Patents by Inventor Peter Ewing

Peter Ewing has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • GeH/Ar plasma chemistry for ion implant productivity enhancement
    Patent number: 11450504
    Abstract: A method for improving the beam current for certain ion beams, and particularly germanium and argon, is disclosed. The use of argon as a second gas has been shown to improve the ionization of germane, allowing the formation of a germanium ion beam of sufficient beam current without the use of a halogen. Additionally, the use of germane as a second gas has been shown to improve the beam current of an argon ion beam.
    Type: Grant
    Filed: September 17, 2020
    Date of Patent: September 20, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Bon-Woong Koo, Ajdin Sarajlic, Ronald Johnson, Nunzio V. Carbone, Peter Ewing, Mervyn Deegan
  • Ion source with tubular cathode
    Patent number: 11424097
    Abstract: Provided herein are approaches for increasing efficiency of ion sources. In some embodiments, an apparatus, such as an ion source, may include a chamber housing having a first end wall and a second end wall, and an extraction plate coupled to at least one of the first end wall and the second end wall. The extraction plate may include an extraction aperture. The apparatus may further include a tubular cathode extending between the first end wall and the second end wall.
    Type: Grant
    Filed: July 8, 2020
    Date of Patent: August 23, 2022
    Assignee: APPLIED Materials, Inc.
    Inventors: Bon-Woong Koo, Svetlana Radovanov, Frank Sinclair, You Chia Li, Peter Ewing, Ajdin Sarajlic, Christopher A. Rowland, Nunzio Carbone
  • GeH/Ar plasma chemistry for ion implant productivity enhancement
    Patent number: 10923309
    Abstract: A method for improving the beam current for certain ion beams, and particularly germanium and argon, is disclosed. The use of argon as a second gas has been shown to improve the ionization of germane, allowing the formation of a germanium ion beam of sufficient beam current without the use of a halogen. Additionally, the use of germane as a second gas has been shown to improve the beam current of an argon ion beam.
    Type: Grant
    Filed: November 1, 2018
    Date of Patent: February 16, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Bon-Woong Koo, Ajdin Sarajlic, Ronald Johnson, Nunzio V. Carbone, Peter Ewing, Mervyn Deegan
  • GeH4/Ar Plasma Chemistry For Ion Implant Productivity Enhancement
    Publication number: 20210005416
    Abstract: A method for improving the beam current for certain ion beams, and particularly germanium and argon, is disclosed. The use of argon as a second gas has been shown to improve the ionization of germane, allowing the formation of a germanium ion beam of sufficient beam current without the use of a halogen. Additionally, the use of germane as a second gas has been shown to improve the beam current of an argon ion beam.
    Type: Application
    Filed: September 17, 2020
    Publication date: January 7, 2021
    Inventors: Bon-Woong Koo, Ajdin Sarajlic, Ronald Johnson, Nunzio V. Carbone, Peter Ewing, Mervyn Deegan
  • ION SOURCE WITH TUBULAR CATHODE
    Publication number: 20200343071
    Abstract: Provided herein are approaches for increasing efficiency of ion sources. In some embodiments, an apparatus, such as an ion source, may include a chamber housing having a first end wall and a second end wall, and an extraction plate coupled to at least one of the first end wall and the second end wall. The extraction plate may include an extraction aperture. The apparatus may further include a tubular cathode extending between the first end wall and the second end wall.
    Type: Application
    Filed: July 8, 2020
    Publication date: October 29, 2020
    Applicant: APPLIED Materials, Inc.
    Inventors: Bon-Woong Koo, Svetlana Radovanov, Frank Sinclair, You Chia Li, Peter Ewing, Ajdin Sarajlic, Christopher A. Rowland, Nunzio Carbone
  • Ion source with tubular cathode
    Patent number: 10748738
    Abstract: Provided herein are approaches for increasing efficiency of ion sources. In some embodiments, an apparatus, such as an ion source, may include a chamber housing having a first end wall and a second end wall, and an extraction plate coupled to at least one of the first end wall and the second end wall. The extraction plate may include an extraction aperture. The apparatus may further include a tubular cathode extending between the first end wall and the second end wall.
    Type: Grant
    Filed: March 18, 2019
    Date of Patent: August 18, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Bon-Woong Koo, Svetlana Radovanov, Frank Sinclair, You Chia Li, Peter Ewing, Ajdin Sarajlic, Christopher A. Rowland, Nunzio Carbone
  • GeH4/Ar Plasma Chemistry For Ion Implant Productivity Enhancement
    Publication number: 20200144018
    Abstract: A method for improving the beam current for certain ion beams, and particularly germanium and argon, is disclosed. The use of argon as a second gas has been shown to improve the ionization of germane, allowing the formation of a germanium ion beam of sufficient beam current without the use of a halogen. Additionally, the use of germane as a second gas has been shown to improve the beam current of an argon ion beam.
    Type: Application
    Filed: November 1, 2018
    Publication date: May 7, 2020
    Inventors: Bon-Woong Koo, Ajdin Sarajlic, Ronald Johnson, Nunzio V. Carbone, Peter Ewing, Mervyn Deegan