Patents by Inventor Peter Dress
Peter Dress has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11410858Abstract: An apparatus includes a housing having an elongated chamber, an inlet opening extending into the chamber, and a slit shaped outlet opening. A tube element extends in a longitudinal direction through the chamber and is at least partially transparent to UV radiation. The tube element is arranged in the chamber such that a flow space is formed between the tube element and the wall of the chamber. At least one UV-radiation source in the tube element is arranged to emit UV-radiation in the direction of the flow space and through the outlet opening out of the housing to generate radicals in the liquid and bring the radicals to the substrate surface. Means are provided for adjusting the radiation exiting the outlet opening through the tube element such that the intensity of the radiation increases towards the longitudinal center plane of the chamber.Type: GrantFiled: March 1, 2018Date of Patent: August 9, 2022Assignee: SUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & COInventors: Peter Dress, Uwe Dietze, Peter Grabitz
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Patent number: 11130158Abstract: An apparatus for applying a liquid medium irradiated with UV radiation onto a substrate is disclosed, the apparatus comprising: a housing having an elongated chamber, at least one inlet opening, which opens into the chamber, and at least one slit shaped outlet opening opposite the inlet opening, which extends over the length of the chamber, a tube element, which extends in a longitudinal direction through the chamber, the tube element being at least partially transparent to UV radiation, wherein the tube element is arranged in the chamber such that a flow space is formed between the tube element and the wall of the chamber, the flow space being symmetric with respect to a longitudinal centre plane of the chamber, the longitudinal centre plane dissecting the outlet opening in its middle, and such that the tube element extends into the slit shaped outlet opening in the housing and thereby forms two longitudinally extending outlet slits between the tube element and the housing, and at least one UV-radiation sourType: GrantFiled: August 24, 2016Date of Patent: September 28, 2021Assignee: SUSS MICRO TEC PHOTOMASK EQUIPMENT GMBH & CO KGInventors: Peter Dress, Uwe Dietze, Peter Grabitz
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Patent number: 11090693Abstract: An apparatus for applying a liquid medium irradiated with UV radiation onto a substrate is disclosed, the apparatus comprising: a housing having an elongated chamber, at least one inlet opening, which opens into the chamber, and at least one slit shaped outlet opening opposite the inlet opening, which extends over the length of the chamber, a tube element, which extends in a longitudinal direction through the chamber, the tube element being at least partially transparent to UV radiation, wherein the tube element is arranged in the chamber such that a flow space is formed between the tube element and the wall of the chamber, the flow space being symmetric with respect to a longitudinal centre plane of the chamber, the longitudinal centre plane dissecting the outlet opening in its middle, and such that the tube element extends into the slit shaped outlet opening in the housing and thereby forms two longitudinally extending outlet silts between the tube element and the housing, and at least one UV-radiation sourType: GrantFiled: August 24, 2016Date of Patent: August 17, 2021Assignee: SUSS MICRO TEC PHOTOMASK EQUIPMENT GMBH & CO KGInventors: Peter Dress, Uwe Dietze, Peter Grabitz
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Publication number: 20200075354Abstract: An apparatus for applying a liquid medium irradiated with UV radiation onto a substrate is disclosed.Type: ApplicationFiled: March 1, 2018Publication date: March 5, 2020Inventors: Peter Dress, Uwe Dietze, Peter Grabitz
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Patent number: 10265739Abstract: The application describes several methods and an apparatus for treatment of at least partial areas of a substrate. In said methods, at least one liquid is applied to at least one partial area of the substrate and electromagnetic radiation is introduced into this liquid, in order to achieve a desired effect in accordance with the respective method. In one method, radicals are generated in the liquid by means of UV radiation prior to application of the liquid, wherein generation of the radicals occurs directly before applying the liquid to the substrate, such that at least a portion of the radicals reaches the substrate.Type: GrantFiled: May 18, 2017Date of Patent: April 23, 2019Assignee: SUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO. KGInventors: Uwe Dietze, Peter Dress, SherJang Singh
