Patents by Inventor Peter David ENGBLOM
Peter David ENGBLOM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240111218Abstract: A method of determining a characteristic of one or more processes for manufacturing features on a substrate, the method including: obtaining image data of a plurality of features on a least part of at least one region on a substrate; using the image data to obtain measured data of one or more dimensions of each of at least some of the plurality of features; determining a statistical parameter that is dependent on the variation of the measured data of one or more dimensions of each of at least some of the plurality of features; determining a probability of defective manufacture of features in dependence on a determined number of defective features in the image data; and determining the characteristic of the one or more processes to have the probability of defective manufacture of features and the statistical parameter.Type: ApplicationFiled: November 6, 2023Publication date: April 4, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Wim Tjibbo TEL, Hermanus Adrianus DILLEN, Marc Jurian KEA, Mark John MASLOW, Koen THUIJS, Peter David ENGBLOM, Ralph Timotheus HUIJGEN, Daan Maurits SLOTBOOM, Johannes Catharinus Hubertus MULKENS
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Patent number: 11860548Abstract: A method of determining a characteristic of one or more processes for manufacturing features on a substrate, the method including: obtaining image data of a plurality of features on a least part of at least one region on a substrate; using the image data to obtain measured data of one or more dimensions of each of at least some of the plurality of features; determining a statistical parameter that is dependent on the variation of the measured data of one or more dimensions of each of at least some of the plurality of features; determining a probability of defective manufacture of features in dependence on a determined number of defective features in the image data; and determining the characteristic of the one or more processes to have the probability of defective manufacture of features and the statistical parameter.Type: GrantFiled: February 6, 2020Date of Patent: January 2, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Wim Tjibbo Tel, Hermanus Adrianus Dillen, Marc Jurian Kea, Mark John Maslow, Koen Thuijs, Peter David Engblom, Ralph Timotheus Huijgen, Daan Maurits Slotboom, Johannes Catharinus Hubertus Mulkens
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Patent number: 11703772Abstract: A method including: determining recipe consistencies between one substrate measurement recipe of a plurality of substrate measurement recipes and each other substrate measurement recipe of the plurality of substrate measurement recipes; calculating a function of the recipe consistencies; eliminating the one substrate measurement recipe from the plurality of substrate measurement recipes if the function meets a criterion; and reiterating the determining, calculating and eliminating until a termination condition is met. Also disclosed herein is a substrate measurement apparatus, including a storage configured to store a plurality of substrate measurement recipes, and a processor configured to select one or more substrate measurement recipes from the plurality of substrate measurement recipes based on recipe consistencies among the plurality of substrate measurement recipes.Type: GrantFiled: December 17, 2020Date of Patent: July 18, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Arie Jeffrey Den Boef, Timothy Dugan Davis, Peter David Engblom, Kaustuve Bhattacharyya
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Publication number: 20230176494Abstract: A method for generating an alignment signal that includes detecting local dimensional distortions of an alignment mark and generating the alignment signal based on the alignment mark. The alignment signal is weighted based on the local dimensional distortions of the alignment mark. Detecting the local dimensional distortions can include irradiating the alignment mark with radiation, the alignment mark including a geometric feature, and detecting one or more phase and/or amplitude shifts in reflected radiation from the geometric feature. The one or more phase and/or amplitude shifts correspond to the local dimensional distortions of the geometric feature. A parameter of the radiation, an alignment inspection location within the geometric feature, an alignment inspection location on a layer of a structure, and/or a radiation beam trajectory across the geometric feature may be determined based on the one or more detected phase and/or amplitude shifts.Type: ApplicationFiled: April 22, 2021Publication date: June 8, 2023Applicants: ASML HOLDING N.V., ASML NETHERLANDS B.V.Inventors: Zahrasadat DASTOURI, Igor Matheus Petronella AARTS, Simon Gijsbert Josephus MATHIJISSEN, Peter David ENGBLOM
