Patents by Inventor Peter Fiekowsky
Peter Fiekowsky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 8233735Abstract: Fluorescently marked targets bind to a substrate 230 synthesized with polymer sequences at known locations. The targets are detected by exposing selected regions of the substrate 230 to light from a light source 100 and detecting the photons from the light fluoresced therefrom, and repeating the steps of exposure and detection until the substrate 230 is completely examined. The resulting data can be used to determine binding affinity of the targets to specific polymer sequences.Type: GrantFiled: September 17, 2008Date of Patent: July 31, 2012Assignee: Affymetrix, Inc.Inventors: David Stern, Peter Fiekowsky
-
Publication number: 20090010524Abstract: Fluorescently marked targets bind to a substrate 230 synthesized with polymer sequences at known locations. The targets are detected by exposing selected regions of the substrate 230 to light from a light source 100 and detecting the photons from the light fluoresced therefrom, and repeating the steps of exposure and detection until the substrate 230 is completely examined. The resulting data can be used to determine binding affinity of the targets to specific polymer sequences.Type: ApplicationFiled: September 17, 2008Publication date: January 8, 2009Applicant: Affymetrix, INC.Inventors: David Stern, Peter Fiekowsky
-
Publication number: 20080002874Abstract: Detecting defects in reference images used for optical inspections reduces false defect detections in the test image. Reference images are presumed perfect, but in practice contain defects. Defects in the reference image are detected by measuring the symmetry or randomness of pixels in the area of the suspected defect in both images. Measurements of the pixel intensity ranges, edge smoothness, and total edge slope in the two images are compared to determine if a suspect defect is actually in the reference image.Type: ApplicationFiled: June 29, 2006Publication date: January 3, 2008Inventor: Peter Fiekowsky
-
Publication number: 20060258002Abstract: Systems and methods for aligning scanned images are provided. A pattern is included in the scanned image so that when the image is convolved with a filter, a recognizable pattern is generated in the convolved image. The scanned image may then be aligned according to the position of the recognizable pattern in the convolved image. The filter may also act to remove the portions of the scanned image that do not correspond to the pattern in the scanned image.Type: ApplicationFiled: March 3, 2006Publication date: November 16, 2006Applicant: Affymetrix, Inc.Inventors: Peter Fiekowsky, Dan Bartell, David Stern
-
Publication number: 20060165313Abstract: Systems and methods for aligning scanned images are provided. A pattern is included in the scanned image so that when the image is convolved with a filter, a recognizable pattern is generated in the convolved image. The scanned image may then be aligned according to the position of the recognizable pattern in the convolved image. The filter may also act to remove the portions of the scanned image that do not correspond to the pattern in the scanned image.Type: ApplicationFiled: March 9, 2006Publication date: July 27, 2006Applicant: Affymetrix, Inc.Inventors: Peter Fiekowsky, Dan Bartell
-
Publication number: 20060111850Abstract: Fluorescently marked targets bind to a substrate 230 synthesized with polymer sequences at known locations. The targets are detected by exposing selected regions of the substrate 230 to light from a light source 100 and detecting the photons from the light fluoresced therefrom, and repeating the steps of exposure and detection until the substrate 230 is completely examined. The resulting data can be used to determine binding affinity of the targets to specific polymer sequences.Type: ApplicationFiled: December 30, 2005Publication date: May 25, 2006Applicant: Affymetrix, Inc.Inventors: David Stern, Peter Fiekowsky
-
Publication number: 20050200948Abstract: Labeled targets on a support synthesized with polymer sequences at known locations according to the methods disclosed in U.S. Pat. No. 5,143,854 and PCT WO 92/10092 or others, can be detected by exposing selected regions of sample 1500 to radiation from a source 1100 and detecting the emission therefrom, and repeating the steps of exposition and detection until the sample is completely examined.Type: ApplicationFiled: February 4, 2005Publication date: September 15, 2005Applicant: Affymetrix, INC.Inventors: Mark Trulson, David Stern, Richard Rava, Stephen Fodor, Peter Fiekowsky
