Patents by Inventor Peter Fiekowsky

Peter Fiekowsky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8233735
    Abstract: Fluorescently marked targets bind to a substrate 230 synthesized with polymer sequences at known locations. The targets are detected by exposing selected regions of the substrate 230 to light from a light source 100 and detecting the photons from the light fluoresced therefrom, and repeating the steps of exposure and detection until the substrate 230 is completely examined. The resulting data can be used to determine binding affinity of the targets to specific polymer sequences.
    Type: Grant
    Filed: September 17, 2008
    Date of Patent: July 31, 2012
    Assignee: Affymetrix, Inc.
    Inventors: David Stern, Peter Fiekowsky
  • Publication number: 20090010524
    Abstract: Fluorescently marked targets bind to a substrate 230 synthesized with polymer sequences at known locations. The targets are detected by exposing selected regions of the substrate 230 to light from a light source 100 and detecting the photons from the light fluoresced therefrom, and repeating the steps of exposure and detection until the substrate 230 is completely examined. The resulting data can be used to determine binding affinity of the targets to specific polymer sequences.
    Type: Application
    Filed: September 17, 2008
    Publication date: January 8, 2009
    Applicant: Affymetrix, INC.
    Inventors: David Stern, Peter Fiekowsky
  • Publication number: 20080002874
    Abstract: Detecting defects in reference images used for optical inspections reduces false defect detections in the test image. Reference images are presumed perfect, but in practice contain defects. Defects in the reference image are detected by measuring the symmetry or randomness of pixels in the area of the suspected defect in both images. Measurements of the pixel intensity ranges, edge smoothness, and total edge slope in the two images are compared to determine if a suspect defect is actually in the reference image.
    Type: Application
    Filed: June 29, 2006
    Publication date: January 3, 2008
    Inventor: Peter Fiekowsky
  • Publication number: 20060258002
    Abstract: Systems and methods for aligning scanned images are provided. A pattern is included in the scanned image so that when the image is convolved with a filter, a recognizable pattern is generated in the convolved image. The scanned image may then be aligned according to the position of the recognizable pattern in the convolved image. The filter may also act to remove the portions of the scanned image that do not correspond to the pattern in the scanned image.
    Type: Application
    Filed: March 3, 2006
    Publication date: November 16, 2006
    Applicant: Affymetrix, Inc.
    Inventors: Peter Fiekowsky, Dan Bartell, David Stern
  • Publication number: 20060165313
    Abstract: Systems and methods for aligning scanned images are provided. A pattern is included in the scanned image so that when the image is convolved with a filter, a recognizable pattern is generated in the convolved image. The scanned image may then be aligned according to the position of the recognizable pattern in the convolved image. The filter may also act to remove the portions of the scanned image that do not correspond to the pattern in the scanned image.
    Type: Application
    Filed: March 9, 2006
    Publication date: July 27, 2006
    Applicant: Affymetrix, Inc.
    Inventors: Peter Fiekowsky, Dan Bartell
  • Publication number: 20060111850
    Abstract: Fluorescently marked targets bind to a substrate 230 synthesized with polymer sequences at known locations. The targets are detected by exposing selected regions of the substrate 230 to light from a light source 100 and detecting the photons from the light fluoresced therefrom, and repeating the steps of exposure and detection until the substrate 230 is completely examined. The resulting data can be used to determine binding affinity of the targets to specific polymer sequences.
    Type: Application
    Filed: December 30, 2005
    Publication date: May 25, 2006
    Applicant: Affymetrix, Inc.
    Inventors: David Stern, Peter Fiekowsky
  • Publication number: 20050200948
    Abstract: Labeled targets on a support synthesized with polymer sequences at known locations according to the methods disclosed in U.S. Pat. No. 5,143,854 and PCT WO 92/10092 or others, can be detected by exposing selected regions of sample 1500 to radiation from a source 1100 and detecting the emission therefrom, and repeating the steps of exposition and detection until the sample is completely examined.
    Type: Application
    Filed: February 4, 2005
    Publication date: September 15, 2005
    Applicant: Affymetrix, INC.
