Abstract: In a method for determining one or more properties of a substrate, scatterometry spectra can be measured from one or more targets on the substrate. Reconstructions of each of said spectra can be performed to derive one or more values for the property of the substrate, by comparing representations of each of the measured spectra with one or more modeled representations of spectra calculated using variable parameter values. At least one parameter in the reconstruction for each spectrum can be linked to the value of the parameter used in the reconstruction for a different spectrum.

Abstract: A plurality of targets including a second population superimposed on a first population are formed. In the first target the second population has an asymmetry with respect to the first population. In the second target the second population has a different asymmetry with respect to the first population. Reflected radiation is detected from both the targets and used to determine different characteristics of the underlying populations.

Abstract: We describe a peel and present mechanism (10) for use with labelling apparatus such as a label stock cartridge or cassette, or a label printer. The peel and present mechanism is configured to peel labels (18) from label stock (14) having a backing liner (16). The mechanism comprises a first, label stock carrying face bounded by a label-detachment edge (12,20) wherein, in use, said label stock passes in a longitudinal direction over said label stock carrying face and around said label-detachment edge (20) to peel and present labels (18), and wherein said label stock carrying face has a bent transverse surface profile (24) in a transverse direction perpendicular to said longitudinal direction such that, in use, said label stock is bent in said transverse direction whereby, as said label stock passes over said-label detachment edge, said longitudinal direction of said label stock defines a projected path for a label peeled from said label stock by said label-detachment edge.

Abstract: Asymmetry properties of a periodic target on a substrate, such as a grating on a wafer, are determined. An inspection apparatus has a broadband illumination source with illumination beams point mirrored in the pupil plane of a high numerical aperture objective lens. The substrate and target are illuminated via the objective lens from a first direction and a second direction mirror reflected with respect to the plane of the substrate. A quad wedge optical device separately redirects diffraction orders of radiation scattered from the substrate and separates diffraction orders from illumination along each of the first and second directions. For example the zeroth and first orders are separated for each incident direction. After capture in multimode fibers, spectrometers are used to measure the intensity of the separately redirected diffraction orders as a function of wavelength.

Abstract: In a method for determining one or more properties of a substrate, scatterometry spectra can be measured from one or more targets on the substrate. Reconstructions of each of said spectra can be performed to derive one or more values for the property of the substrate, by comparing representations of each of the measured spectra with one or more modeled representations of spectra calculated using variable parameter values. At least one parameter in the reconstruction for each spectrum can be linked to the value of the parameter used in the reconstruction for a different spectrum.

Abstract: A method of measurement of at-resolution overlay offset may be implemented in a scatterometer. At least three targets are provided on a wafer, each target comprising a first marker grating and a second interleaved marker grating and each target having a different overlay bias between its first and second marker. The first and second markers are provided by subsequent lithography steps in a double patterning lithographic process. The targets are measured with a scatterometer and for each target a measured CD of at least one of the markers is determined using reconstruction. The CD of the first marker may be fixed in the reconstruction. The measured CDs and at least one of the overlay biases is used to determine an overlay result corresponding to a minimum measured CD. The overlay result may be determined by fitting a function such as a parabola to the measured CDs and the overlay biases and determining the overlay at the minimum of the fitted function.

Abstract: A plurality of targets including a second population superimposed on a first population are formed. In the first target the second population has an asymmetry with respect to the first population. In the second target the second population has a different asymmetry with respect to the first population. Reflected radiation is detected from both the targets and used to determine different characteristics of the underlying populations.

Abstract: A lithographic apparatus includes an illuminator configured to condition a beam of radiation and a support configured to hold a patterning device. The patterning device is configured to pattern the beam of radiation according to a desired pattern. The lithographic apparatus also includes a substrate table configured to hold a substrate and a projection system configured to project the patterned beam onto a target portion of the substrate to form a patterned image on the substrate. The apparatus further includes a sensor configured and arranged to intercept a portion of the beam and to measure a transmission of the beam through at least a portion of the patterning device.

Abstract: A beverage container (11) comprising a body defining a receptacle, the receptacle having a pouring spout (15) and a handle (17) in opposed relation to the spout (15) to enable the jug (11) to be held such that it can be supported in both an upright and an inverted position, a partition (19) within the receptacle (11) defining a first space (21) having a closed lower end, and a plenum located against the internal face of the jug in opposed relation to the handle and having an opening at its lower end, a removable closure (29) at the lower end of the jug (11) adapted to close the lower end of the plenum.

Abstract: A guide device for a turbine with a guide-blade carrier installed in a turbine housing, preferably the housing of a steam turbine, and equipped with guide blades, includes positioning elements for positioning and fastening the guide blades to the guide-blade carrier and for ensuring a specific installation position of the guide blades. In order to simplify the production of the guide device, two halves of a guide-blade ring divided in the region of a parting plane of the turbine housing serve as the positioning elements. Radially extending profile holes for inserting a guide-blade root of each guide blade are formed in the guide-blade ring. At least one first holding element is preferably releasable and in each case fixes the guide-blade root to the guide-blade ring. At least one second holding element retains each of the two halves of the guide-blade ring on the guide-blade carrier.