Patents by Inventor Peter Franciscus Wanten
Peter Franciscus Wanten has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9599908Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).Type: GrantFiled: October 9, 2015Date of Patent: March 21, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Peter Franciscus Wanten, Jacques Cor Johan Van Der Donck, Robert Douglas Watso, Teunis Cornelis Van Den Dool, Nadja Schuh, Jan Willem Cromwijk
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Publication number: 20160033875Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).Type: ApplicationFiled: October 9, 2015Publication date: February 4, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus DE JONG, Hans JANSEN, Martinus Hendrikus Antonius LEENDERS, Antonius Johannus VAN DER NET, Peter Franciscus WANTEN, Jacques Cor Johan VAN DER DONCK, Robert Douglas WATSO, Teunis Cornelis VAN DEN DOOL, Nadja SCHUH, Jan Willem CROMWIJK
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Patent number: 9158206Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).Type: GrantFiled: February 22, 2011Date of Patent: October 13, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Peter Franciscus Wanten, Jacques Cor Johan Van Der Donck, Robert Douglas Watso, Teunis Cornelis Van Den Dool, Nadja Schuh, Jan Willem Cromwijk
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Patent number: 9013672Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.Type: GrantFiled: June 29, 2007Date of Patent: April 21, 2015Assignee: ASML Netherlands B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
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Patent number: 8947629Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.Type: GrantFiled: April 11, 2008Date of Patent: February 3, 2015Assignee: ASML Netherlands B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
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Patent number: 8514365Abstract: An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.Type: GrantFiled: June 1, 2007Date of Patent: August 20, 2013Assignee: ASML Netherlands B.V.Inventors: Frederik Eduard De Jong, Marcel Hendrikus Maria Beems, Marinus Aart Van Den Brink, Johannes Henricus Wilhelmus Jacobs, Martinus Hendrikus Antonius Leenders, Leon Martin Levasier, Frits Van Der Meulen, Joost Jeroen Ottens, Koen Jacobus Johannes Maria Zaal, Richard Bernardus Johannes Droste, Johannes Wilhelmus De Klerk, Peter Franciscus Wanten, Jan Cornelis Van Der Hoeven, Edwin Cornelis Kadijk, Marteijn De Jong, David Lucien Anstotz
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Publication number: 20110292359Abstract: A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.Type: ApplicationFiled: August 4, 2011Publication date: December 1, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
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Publication number: 20110222034Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.Type: ApplicationFiled: May 18, 2011Publication date: September 15, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Marco Koert STAVENGA, Hans Jansen, Peter Franciscus Wanten, Johannes Wilhelmus Jacobus Leonardus Culjpers, Raymond Gerardus Marius Beeren
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Patent number: 8011377Abstract: A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.Type: GrantFiled: April 11, 2008Date of Patent: September 6, 2011Assignee: ASML Netherlands B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marlus Beeren, Kornelis Tijmen Hoekerd
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Publication number: 20110188013Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).Type: ApplicationFiled: February 22, 2011Publication date: August 4, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus DE JONG, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Peter Franciscus Wanten, Jacques Cor Johan Van Der Donck, Robert Douglas Watso, Teunis Cornelis Van Den Dool, Nadja Schuh, Jan Willem Cromwijk
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Patent number: 7969548Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.Type: GrantFiled: May 22, 2006Date of Patent: June 28, 2011Assignee: ASML Netherlands B.V.Inventors: Marco Koert Stavenga, Hans Jansen, Peter Franciscus Wanten, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren
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Patent number: 7916269Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).Type: GrantFiled: September 27, 2007Date of Patent: March 29, 2011Assignee: ASML Netherlands B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Peter Franciscus Wanten, Jacques Cor Johan Van Der Donck, Robert Douglas Watso, Teunis Cornelis Van Den Dool, Nadja Schuh, Jan Willem Cromwijk
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Patent number: 7900641Abstract: A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.Type: GrantFiled: June 29, 2007Date of Patent: March 8, 2011Assignee: ASML Netherlands B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
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Publication number: 20090025753Abstract: A lithographic apparatus is disclosed having an in situ ozonizer, which is used to produce ozone gas, for example, by UV irradiation of an oxygen-containing gas. The thus produced ozone is dissolved in ultra-pure water by contacting the ozone with the ultra-pure water through a permeable membrane.Type: ApplicationFiled: September 27, 2007Publication date: January 29, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus DE JONG, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Peter Franciscus Wanten, Jacques Cor Johan Van Der Donck, Robert Douglas Watso, Teunis Cornelis Van Den Dool, Nadja Schuh, Jan Willem Cromwijk
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Publication number: 20090027635Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).Type: ApplicationFiled: September 27, 2007Publication date: January 29, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus DE JONG, Hans Jansen, Martinus Hendrikus Leenders, Antonius Johannus Van Der Net, Peter Franciscus Wanten, Jacques Cor Johan Van Der Donck, Robert Douglas Watso, Teunis Cornelis Van Den Dool, Nadja Schuh, Jan Willem Cromwijk
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Publication number: 20090015804Abstract: A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.Type: ApplicationFiled: April 11, 2008Publication date: January 15, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Cuijpers, Raymond Gerardus Beeren, Kornelis Tijmen Hoekerd
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Publication number: 20090014030Abstract: A method of removing contamination from an apparatus used in lithography is disclosed. The method includes loading a substrate into the apparatus, the substrate comprising a rigid support layer and a deformable layer provided on the rigid support layer, bringing the deformable layer of the substrate into contact with a surface of the apparatus from which contamination is to be removed, introducing relative movement between the deformable layer and the surface of the apparatus from which contamination is to be removed to dislodge contamination from the surface for removal, and removing the dislodged contamination. Other aspects of the invention are also described and claimed.Type: ApplicationFiled: July 9, 2007Publication date: January 15, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Igor Petrus Maria Bouchoms, Richard Joseph Bruls, Hans Jansen, Martinus Hendrikus Antonius Leenders, Peter Franciscus Wanten, Marcus Theodoor Wilhelmus Van Der Heijden, Jacques Cor Johan Van Der Donck, Frederik Johannes Van Den Bogaard, Jan Groenewold, Sandra Van Der Graaf, Carmen Julia Zoldesi
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Publication number: 20080297744Abstract: An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.Type: ApplicationFiled: June 1, 2007Publication date: December 4, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Frederik Eduard De Jong, Marcel Hendrikus Maria Beems, Marinus Aart Van Den Brink, Johannes Henricus Wilhelmus Jacobs, Martinus Hendrikus Antonius Leenders, Leon Martin Levasier, Frits Van Der Meulen, Joost Jeroen Ottens, Koen Jacobus Johannes Maria Zaal, Richard Bernardus Johannes Droste, Johannes Wilhelmus De Klerk, Peter Franciscus Wanten, Jan Cornelis Van Der Hoeven, Edwin Cornelis Kadijk, Marteijn De Jong, David Lucien Anstotz
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Publication number: 20080284990Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.Type: ApplicationFiled: April 11, 2008Publication date: November 20, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
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Publication number: 20080271747Abstract: A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.Type: ApplicationFiled: June 29, 2007Publication date: November 6, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd