Abstract: A method for determining consistency of a permeability of a ferromagnetic material in integrated circuits in which a test strip of the subject ferromagnetic material is included for testing with an impedance measurement instrument, such as an inductance-capacitance-resistance (LCR) meter, with which the resistance of the strip of ferromagnetic material over a range of measurement signal frequencies is determined based upon the measured impedance values. The measured impedance values, measurement signal frequencies and selected permeability values are then used in numerical simulations to produce multiple resistance versus frequency curves each of which corresponds to one of the selected permeability values.

Abstract: A method for forming source/drain extensions with gate overlap. An oxide layer is formed on a semiconductor substrate and a gate structure on the semiconductor substrate. First, sidewall spacer regions are formed on sides of the gate structure. Second spacer regions are formed on sides of the sidewall spacer regions. Upper regions of the gate structure and the sidewall spacer regions are silicided. Portions of source and drain extension regions in the semiconductor substrate adjacent the gate structure are also silicided.

Abstract: A method for forming source/drain extensions with gate overlap. An oxide layer is formed on a semiconductor substrate and a gate structure on the semiconductor substrate. First, sidewall spacer regions are formed on sides of the gate structure. Second spacer regions are formed on sides of the sidewall spacer regions. Upper regions of the gate structure and the sidewall spacer regions are silicided. Portions of source and drain extension regions in the semiconductor substrate adjacent the gate structure are also silicided.

Abstract: A method for forming source/drain extensions with gate overlap. An oxide layer is formed on a semiconductor substrate and a gate structure on the semiconductor substrate. First, sidewall spacer regions are formed on sides of the gate structure. Second spacer regions are formed on sides of the sidewall spacer regions. Upper regions of the gate structure and the sidewall spacer regions are silicided. Portions of source and drain extension regions in the semiconductor substrate adjacent the gate structure are also silicided.