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Publication number: 20180243802Abstract: An apparatus for applying a liquid medium irradiated with UV radiation onto a substrate is disclosed, the apparatus comprising: a housing having an elongated chamber, at least one inlet opening, which opens into the chamber, and at least one slit shaped outlet opening opposite the inlet opening, which extends over the length of the chamber, a tube element, which extends in a longitudinal direction through the chamber, the tube element being at least partially transparent to UV radiation, wherein the tube element is arranged in the chamber such that a flow space is formed between the tube element and the wall of the chamber, the flow space being symmetric with respect to a longitudinal centre plane of the chamber, the longitudinal centre plane dissecting the outlet opening in its middle, and such that the tube element extends into the slit shaped outlet opening in the housing and thereby forms two longitudinally extending outlet slits between the tube element and the housing, and at least one UV-radiation sourType: ApplicationFiled: August 24, 2016Publication date: August 30, 2018Inventors: Peter Dress, Uwe Dietze, Peter Grabitz
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Publication number: 20180221919Abstract: An apparatus for applying a liquid medium irradiated with UV radiation onto a substrate is disclosed, the apparatus comprising: a housing having an elongated chamber, at least one inlet opening, which opens into the chamber, and at least one slit shaped outlet opening opposite the inlet opening, which extends over the length of the chamber, a tube element, which extends in a longitudinal direction through the chamber, the tube element being at least partially transparent to UV radiation, wherein the tube element is arranged in the chamber such that a flow space is formed between the tube element and the wall of the chamber, the flow space being symmetric with respect to a longitudinal centre plane of the chamber, the longitudinal centre plane dissecting the outlet opening in its middle, and such that the tube element extends into the slit shaped outlet opening in the housing and thereby forms two longitudinally extending outlet silts between the tube element and the housing, and at least one UV-radiation sourType: ApplicationFiled: August 24, 2016Publication date: August 9, 2018Inventors: Peter Dress, Uwe Dietze, Peter Grabitz
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Publication number: 20170320108Abstract: The application describes several methods and an apparatus for treatment of at least partial areas of a substrate. In said methods, at least one liquid is applied to at least one partial area of the substrate and electromagnetic radiation is introduced into this liquid. In order to achieve a desired effect in accordance with the respective method, in one method, radicals are generated in the liquid by means of UV radiation prior to application of the liquid, wherein generation of the radicals occurs directly before applying the liquid to the substrate, such that at least a portion of the radicals reaches the substrate.Type: ApplicationFiled: May 18, 2017Publication date: November 9, 2017Inventors: Uwe Dietze, Peter Dress, Sherjang Sing
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Publication number: 20170252781Abstract: The application describes several methods and an apparatus for treatment of at least partial areas of a substrate. In said methods, at least one liquid is applied to at least one partial area of the substrate and electromagnetic radiation is introduced into this liquid, in order to achieve a desired effect in accordance with the respective method. In one method, radicals are generated in the liquid by means of UV radiation prior to application of the liquid, wherein generation of the radicals occurs directly before applying the liquid to the substrate, such that at least a portion of the radicals reaches the substrate.Type: ApplicationFiled: May 18, 2017Publication date: September 7, 2017Inventors: Uwe Dietze, Peter Dress, Sherjang Sing
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Patent number: 9662684Abstract: The application describes several methods and an apparatus for treatment of a substrate. In those methods, at least one liquid is applied thereto and electromagnetic radiation is generated in the liquid by means of radiation before applying the liquid to the substrate. Electromagnetic radiation is introduced into the film such that at least a portion of the radiation reaches the substrate surface. In another method for changing the surface characteristics of a substrate having an at least partially hydrophobic substrate surface such that at least a portion of said surface gets a hydrophilic surface characteristic, a liquid is applied to at least the partial area of the surface of the substrate, and UV radiation of a predetermined wavelength is guided onto at least the partial area of the surface of said substrate.Type: GrantFiled: March 15, 2010Date of Patent: May 30, 2017Assignee: Suss Microtec Photomask Equipment GmbH & Co. KGInventors: Uwe Dietze, Peter Dress, Sherjang Singh
