a charged particle beam; an illuminator for directing said beam to irradiate the specimen, wherein the illuminator comprising a monochromator and a condenser lens assembly; and an imaging system for receiving a flux of charged particles transmitted through the specimen. The microscope is controlled to produce a first energy spread of an emerging beam exiting said aperture by selecting at least one of parameters (a) an excitation of a first lens of said condenser lens assembly and (b) a width of a condenser aperture downstream of said first lens.Type: GrantFiled: November 21, 2018Date of Patent: June 1, 2021Assignee: FEI CompanyInventor: Peter Christiaan Tiemeijer
-
Publication number: 20210159044Abstract: Correctors for correcting axial aberrations of a particle-optical lens in a charged particle microscope system, according to the present disclosure include a first primary multipole that generates a first primary multipole field when a first excitation is applied to the first primary multipole, and a second primary multipole that generates a second primary multipole field when a second excitation is applied to the second primary multipole. The first primary multipole is not imaged onto the second primary multipole such that a combination fourth-order aberration is created. The correctors further include a secondary multipole for correcting the fourth-order aberration and the sixth-order aberration. Such correctors may further include a tertiary multipole for correcting an eighth-order aberration.Type: ApplicationFiled: November 22, 2019Publication date: May 27, 2021Applicant: FEI CompanyInventors: Alexander Henstra, Peter Christiaan Tiemeijer, Marcel Niestadt
-
Patent number: 10971326Abstract: A multi-electron beam imaging apparatus is disclosed herein. An example apparatus at least includes an electron source for producing a precursor electron beam, an aperture plate comprising an array of apertures for producing an array of electron beams from said precursor electron beam, an electron beam column for directing said array of electron beams onto a specimen, where the electron beam column is configured to have a length less than 300 mm, and where the electron beam column comprises a single individual beam crossover plane in which each of said electron beams forms an intermediate image of said electron source, and a single common beam crossover plane in which the electron beams in the array cross each other.Type: GrantFiled: September 16, 2019Date of Patent: April 6, 2021Assignee: FEI CompanyInventors: Ali Mohammadi-Gheidari, Peter Christiaan Tiemeijer, Erik Rene Kieft, Gerard Nicolaas Anne van Veen
-
Patent number: 10923308Abstract: Various methods and systems are provided for generating an energy resolved chroma image of a sample. Upon irradiated by a charged particle beam, scattered charged particles from the sample are directed to form a first image before entering a spectrometer. The scattered charged particles are then dispersed based on their energy when passing through the spectrometer. The dispersed particles form a second image on a detector. The scattered particles at each location of the first image is spread along a corresponding energy spread vector in the second image.Type: GrantFiled: November 7, 2019Date of Patent: February 16, 2021Assignee: FEI CompanyInventors: Yuchen Deng, Peter Christiaan Tiemeijer, Holger Kohr, Jaydeep Sanjay Belapure
-
Patent number: 10832901Abstract: A method of performing Electron Energy-Loss Spectroscopy (EELS) in an electron microscope, comprising: Producing a beam of electrons from a source; Using an illuminator to direct said beam so as to irradiate the specimen; Using an imaging system to receive a flux of electrons transmitted through the specimen and direct it onto a spectroscopic apparatus comprising: A dispersion device, for dispersing said flux in a dispersion direction so as to form an EELS spectrum; and A detector, comprising a detection surface that is sub-divided into a plurality of detection zones, specifically comprising: Using at least a first detection zone, a second detection zone and a third detection zone to register a plurality of EELS spectral entities; and Reading out said first and said second detection zones whilst said third detection zone is registering one of said plurality of EELS spectral entities.Type: GrantFiled: May 28, 2019Date of Patent: November 10, 2020Assignee: FEI CompanyInventors: Bert Henning Freitag, Sorin Lazar, Stephan Kujawa, Maarten Kuijper, Gerard Nicolaas Anne van Veen, Peter Christiaan Tiemeijer, Jamie McCormack
-
Publication number: 20200090899Abstract: A multi-electron beam imaging apparatus is disclosed herein. An example apparatus at least includes an electron source for producing a precursor electron beam, an aperture plate comprising an array of apertures for producing an array of electron beams from said precursor electron beam, an electron beam column for directing said array of electron beams onto a specimen, where the electron beam column is configured to have a length less than 300 mm, and where the electron beam column comprises a single individual beam crossover plane in which each of said electron beams forms an intermediate image of said electron source, and a single common beam crossover plane in which the electron beams in the array cross each other.Type: ApplicationFiled: September 16, 2019Publication date: March 19, 2020Applicant: FEI CompanyInventors: Ali Mohammadi-Gheidari, Peter Christiaan Tiemeijer, Erik Rene Kieft, Gerard Nicolaas Anne van Veen
-
