Patents by Inventor Peter Janiel

Peter Janiel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070132375
    Abstract: In an electronic device comprising a protective barrier layer stack comprising a first barrier layer of a first amorphous carbon modification and a second barrier layer of a second amorphous carbon modification, the protective barrier layer stack has higher densities, better adhesion, and more flexibility than a single barrier layer of comparable thickness and composition.
    Type: Application
    Filed: November 4, 2004
    Publication date: June 14, 2007
    Inventors: Peter Bachmann, Volker Van Elsbergen, Peter Janiel
  • Patent number: 5283085
    Abstract: A method of manufacturing a hot-cathode element which consists of a rare-earth-oxide-doped refractory metal, notably thoriated tungsten, and which also contains carbon components, first a plurality of layers of the hot-cathode element being successively deposited on a substrate member (2) by means of a CVD process, after which notably the hot-cathode element is separated from the substrate member (2). The strength required for further working of the hot-cathode element is improved in that in the course of the CVD process decarburizing intermediate treatments are performed, the hot-cathode element being carburized during an aftertreatment.
    Type: Grant
    Filed: April 20, 1992
    Date of Patent: February 1, 1994
    Assignee: U.S. Philips Corporation
    Inventors: Georg Gartner, Peter Janiel
  • Patent number: 4947790
    Abstract: An arrangement for producing a gas flow which is enriched with the vapor of a low-volatile material. The arrangement comprises a vessel (1) having an interior space (12) for holding a powder bed (13), which consists of a low-volatile material and an additional solid inert component. The vessel is arranged in a thermostatically controlled bath (2). A gas flow (4, 16) consisting of an inert gas flows through the arrangement, preferably in the direction of the gravitational force. The gas flow passes, in this sequence, through a thick gas inlet plate (10), the powder bed (13) and a thin gas outlet plate (14). By proper dimensioning the component parts of the arrangement and providing a low pressure in the arrangement a high mass flow of the low-volatile material with a flow constant of a long duration is achieved. The enriched gas flow is conducted, for example, to a low-pressure CVD reactor.
    Type: Grant
    Filed: January 10, 1989
    Date of Patent: August 14, 1990
    Assignee: U.S. Philips Corporation
    Inventors: Georg Gartner, Peter Janiel, Hans Rau