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Publication number: 20120211024Abstract: The application describes several methods and an apparatus for treatment of at least partial areas of a substrate. In said methods, at least one liquid is applied to at least one partial area of the substrate and electromagnetic radiation is introduced into this liquid, in order to achieve a desired effect in accordance with the respective method. In one method, radicals are generated in the liquid by means of UV radiation prior to application of the liquid, wherein generation of the radicals occurs directly before applying the liquid to the substrate, such that at least a portion of the radicals reaches the substrate.Type: ApplicationFiled: March 15, 2010Publication date: August 23, 2012Applicant: HamaTech APE GmbH & Co. KGInventors: Uwe Dietze, Peter Dress, Sherjang Singh
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Publication number: 20090071503Abstract: A method and device for treating substrates, and a nozzle unit therefore. A liquid film is formed on a local surface area of a substrate that is to be treated by means of a nozzle unit comprised of at least on elongated nozzle arrangement and an ultrasonic or megasonic transducer arrangement disposed adjacent to the nozzle arrangement. The transducer arrangement is composed of a plurality of transducers having different resonant frequencies. At least a portion of the transducer arrangement is brought into contact with the liquid film, and ultrasound or megasound is introduced into the liquid film by the transducer arrangement.Type: ApplicationFiled: October 28, 2005Publication date: March 19, 2009Inventors: Karsten Branz, Peter Dress, Michael Sowa, Thomas Gairing
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Patent number: 7419549Abstract: The aim of the invention is to achieve a rapid, homogeneous application of a liquid with as little force as possible to a substrate. To achieve this, the invention provides a nozzle assembly (22) for applying a liquid to a substrate, said assembly having a nozzle body (26) comprising a plurality of nozzles (36) that are substantially arranged in a line and a guide plate (28) that extends essentially in a vertical direction with a straight lower edge. According to the invention, the nozzles (36) above the lower edge are directed towards the guide plate (28) in such a way that a film of liquid forms on the guide plate (28) and flows over the lower edge (64).Type: GrantFiled: July 10, 2003Date of Patent: September 2, 2008Assignees: Steag HamaTech APE GmbH & Co. KG, Infineon Technologies AGInventors: Anatol Schwersenz, Werner Saule, Andreas Nöring, Peter Dress, Christian Bürgel, Martin Tschinkl, Marlene Strobl
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Publication number: 20070000516Abstract: A device and method for cleaning the edges of substrates, including at least one cleaning head for receiving at least one nozzle element for supplying medium to a substrate. Formed in a main body of the cleaning head are a medium-suctioning port and an adjoining medium-suctioning duct. The cleaning head also has at least one first flange extending from the main body and having a flat side facing the port and extending essentially perpendicular to a surface of the main body containing the port. The nozzle element is provided on the flange and spaced from the main body, and has at least one outlet port opening in the direction that the flat side faces and directed substantially perpendicular thereto. The outlet port is recessed relative to the flat side or is flush therewith. During a cleaning process, the fat side is spaced by 0.05 to 0.5 mm from the substrate surface.Type: ApplicationFiled: October 7, 2004Publication date: January 4, 2007Inventors: Christian Krauss, Karl Appich, Jakob Szekeresch, Peter Dress
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Publication number: 20050220931Abstract: The aim of the invention is to achieve a rapid, homogeneous application of a liquid with as little force as possible to a substrate. To achieve this, the invention provides a nozzle assembly (22) for applying a liquid to a substrate, said assembly having a nozzle body (26) comprising a plurality of nozzles (36) that are substantially arranged in a line and a guide plate (28) that extends essentially in a vertical direction with a straight lower edge. According to the invention, the nozzles (36) above the lower edge are directed towards the guide plate (28) in such a way that a film of liquid forms on the guide plate (28) and flows over the lower edge (64).Type: ApplicationFiled: July 10, 2003Publication date: October 6, 2005Inventors: Anatol Schwersenz, Werner Saule, Andreas Noring, Peter Dress, Christian Burgel, Martin Tschinkl, Marlene Strobl