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Publication number: 20220100098Abstract: A method of determining a characteristic of one or more processes for manufacturing features on a substrate, the method including: obtaining image data of a plurality of features on a least part of at least one region on a substrate; using the image data to obtain measured data of one or more dimensions of each of at least some of the plurality of features; determining a statistical parameter that is dependent on the variation of the measured data of one or more dimensions of each of at least some of the plurality of features; determining a probability of defective manufacture of features in dependence on a determined number of defective features in the image data; and determining the characteristic of the one or more processes to have the probability of defective manufacture of features and the statistical parameter.Type: ApplicationFiled: February 6, 2020Publication date: March 31, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Wim Tjibbo TEL, Hermanus Adrianus DILLEN, Marc Jurian KEA, Mark John MASLOW, Koen THUIJS, Peter David ENGBLOM, Ralph Timotheus HUIJGEN, Daan Maurits SLOTBOOM, Johannes Catharinus Hubertus MULKENS
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Publication number: 20220075276Abstract: A method provides the steps of receiving an image from a metrology tool, determining individual units of said image and discriminating the units which provide accurate metrology values. The images are obtained by measuring the metrology target at multiple wavelengths. The discrimination between the units, when these units are pixels in said image, is based on calculating a degree of similarity between said units.Type: ApplicationFiled: December 24, 2019Publication date: March 10, 2022Applicant: ASML Netherlands B.V.Inventors: Simon Gijsbert Josephus MATHIJSSEN, Marc Johannes NOOT, Kaustuve BHATTACHARYYA, Arie Jeffrey DEN BOEF, Grzegorz GRZELA, Timothy Dugan DAVIS, Olger Victor ZWIER, Ralph Timtheus HUIJGEN, Peter David ENGBLOM, Jan-Willem GEMMINK
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Publication number: 20210103227Abstract: A method including: determining recipe consistencies between one substrate measurement recipe of a plurality of substrate measurement recipes and each other substrate measurement recipe of the plurality of substrate measurement recipes; calculating a function of the recipe consistencies; eliminating the one substrate measurement recipe from the plurality of substrate measurement recipes if the function meets a criterion; and reiterating the determining, calculating and eliminating until a termination condition is met. Also disclosed herein is a substrate measurement apparatus, including a storage configured to store a plurality of substrate measurement recipes, and a processor configured to select one or more substrate measurement recipes from the plurality of substrate measurement recipes based on recipe consistencies among the plurality of substrate measurement recipes.Type: ApplicationFiled: December 17, 2020Publication date: April 8, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Arie Jeffrey DEN BOEF, Timothy Dugan DAVIS, Peter David ENGBLOM, Kaustuve BHATTACHARYYA
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Patent number: 10901330Abstract: A method including: determining recipe consistencies between one substrate measurement recipe of a plurality of substrate measurement recipes and each other substrate measurement recipe of the plurality of substrate measurement recipes; calculating a function of the recipe consistencies; eliminating the one substrate measurement recipe from the plurality of substrate measurement recipes if the function meets a criterion; and reiterating the determining, calculating and eliminating until a termination condition is met. Also disclosed herein is a substrate measurement apparatus, including a storage configured to store a plurality of substrate measurement recipes, and a processor configured to select one or more substrate measurement recipes from the plurality of substrate measurement recipes based on recipe consistencies among the plurality of substrate measurement recipes.Type: GrantFiled: May 21, 2019Date of Patent: January 26, 2021Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Den Boef, Timothy Dugan Davis, Peter David Engblom, Kaustuve Bhattacharyya
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Publication number: 20190271921Abstract: A method including: determining recipe consistencies between one substrate measurement recipe of a plurality of substrate measurement recipes and each other substrate measurement recipe of the plurality of substrate measurement recipes; calculating a function of the recipe consistencies; eliminating the one substrate measurement recipe from the plurality of substrate measurement recipes if the function meets a criterion; and reiterating the determining, calculating and eliminating until a termination condition is met. Also disclosed herein is a substrate measurement apparatus, including a storage configured to store a plurality of substrate measurement recipes, and a processor configured to select one or more substrate measurement recipes from the plurality of substrate measurement recipes based on recipe consistencies among the plurality of substrate measurement recipes.Type: ApplicationFiled: May 21, 2019Publication date: September 5, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Arie Jeffrey Den Boef, Timothy Dugan Davis, Peter David Engblom, Kaustuve Bhattacharyya
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Patent number: 10394137Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.Type: GrantFiled: May 1, 2018Date of Patent: August 27, 2019Assignee: ASML Netherlands B.V.Inventors: Youri Johannes Laurentius Maria Van Dommelen, Peter David Engblom, Lambertus Gerardus Maria Kessels, Arie Jeffrey Den Boef, Kaustuve Bhattacharyya, Paul Christiaan Hinnen, Marco Johannes Annemarie Pieters
