Patents by Inventor Peter K. Loewengardt

Peter K. Loewengardt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for reducing topography dependent charging effects in a plasma enhanced semiconductor wafer processing system
    Patent number: 6635577
    Abstract: A method of eliminating charging resulting from plasma processing a semiconductor wafer comprising the steps of plasma processing the semiconductor wafer in a manner that may result in topographically dependent charging and exposing, during at least a portion of a time in which the semiconductor wafer is being plasma processed, the semiconductor wafer to particles that remove charge from the semiconductor wafer and reduce topographically dependent charging.
    Type: Grant
    Filed: March 30, 1999
    Date of Patent: October 21, 2003
    Assignee: Applied Materials, Inc
    Inventors: John M. Yamartino, Peter K. Loewengardt, Kenlin Huang, Diana Xiaobing Ma