-
Publication number: 20050037367Abstract: Systems and methods for aligning scanned images are provided. A pattern is included in the scanned image so that when the image is convolved with a filter, a recognizable pattern is generated in the convolved image. The scanned image may then be aligned according to the position of the recognizable pattern in the convolved image. The filter may also act to remove the portions of the scanned image that do not correspond to the pattern in the scanned image.Type: ApplicationFiled: August 25, 2003Publication date: February 17, 2005Applicant: AFFYMETRIX, INC., a California corporationInventors: Peter Fiekowsky, Dan Bartell
-
Publication number: 20040196456Abstract: Fluorescently marked targets bind to a substrate 230 synthesized with polymer sequences at known locations. The targets are detected by exposing selected regions of the substrate 230 to light from a light source 100 and detecting the photons from the light fluoresced therefrom, and repeating the steps of exposure and detection until the substrate 230 is completely examined. The resulting data can be used to determine binding affinity of the targets to specific polymer sequences.Type: ApplicationFiled: April 21, 2004Publication date: October 7, 2004Applicant: Affymetrix, Inc.Inventors: David Stern, Peter Fiekowsky
-
Patent number: 6741344Abstract: Fluorescently marked targets bind to a substrate 230 synthesized with polymer sequences at known locations. The targets are detected by exposing selected regions of the substrate 230 to light from a light source 100 and detecting the photons from the light fluoresced therefrom, and repeating the steps of exposure and detection until the substrate 230 is completely examined. The resulting data can be used to determine binding affinity of the targets to specific polymer sequences.Type: GrantFiled: October 30, 2000Date of Patent: May 25, 2004Assignee: Affymetrix, Inc.Inventors: David Stern, Peter Fiekowsky
-
Publication number: 20040096883Abstract: Systems and methods for aligning scanned images are provided. A pattern is included in the scanned image so that when the image is convolved with a filter, a recognizable pattern is generated in the convolved image. The scanned image may then be aligned according to the position of the recognizable pattern in the convolved image. The filter may also act to remove the portions of the scanned image that do not correspond to the pattern in the scanned image.Type: ApplicationFiled: August 25, 2003Publication date: May 20, 2004Applicant: AFFYMETRIX, INC., a California corporationInventors: Peter Fiekowsky, Dan M. Bartell
-
Publication number: 20040048362Abstract: Labeled targets on a support synthesized with polymer sequences at known locations according to the methods disclosed in U.S. Pat. No. 5,143,854 and PCT WO 92/10092 or others, can be detected by exposing selected regions of sample 1500 to radiation from a source 1100 and detecting the emission therefrom, and repeating the steps of exposition and detection until the sample is completely examined.Type: ApplicationFiled: August 11, 2003Publication date: March 11, 2004Inventors: Mark Trulson, David Stern, Richard P. Rava, Stephen P. A. Fodor, Peter Fiekowsky
-
Patent number: 6611767Abstract: Systems and methods for aligning scanned images are provided. A pattern is included in the scanned image so that when the image is convolved with a filter, a recognizable pattern is generated in the convolved image. The scanned image may then be aligned according to the position of the recognizable pattern in the convolved image. The filter may also act to remove the portions of the scanned image that do not correspond to the pattern in the scanned image.Type: GrantFiled: April 4, 2000Date of Patent: August 26, 2003Assignee: Affymetrix, Inc.Inventors: Peter Fiekowsky, Dan M. Bartell
-