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Patent number: 6919538Abstract: To increase the temperature homogeneity on the surface of a substrate that is to be thermally treated, a method for thermally treating substrates is provided, according to which the substrate is heated by several separately controllable heating elements. A desired-value profile is predefined for each of said heating elements. The method comprises the following steps: locally-analysed measurement of the temperature of the surface of the substrate that faces away from the heating elements, during the thermal treatment; determination of the temperature inhomogeneities occurring on the substrate surface; definition of new desired-value profiles based on said temperature inhomogeneities; and preparation of the new desired-value profiles for subsequent treatments.Type: GrantFiled: November 28, 2001Date of Patent: July 19, 2005Assignee: Steag HamaTech AGInventors: Jakob Szekeresch, Peter Dress, Uwe Dietze, Werner Saule
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Patent number: 6858088Abstract: To achieve a uniform coating of a substrate, with an apparatus and a method for coating substrates, according to which the substrate is supported on a substrate holder in such a way that a substrate surface that is to be coated is exposed, and the substrate is rotated together with the substrate holder, a cover can be secured to the substrate holder and together with the substrate holder forms a sealed chamber for the substrate.Type: GrantFiled: January 19, 2000Date of Patent: February 22, 2005Assignee: Steag Hama Tech AGInventors: Peter Dress, Karl Appich, Peter Krauss, Jakob Szekeresch, Robert Weihing
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Publication number: 20040195229Abstract: To increase the temperature homogeneity on the surface of a substrate that is to be thermally treated, a method for thermally treating substrates is provided, according to which the substrate is heated by several separately controllable heating elements. A desired-value profile is predefined for each of said heating elements. The method comprises the following steps: locally-analysed measurement of the temperature of the surface of the substrate that faces away from the heating elements, during the thermal treatment; determination of the temperature inhomogeneities occurring on the substrate surface; definition of new desired-value profiles based on said temperature inhomogeneities; and preparation of the new desired-value profiles for subsequent treatments.Type: ApplicationFiled: July 17, 2003Publication date: October 7, 2004Inventors: Jakob Szekeresch, Peter Dress, Uwe Dietze, Werner Saule
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Patent number: 6512207Abstract: A device and method for thermally treating substrates. A substrate is heated by a heating plate to improve thermal homogeneity. The heating plate is heated using a number of separately controlled heating elements. The temperature of the heating elements is measured and the heating process is controlled by a PID controller. In addition, the temperature of the substrate surface facing away from the heating plate is locally measured. The temperature distribution over the substrate surface is determined according to the measured temperatures and set values for the temperature of the individual heating elements are determined and transmitted to the PID controller.Type: GrantFiled: August 23, 2001Date of Patent: January 28, 2003Assignee: Steag HamaTech AGInventors: Peter Dress, Uwe Dietze, Jakob Szekeresch, Robert Weihing
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Patent number: 6385380Abstract: Low concentrations of substances dissolved in liquids are detected by coupling analysis/excitation light into the liquid core of an optical waveguide in the form of a capillary. When the substance of interest is to be excited to cause the emission of fluorescent light, the excitation light is transversely coupled into the hollow core of the waveguide and the generated fluorescent light is kept in the optical path of the waveguide for as long as possible. The invention also contemplates the use, in either an absorption or fluorescence mode, of specially treated fused silica fibers to deliver analysis/excitation light with very short wavelengths into the liquid core of an optical waveguide.Type: GrantFiled: April 19, 1999Date of Patent: May 7, 2002Assignee: World Precision Instruments, Inc.Inventors: Karl Friedrich, Peter Dress, Mathias Belz