Patents by Inventor Peter Gerard McGrath

Peter Gerard McGrath has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of reducing process plasma damage using optical spectroscopy
    Patent number: 6972840
    Abstract: Optical emission spectra from a test wafer during a plasma process are measured using a spectrometer. The plasma charging voltage retained by (detected by) the test wafer is measured after the process step is completed. The emission spectra are correlated with the plasma charging voltage to identify the species contributing to the plasma charging voltage. The optical emission spectra are monitored in real time to optimize the plasma process to prevent plasma charging damage. The optical emission spectra are also monitored to control the plasma process drift.
    Type: Grant
    Filed: October 6, 2003
    Date of Patent: December 6, 2005
    Assignee: LSI Logic Corporation
    Inventors: Shiqun Gu, Peter Gerard McGrath, Ryan Tadashi Fujimoto
  • Method of reducing process plasma damage using optical spectroscopy
    Patent number: 6673200
    Abstract: Optical emission spectra from a test wafer during a plasma process are measured using a spectrometer. The plasma charging voltage retained by (detected by) the test wafer is measured after the process step is completed. The emission spectra are correlated with the plasma charging voltage to identify the species contributing to the plasma charging voltage. The optical emission spectra are monitored in real time to optimize the plasma process to prevent plasma charging damage. The optical emission spectra are also monitored to control the plasma process drift.
    Type: Grant
    Filed: July 12, 2002
    Date of Patent: January 6, 2004
    Assignee: LSI Logic Corporation
    Inventors: Shiqun Gu, Peter Gerard McGrath, Ryan Tadashi Fujimoto