Abstract: An apparatus includes a housing having an elongated chamber, an inlet opening extending into the chamber, and a slit shaped outlet opening. A tube element extends in a longitudinal direction through the chamber and is at least partially transparent to UV radiation. The tube element is arranged in the chamber such that a flow space is formed between the tube element and the wall of the chamber. At least one UV-radiation source in the tube element is arranged to emit UV-radiation in the direction of the flow space and through the outlet opening out of the housing to generate radicals in the liquid and bring the radicals to the substrate surface. Means are provided for adjusting the radiation exiting the outlet opening through the tube element such that the intensity of the radiation increases towards the longitudinal center plane of the chamber.

Abstract: An apparatus for applying a liquid medium irradiated with UV radiation onto a substrate is disclosed, the apparatus comprising: a housing having an elongated chamber, at least one inlet opening, which opens into the chamber, and at least one slit shaped outlet opening opposite the inlet opening, which extends over the length of the chamber, a tube element, which extends in a longitudinal direction through the chamber, the tube element being at least partially transparent to UV radiation, wherein the tube element is arranged in the chamber such that a flow space is formed between the tube element and the wall of the chamber, the flow space being symmetric with respect to a longitudinal centre plane of the chamber, the longitudinal centre plane dissecting the outlet opening in its middle, and such that the tube element extends into the slit shaped outlet opening in the housing and thereby forms two longitudinally extending outlet slits between the tube element and the housing, and at least one UV-radiation sour

Abstract: An apparatus for applying a liquid medium irradiated with UV radiation onto a substrate is disclosed, the apparatus comprising: a housing having an elongated chamber, at least one inlet opening, which opens into the chamber, and at least one slit shaped outlet opening opposite the inlet opening, which extends over the length of the chamber, a tube element, which extends in a longitudinal direction through the chamber, the tube element being at least partially transparent to UV radiation, wherein the tube element is arranged in the chamber such that a flow space is formed between the tube element and the wall of the chamber, the flow space being symmetric with respect to a longitudinal centre plane of the chamber, the longitudinal centre plane dissecting the outlet opening in its middle, and such that the tube element extends into the slit shaped outlet opening in the housing and thereby forms two longitudinally extending outlet silts between the tube element and the housing, and at least one UV-radiation sour

Abstract: An apparatus for applying a liquid medium irradiated with UV radiation onto a substrate is disclosed.

Abstract: An apparatus for applying a liquid medium irradiated with UV radiation onto a substrate is disclosed, the apparatus comprising: a housing having an elongated chamber, at least one inlet opening, which opens into the chamber, and at least one slit shaped outlet opening opposite the inlet opening, which extends over the length of the chamber, a tube element, which extends in a longitudinal direction through the chamber, the tube element being at least partially transparent to UV radiation, wherein the tube element is arranged in the chamber such that a flow space is formed between the tube element and the wall of the chamber, the flow space being symmetric with respect to a longitudinal centre plane of the chamber, the longitudinal centre plane dissecting the outlet opening in its middle, and such that the tube element extends into the slit shaped outlet opening in the housing and thereby forms two longitudinally extending outlet slits between the tube element and the housing, and at least one UV-radiation sour

Abstract: An apparatus for applying a liquid medium irradiated with UV radiation onto a substrate is disclosed, the apparatus comprising: a housing having an elongated chamber, at least one inlet opening, which opens into the chamber, and at least one slit shaped outlet opening opposite the inlet opening, which extends over the length of the chamber, a tube element, which extends in a longitudinal direction through the chamber, the tube element being at least partially transparent to UV radiation, wherein the tube element is arranged in the chamber such that a flow space is formed between the tube element and the wall of the chamber, the flow space being symmetric with respect to a longitudinal centre plane of the chamber, the longitudinal centre plane dissecting the outlet opening in its middle, and such that the tube element extends into the slit shaped outlet opening in the housing and thereby forms two longitudinally extending outlet silts between the tube element and the housing, and at least one UV-radiation sour

Abstract: A method is disclosed for making contact with a semiconductor substrate, in particular for making contact with solar cells, in which a metallic seed structure is generated on the surface through a dielectric or passivating layer by means of an LIFT process, and the seed structure is then reinforced.