Patents by Inventor Peter Hempenius

Peter Hempenius has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 7884919
    Abstract: A device manufacturing method includes transferring a pattern from a patterning device onto a substrate. The method includes bringing the patterning device and the support together, and applying a substantially stationary force between the patterning device and the support to hold the patterning device. The patterning device is now excited by a substantially dynamic force to enable a micro slipping thereof. Then, the patterning device is aligned, and the pattern is transferred from the patterning device onto the substrate. The patterning device may be excited with an alternating acceleration. When the patterning device is excited, the patterning device is allowed to settle with respect to the support, thereby improving a friction therebetween to reduce a risk of slipping or local slipping of the patterning device.
    Type: Grant
    Filed: February 9, 2006
    Date of Patent: February 8, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Hempenius, Marcel Koenraad Marie Baggen, Dirk-Jan Bijvoet, Sjoerd Nicolaas Lambertus Donders, Youssef Karel Maria De Vos
  • Lithographic apparatus and device manufacturing method
    Publication number: 20070182947
    Abstract: A device manufacturing method includes transferring a pattern from a patterning device onto a substrate. The method includes bringing the patterning device and the support together, and applying a substantially stationary force between the patterning device and the support to hold the patterning device. The patterning device is now excited by a substantially dynamic force to enable a micro slipping thereof. Then, the patterning device is aligned, and the pattern is transferred from the patterning device onto the substrate. The patterning device may be excited with an alternating acceleration. When the patterning device is excited, the patterning device is allowed to settle with respect to the support, thereby improving a friction therebetween to reduce a risk of slipping or local slipping of the patterning device.
    Type: Application
    Filed: February 9, 2006
    Publication date: August 9, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Peter Hempenius, Marcel Baggen, Dirk-Jan Bijvoet, Sjoerd Donders, Youssef De Vos