Patents by Inventor Peter J. Biles

Peter J. Biles has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Removal of post etch residuals on wafer surface
    Patent number: 6566269
    Abstract: The present invention provides a method of plasma chamber etching of a semiconductor structure having a base layer, an etch stop layer, a dielectric material layer and a patterned photoresist layer. Among other things, the method may include etching selected portions of the dielectric material layer through the photoresist layer using a plasma etchant containing at least one of fluorine and sulfur in a compound such that portions of the photoresist layer may be contaminated with ions of the at least one of the fluorine and sulfur.
    Type: Grant
    Filed: July 14, 2000
    Date of Patent: May 20, 2003
    Assignee: Lucent Technologies Inc.
    Inventors: Peter J. Biles, Mario V. Pita, Sylvia M. Luque, Lauri M. Nelson, Robert H. Mills