    Inventors: Mark Trulson, David Stern, Richard Rava, Stephen Fodor, Peter Fiekowsky
  • Publication number: 20050037367
    Abstract: Systems and methods for aligning scanned images are provided. A pattern is included in the scanned image so that when the image is convolved with a filter, a recognizable pattern is generated in the convolved image. The scanned image may then be aligned according to the position of the recognizable pattern in the convolved image. The filter may also act to remove the portions of the scanned image that do not correspond to the pattern in the scanned image.
    Type: Application
    Filed: August 25, 2003
    Publication date: February 17, 2005
    Applicant: AFFYMETRIX, INC., a California corporation
    Inventors: Peter Fiekowsky, Dan Bartell
  • Publication number: 20040196456
    Abstract: Fluorescently marked targets bind to a substrate 230 synthesized with polymer sequences at known locations. The targets are detected by exposing selected regions of the substrate 230 to light from a light source 100 and detecting the photons from the light fluoresced therefrom, and repeating the steps of exposure and detection until the substrate 230 is completely examined. The resulting data can be used to determine binding affinity of the targets to specific polymer sequences.
    Type: Application
    Filed: April 21, 2004
    Publication date: October 7, 2004
    Applicant: Affymetrix, Inc.
    Inventors: David Stern, Peter Fiekowsky
  • Patent number: 6741344
    Abstract: Fluorescently marked targets bind to a substrate 230 synthesized with polymer sequences at known locations. The targets are detected by exposing selected regions of the substrate 230 to light from a light source 100 and detecting the photons from the light fluoresced therefrom, and repeating the steps of exposure and detection until the substrate 230 is completely examined. The resulting data can be used to determine binding affinity of the targets to specific polymer sequences.
    Type: Grant
    Filed: October 30, 2000
    Date of Patent: May 25, 2004
    Assignee: Affymetrix, Inc.
    Inventors: David Stern, Peter Fiekowsky
  • Publication number: 20040096883
    Abstract: Systems and methods for aligning scanned images are provided. A pattern is included in the scanned image so that when the image is convolved with a filter, a recognizable pattern is generated in the convolved image. The scanned image may then be aligned according to the position of the recognizable pattern in the convolved image. The filter may also act to remove the portions of the scanned image that do not correspond to the pattern in the scanned image.
    Type: Application
    Filed: August 25, 2003
    Publication date: May 20, 2004
    Applicant: AFFYMETRIX, INC., a California corporation
    Inventors: Peter Fiekowsky, Dan M. Bartell
  • Publication number: 20040048362
    Abstract: Labeled targets on a support synthesized with polymer sequences at known locations according to the methods disclosed in U.S. Pat. No. 5,143,854 and PCT WO 92/10092 or others, can be detected by exposing selected regions of sample 1500 to radiation from a source 1100 and detecting the emission therefrom, and repeating the steps of exposition and detection until the sample is completely examined.
    Type: Application
    Filed: August 11, 2003
    Publication date: March 11, 2004
    Inventors: Mark Trulson, David Stern, Richard P. Rava, Stephen P. A. Fodor, Peter Fiekowsky
  • Patent number: 6611767
    Abstract: Systems and methods for aligning scanned images are provided. A pattern is included in the scanned image so that when the image is convolved with a filter, a recognizable pattern is generated in the convolved image. The scanned image may then be aligned according to the position of the recognizable pattern in the convolved image. The filter may also act to remove the portions of the scanned image that do not correspond to the pattern in the scanned image.
    Type: Grant
    Filed: April 4, 2000
    Date of Patent: August 26, 2003
    Assignee: Affymetrix, Inc.
    Inventors: Peter Fiekowsky, Dan M. Bartell
  • Publication number: 20030152490
    Abstract: Labeled targets on a support synthesized with polymer sequences at known locations according to the methods disclosed in U.S. Pat. No. 5,143,854 and PCT WO 92/10092 or others, can be detected by exposing selected regions of sample 1500 to radiation from a source 1100 and detecting the emission therefrom, and repeating the steps of exposition and detection until the sample is completely examined.
