Abstract: The processing of radiation patternable organometallic coatings is shown to be improved through the appropriate selection of post processing conditions between coating and development of the pattern. In particular, a coated wafer can be subjected to process delays to allow aging of the coating at various process points, in particular following irradiation. Process delays can be combined and interspersed with heating steps. The atmosphere above the coated wafer at various process steps can be adjusted to obtain desired improvements in the development of the pattern. Reactive gases can be beneficial with respect to improvement of coating properties.

Abstract: A modulation routine in a motor drive under lightly loaded conditions which prevents DC bus voltage pump-up includes both active states and zero states. In a first zero state, each phase of the motor is connected to a negative rail of the DC bus, and in a second zero state, each phase of the motor is connected to a positive rail of the DC bus. When motor is lightly loaded or unloaded such that DC bus voltage pump-up may occur, the two zero states are utilized in an uneven manner. The specific division of the zero state between the first and second zero states may be selected in a manner that prevents the DC bus voltage pump-up from occurring.