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Patent number: 10338484Abstract: A method including: determining recipe consistencies between one substrate measurement recipe of a plurality of substrate measurement recipes and each other substrate measurement recipe of the plurality of substrate measurement recipes; calculating a function of the recipe consistencies; eliminating the one substrate measurement recipe from the plurality of substrate measurement recipes if the function meets a criterion; and reiterating the determining, calculating and eliminating until a termination condition is met. Also disclosed herein is a substrate measurement apparatus, including a storage configured to store a plurality of substrate measurement recipes, and a processor configured to select one or more substrate measurement recipes from the plurality of substrate measurement recipes based on recipe consistencies among the plurality of substrate measurement recipes.Type: GrantFiled: June 13, 2016Date of Patent: July 2, 2019Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Den Boef, Timothy Dugan Davis, Peter David Engblom, Kaustuve Bhattacharyya
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Publication number: 20180253018Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.Type: ApplicationFiled: May 1, 2018Publication date: September 6, 2018Applicant: ASML Netherlands B.V.Inventors: Youri Johannes Laurentius Maria VAN DOMMELEN, Peter David Engblom, Lambertus Gerardus Maria Kessels, Arie Jeffrey Den Boef, Kaustuve Bhattacharyya, Paul Christiaan Hinnen, Marco Johannes Annemarie Pieters
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Patent number: 10001711Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.Type: GrantFiled: November 20, 2014Date of Patent: June 19, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Youri Johannes Laurentius Maria Van Dommelen, Peter David Engblom, Lambertus Gerardus Maria Kessels, Arie Jeffrey Den Boef, Kaustuve Bhattacharyya, Paul Christiaan Hinnen, Marco Johannes Annemarie Pieters
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Publication number: 20160370717Abstract: A method including: determining recipe consistencies between one substrate measurement recipe of a plurality of substrate measurement recipes and each other substrate measurement recipe of the plurality of substrate measurement recipes; calculating a function of the recipe consistencies; eliminating the one substrate measurement recipe from the plurality of substrate measurement recipes if the function meets a criterion; and reiterating the determining, calculating and eliminating until a termination condition is met. Also disclosed herein is a substrate measurement apparatus, including a storage configured to store a plurality of substrate measurement recipes, and a processor configured to select one or more substrate measurement recipes from the plurality of substrate measurement recipes based on recipe consistencies among the plurality of substrate measurement recipes.Type: ApplicationFiled: June 13, 2016Publication date: December 22, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Arie Jeffrey DEN BOEF, Timothy Dugan DAVIS, Peter David ENGBLOM, Kaustuve BHATTACHARYYA
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Publication number: 20160313656Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.Type: ApplicationFiled: November 20, 2014Publication date: October 27, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Youri Johannes Laurentius Maria VAN DOMMELEN, Peter David ENGBLOM, Lambertus Gerardus Maria KESSELS, Arie Jeffrey DEN BOEF, Kaustuve BHATTACHARYYA, Paul Christiaan HINNEN, Marco Johannes Annemarie PIETERS
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Patent number: 9280064Abstract: A method of projecting a pattern from a patterning device onto a substrate using a projection system, the method including using an optical phase adjustment apparatus in the projection system to apply a phase modification to radiation which has been diffracted from an assist feature of the pattern, the phase modification acting to reduce the size of an assist feature image exposed in resist on the substrate or prevent printing of the assist feature image in the resist on the substrate, while maintaining a contribution of the assist feature image to an image enhancement of a functional feature of the pattern.Type: GrantFiled: November 26, 2012Date of Patent: March 8, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Peter David Engblom, Carsten Andreas Köhler, Frank Staals, Laurentius Cornelius De Winter
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Publication number: 20130141706Abstract: A method of projecting a pattern from a patterning device onto a substrate using a projection system, the method including using an optical phase adjustment apparatus in the projection system to apply a phase modification to radiation which has been diffracted from an assist feature of the pattern, the phase modification acting to reduce the size of an assist feature image exposed in resist on the substrate or prevent printing of the assist feature image in the resist on the substrate, while maintaining a contribution of the assist feature image to an image enhancement of a functional feature of the pattern.Type: ApplicationFiled: November 26, 2012Publication date: June 6, 2013Applicant: ASML NETHERLANDS B.V.Inventors: Peter David ENGBLOM, Carsten Andreas KÖHLER, Frank STAALS, Laurentius Cornelius DE WINTER