Patents by Inventor Peter Hagemeyer

Peter Hagemeyer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7713810
    Abstract: The disclosed embodiments relate to a method for the production of a layer arrangement, a layer arrangement and a memory arrangement. According to one aspect at least one respectively laterally defined first layer sequence is embodied on a first surface area of a substrate and at least one respectively laterally defined second layer sequence is embodied on a second surface area of the substrate in order to produce a layer arrangement. A first side wall having a first thickness is respectively produced from a first electrically insulating material on at least one partial area of the side walls of the first and second layer sequences. A second side wall layer having a second thickness is respectively produced from a second electrically insulating material on at least one partial area of the first side wall layers and the second side wall layers are removed from the first layer sequences.
    Type: Grant
    Filed: May 15, 2003
    Date of Patent: May 11, 2010
    Assignee: Infineon Technologies AG
    Inventors: Peter Hagemeyer, Wolfram Langheinrich
  • Patent number: 7064377
    Abstract: A programmable read-only memory cell and method of operating the programmable read-only memory cell. In one embodiment, the programmable read-only memory cell comprises a floating gate arranged in a trench, an epitaxial channel layer formed on the floating gate, the channel layer connecting a source electrode to a drain electrode, and a selection gate arranged above the channel line.
    Type: Grant
    Filed: March 24, 2004
    Date of Patent: June 20, 2006
    Assignee: Infineon Technologies AG
    Inventors: Peter Hagemeyer, Wolfram Langheinrich
  • Publication number: 20060008959
    Abstract: The disclosed embodiments relate to a method for the production of a layer arrangement, a layer arrangement and a memory arrangement. According to one aspect at least one respectively laterally defined first layer sequence is embodied on a first surface area of a substrate and at least one respectively laterally defined second layer sequence is embodied on a second surface area of the substrate in order to produce a layer arrangement. A first side wall having a first thickness is respectively produced from a first electrically insulating material on at least one partial area of the side walls of the first and second layer sequences. A second side wall layer having a second thickness is respectively produced from a second electrically insulating material on at least one partial area of the first side wall layers and the second side wall layers are removed from the first layer sequences.
    Type: Application
    Filed: May 15, 2003
    Publication date: January 12, 2006
    Inventors: Peter Hagemeyer, Wolfram Langheinrich
  • Publication number: 20040228187
    Abstract: A programmable read-only memory cell and method of operating the programmable read-only memory cell. In one embodiment, the programmable read-only memory cell comprises a floating gate arranged in a trench, an epitaxial channel layer formed on the floating gate, the channel layer connecting a source electrode to a drain electrode, and a selection gate arranged above the channel line.
    Type: Application
    Filed: March 24, 2004
    Publication date: November 18, 2004
    Inventors: Peter Hagemeyer, Wolfram Langheinrich
  • Patent number: 6768166
    Abstract: A vertical transistor (100) has a source region (103), a drain region (109), a gate region (108), and a channel region (104) between the source region (103) and the drain region (109), which are arranged in a vertical direction in a semiconductor substrate (101), the gate region (104) having an electrical insulation from the source region (103), from the drain region (109) and from the channel region (104) and being arranged around the channel region (104) in such a way that the gate region (108) and the channel region (104) form a coaxial structure.
    Type: Grant
    Filed: June 25, 2002
    Date of Patent: July 27, 2004
    Assignee: Infineon Technologies AG
    Inventor: Peter Hagemeyer
  • Publication number: 20030015755
    Abstract: A vertical transistor (100) has a source region (103), a drain region (109), a gate region (108), and a channel region (104) between the source region (103) and the drain region (109), which are arranged in a vertical direction in a semiconductor substrate (101), the gate region (104) having an electrical insulation from the source region (103), from the drain region (109) and from the channel region (104) and being arranged around the channel region (104) in such a way that the gate region (108) and the channel region (104) form a coaxial structure.
    Type: Application
    Filed: June 25, 2002
    Publication date: January 23, 2003
    Inventor: Peter Hagemeyer