    Type: Application
    Filed: February 21, 2003
    Publication date: August 14, 2003
    Inventors: Mark Trulson, David Stern, Richard P. Rava, Stephen P. A. Fodor, Peter Fiekowsky
  • Patent number: 6252236
    Abstract: A method and apparatus for imaging a sample are provided. An electromagnetic radiation source generates excitation radiation which is sized by excitation optics to a line. The line is directed at a sample resting on a support and excites a plurality of regions on the sample. Collection optics collect response radiation reflected from the sample I and image the reflected radiation. A detector senses the reflected radiation and is positioned to permit discrimination between radiation reflected from a certain focal plane in the sample and certain other planes within the sample.
    Type: Grant
    Filed: July 6, 1999
    Date of Patent: June 26, 2001
    Assignee: Affymetrix Technologies, N.V.
    Inventors: Mark Trulson, David Stern, Peter Fiekowsky, Richard Rava, Ian Walton, Stephen P. A. Fodor
  • Patent number: 6141096
    Abstract: Fluorescently marked targets bind to a substrate 230 synthesized with polymer sequences at known locations. The targets are detected by exposing selected regions of the substrate 230 to light from a light source 100 and detecting the photons from the light fluoresced therefrom, and repeating the steps of exposure and detection until the substrate 230 is completely examined. The resulting data can be used to determine binding affinity of the targets to specific polymer sequences.
    Type: Grant
    Filed: March 25, 1997
    Date of Patent: October 31, 2000
    Assignee: Affymetrix, Inc.
    Inventors: David Stern, Peter Fiekowsky
  • Patent number: 6090555
    Abstract: Systems and methods for aligning scanned images are provided. A pattern is included in the scanned image so that when the image is convolved with a filter, a recognizable pattern is generated in the convolved image. The scanned image may then be aligned according to the position of the recognizable pattern in the convolved image. The filter may also act to remove the portions of the scanned image that do not correspond to the pattern in the scanned image.
    Type: Grant
    Filed: December 23, 1997
    Date of Patent: July 18, 2000
    Assignee: Affymetrix, Inc.
    Inventors: Peter Fiekowsky, Dan M. Bartell
  • Patent number: 6025601
    Abstract: Labeled targets on a support synthesized with polymer sequences at known locations according to the methods disclosed in U.S. Pat. No. 5,143,854 and PCT WO 92/10092 or others, can be detected by exposing selected regions of sample 1500 to radiation from a source 1100 and detecting the emission therefrom, and repeating the steps of exposition and detection until the sample is completely examined.
    Type: Grant
    Filed: June 9, 1997
    Date of Patent: February 15, 2000
    Assignee: Affymetrix, Inc.
    Inventors: Mark Trulson, David Stern, Peter Fiekowsky, Richard Rava, Ian Walton, Stephen P. A. Fodor
  • Patent number: 5834758
    Abstract: Labeled targets on a support synthesized with polymer sequences at known locations according to the methods disclosed in U.S. Pat. No. 5,143,854 and PCT WO 92/10092 or others, can be detected by exposing selected regions of sample 1500 to radiation from a source 1100 and detecting the emission therefrom, and repeating the steps of exposition and detection until the sample is completely examined.
    Type: Grant
    Filed: September 4, 1996
    Date of Patent: November 10, 1998
    Assignee: Affymetrix, Inc.
    Inventors: Mark Trulson, David Stern, Peter Fiekowsky, Richard Rava, Ian Walton, Stephen P. A. Fodor
  • Patent number: 5631734
    Abstract: Fluorescently marked targets bind to a substrate 230 synthesized with polymer sequences at known locations. The targets are detected by exposing selected regions of the substrate 230 to light from a light source 100 and detecting the photons from the light fluoresced therefrom, and repeating the steps of exposure and detection until the substrate 230 is completely examined. The resulting data can be used to determine binding affinity of the targets to specific polymer sequences.
    Type: Grant
    Filed: February 10, 1994
    Date of Patent: May 20, 1997
    Assignee: Affymetrix, Inc.
    Inventors: David Stern, Peter Fiekowsky