Patent number: 10559448Abstract: A method of using a Transmission Charged Particle Microscope comprising: A specimen holder, for holding a specimen; A source, for producing a beam of charged particles; An illuminator, for directing said beam so as to irradiate the specimen; An imaging system, for receiving a flux of charged particles transmitted through the specimen and directing it onto a sensing device; A controller, for controlling at least some operational aspects of the microscope, in which method the sensing device is chosen to be an EELS/EFTEM module comprising: An entrance plane; An image plane, where in EELS mode an EELS spectrum is formed and in EFTEM mode an EFTEM image is formed; A slit plane between said entrance plane and image plane, where in EFTEM mode an energy dispersed focus is formed; A dispersing device, between said entrance plane and slit plane, for dispersing an incoming beam into an energy-dispersed beam with an associated dispersion direction; A first series of quadrupoles between said dispersing device and sliType: GrantFiled: December 5, 2018Date of Patent: February 11, 2020Assignee: FEI CompanyInventors: Alexander Henstra, Peter Christiaan Tiemeijer
-
Patent number: 10522323Abstract: Adjustable resolution electron energy loss spectroscopy methods and apparatus are disclosed herein. An example method includes operating an electron microscope in a first state, the first state including operating a source of the electron microscope at a first temperature, obtaining, by the electron microscope, a first EELS spectrum of a sample at a first resolution, the first resolution based on the first temperature, operating the electron microscope in a second state, the second state including operating the source of the electron microscope at a second temperature, the second temperature different than the first temperature, and obtaining, by the electron microscope, a second EELS spectrum of the sample at a second resolution, the second resolution based on the second temperature, wherein the second resolution is different than the first resolution.Type: GrantFiled: April 5, 2018Date of Patent: December 31, 2019Assignee: FEI CompanyInventor: Peter Christiaan Tiemeijer
-
Publication number: 20190378680Abstract: A method of using a Transmission Charged Particle Microscope comprising: A specimen holder, for holding a specimen; A source, for producing a beam of charged particles; An illuminator, for directing said beam along an optical axis so as to irradiate the specimen, the illuminator comprising: a monochromator, which is configured to produce an output beam with a given energy spread ?E0; and a condenser lens assembly; An imaging system, for receiving a flux of charged particles transmitted through the specimen and directing it onto a sensing device; A controller, for controlling at least some operational aspects of the microscope, comprising the following steps: In a first use session, selecting at least one of: (a) an excitation of a first lens of said condenser lens assembly; (b) a width of a condenser aperture downstream of said first lens, so as to produce a first width W1—and associated first energy spread ?E1—of an emerging beam exiting said aperture; In a second use session, selecting at least oneType: ApplicationFiled: November 21, 2018Publication date: December 12, 2019Inventor: Peter Christiaan Tiemeijer
-
Publication number: 20190341243Abstract: A method of performing Electron Energy-Loss Spectroscopy (EELS) in an electron microscope, comprising: Producing a beam of electrons from a source; Using an illuminator to direct said beam so as to irradiate the specimen; Using an imaging system to receive a flux of electrons transmitted through the specimen and direct it onto a spectroscopic apparatus comprising: A dispersion device, for dispersing said flux in a dispersion direction so as to form an EELS spectrum; and A detector, comprising a detection surface that is sub-divided into a plurality of detection zones, specifically comprising: Using at least a first detection zone, a second detection zone and a third detection zone to register a plurality of EELS spectral entities; and Reading out said first and said second detection zones whilst said third detection zone is registering one of said plurality of EELS spectral entities.Type: ApplicationFiled: May 28, 2019Publication date: November 7, 2019Applicant: FEI CompanyInventors: Bert Henning Freitag, Sorin Lazar, Stephan Kujawa, Maarten Kuijper, Gerard Nicolaas Anne van Veen, Peter Christiaan Tiemeijer, Jamie McCormack
-
Patent number: 10453647Abstract: A method of operating a charged particle microscope comprising the following steps: Providing a specimen on a specimen holder; Using a source to produce a beam of charged particles that is subject to beam current fluctuations; Employing a beam current sensor, located between said source and specimen holder, to intercept a part of the beam and produce an intercept signal proportional to a current of the intercepted part of the beam, the beam current sensor comprising a hole arranged to pass a beam probe with an associated probe current; Scanning said probe over the specimen, thereby irradiating the specimen with a specimen current, with a dwell time associated with each scanned location on the specimen; Using a detector to detect radiation emanating from the specimen in response to irradiation by said probe, and producing an associated detector signal; Using said intercept signal as input to a compensator to suppress an effect of said current fluctuations in said detector signal, wherein: The beam currentType: GrantFiled: February 16, 2017Date of Patent: October 22, 2019Assignee: FEI COMPANYInventors: Ali Mohammadi-Gheidari, Luigi Mele, Peter Christiaan Tiemeijer, Gerard Nicolaas Anne van Veen, Hendrik Nicolaas Slingerland