Publication number: 20030152490Abstract: Labeled targets on a support synthesized with polymer sequences at known locations according to the methods disclosed in U.S. Pat. No. 5,143,854 and PCT WO 92/10092 or others, can be detected by exposing selected regions of sample 1500 to radiation from a source 1100 and detecting the emission therefrom, and repeating the steps of exposition and detection until the sample is completely examined.Type: ApplicationFiled: February 21, 2003Publication date: August 14, 2003Inventors: Mark Trulson, David Stern, Richard P. Rava, Stephen P. A. Fodor, Peter Fiekowsky
-
Patent number: 6252236Abstract: A method and apparatus for imaging a sample are provided. An electromagnetic radiation source generates excitation radiation which is sized by excitation optics to a line. The line is directed at a sample resting on a support and excites a plurality of regions on the sample. Collection optics collect response radiation reflected from the sample I and image the reflected radiation. A detector senses the reflected radiation and is positioned to permit discrimination between radiation reflected from a certain focal plane in the sample and certain other planes within the sample.Type: GrantFiled: July 6, 1999Date of Patent: June 26, 2001Assignee: Affymetrix Technologies, N.V.Inventors: Mark Trulson, David Stern, Peter Fiekowsky, Richard Rava, Ian Walton, Stephen P. A. Fodor
-
Patent number: 6141096Abstract: Fluorescently marked targets bind to a substrate 230 synthesized with polymer sequences at known locations. The targets are detected by exposing selected regions of the substrate 230 to light from a light source 100 and detecting the photons from the light fluoresced therefrom, and repeating the steps of exposure and detection until the substrate 230 is completely examined. The resulting data can be used to determine binding affinity of the targets to specific polymer sequences.Type: GrantFiled: March 25, 1997Date of Patent: October 31, 2000Assignee: Affymetrix, Inc.Inventors: David Stern, Peter Fiekowsky
-
Patent number: 6090555Abstract: Systems and methods for aligning scanned images are provided. A pattern is included in the scanned image so that when the image is convolved with a filter, a recognizable pattern is generated in the convolved image. The scanned image may then be aligned according to the position of the recognizable pattern in the convolved image. The filter may also act to remove the portions of the scanned image that do not correspond to the pattern in the scanned image.Type: GrantFiled: December 23, 1997Date of Patent: July 18, 2000Assignee: Affymetrix, Inc.Inventors: Peter Fiekowsky, Dan M. Bartell
-
Patent number: 6025601Abstract: Labeled targets on a support synthesized with polymer sequences at known locations according to the methods disclosed in U.S. Pat. No. 5,143,854 and PCT WO 92/10092 or others, can be detected by exposing selected regions of sample 1500 to radiation from a source 1100 and detecting the emission therefrom, and repeating the steps of exposition and detection until the sample is completely examined.Type: GrantFiled: June 9, 1997Date of Patent: February 15, 2000Assignee: Affymetrix, Inc.Inventors: Mark Trulson, David Stern, Peter Fiekowsky, Richard Rava, Ian Walton, Stephen P. A. Fodor
-
Patent number: 5834758Abstract: Labeled targets on a support synthesized with polymer sequences at known locations according to the methods disclosed in U.S. Pat. No. 5,143,854 and PCT WO 92/10092 or others, can be detected by exposing selected regions of sample 1500 to radiation from a source 1100 and detecting the emission therefrom, and repeating the steps of exposition and detection until the sample is completely examined.Type: GrantFiled: September 4, 1996Date of Patent: November 10, 1998Assignee: Affymetrix, Inc.Inventors: Mark Trulson, David Stern, Peter Fiekowsky, Richard Rava, Ian Walton, Stephen P. A. Fodor
-
Patent number: 5631734Abstract: Fluorescently marked targets bind to a substrate 230 synthesized with polymer sequences at known locations. The targets are detected by exposing selected regions of the substrate 230 to light from a light source 100 and detecting the photons from the light fluoresced therefrom, and repeating the steps of exposure and detection until the substrate 230 is completely examined. The resulting data can be used to determine binding affinity of the targets to specific polymer sequences.Type: GrantFiled: February 10, 1994Date of Patent: May 20, 1997Assignee: Affymetrix, Inc.Inventors: David Stern, Peter Fiekowsky