Patents by Inventor Peter Kindersley
Peter Kindersley has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20110042578Abstract: This invention relates to an ion beam monitoring arrangement for use in an ion implanter where it is desirable to monitor the flux and/or a cross-sectional profile of the ion beam used for implantation. It is often desirable to measure the flux and/or cross-sectional profile of an ion beam in an ion implanter in order to improve control of ion implantation of a semiconductor wafer or similar. The present invention describes adapting the wafer holder to allow such beam profiling to be performed. The substrate holder may be used progressively to occlude the ion beam from a downstream flux monitor or a flux monitor may be located on the wafer holder that is provided with a slit entrance aperture.Type: ApplicationFiled: October 28, 2010Publication date: February 24, 2011Inventors: Adrian Murrell, Bernard F. Harrison, Peter Edwards, Peter Kindersley, Robert Mitchell, Theodore Smick, Geoffrey Ryding, Marvin Farley, Takao Sakase
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Patent number: 7611975Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.Type: GrantFiled: September 27, 2006Date of Patent: November 3, 2009Assignee: Applied Materials, Inc.Inventors: Adrian Murrell, Peter Michael Banks, Matthew Peter Dobson, Peter Kindersley, Takao Sakase, Marvin Farley, Shu Satoh, Geoffrey Ryding
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Patent number: 7607640Abstract: A rotary valve actuator that effects rotary movement of a rotary valve includes a heavy plate member coupled with a linear motive source, which reciprocates the plate member between a first position and a second position. A first pair of flexible pull connectors, such as lengths of roller chain, are attached to the end of the plate member, and wrap around a wheel. At least one second flexible pull connector is disposed between said first flexible pull connectors and is attached to the other end of the plate member, and wraps around the wheel in the opposite direction of winding as for the first flexible connector.Type: GrantFiled: October 28, 2005Date of Patent: October 27, 2009Assignee: Engineered Valves International Inc.Inventor: Peter Kindersley
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Publication number: 20070259511Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.Type: ApplicationFiled: May 4, 2006Publication date: November 8, 2007Inventors: Adrian Murrell, Bernard Harrison, Peter Edwards, Peter Kindersley, Craig Lowrie, Peter Banks, Takao Sakase, Marvin Farley, Shu Satoh, Geoffrey Ryding
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Patent number: 7282427Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.Type: GrantFiled: May 4, 2006Date of Patent: October 16, 2007Assignee: Applied Materials, Inc.Inventors: Adrian Murrell, Bernard Harrison, Peter Ivor Tudor Edwards, Peter Kindersley, Craig Lowrie, Peter Michael Banks, Takao Sakase, Marvin Farley, Shu Satoh, Geoffrey Ryding
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Patent number: 7253424Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.Type: GrantFiled: May 4, 2006Date of Patent: August 7, 2007Assignee: Applied Materials, Inc.Inventors: Adrian Murrell, Bernard Harrison, Peter Ivor Tudor Edwards, Peter Kindersley, Craig Lowrie, Peter Michael Banks, Takao Sakase, Marvin Farley, Shu Satoh, Geoffrey Ryding
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Patent number: 7235797Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.Type: GrantFiled: May 24, 2005Date of Patent: June 26, 2007Assignee: Applied Materials, Inc.Inventors: Adrian Murrell, Bernard Harrison, Peter Edwards, Peter Kindersley, Takao Sakase, Marvin Farley, Shu Satoh, Geoffrey Ryding
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Publication number: 20070105355Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.Type: ApplicationFiled: September 27, 2006Publication date: May 10, 2007Applicant: Applied Materials, Inc.Inventors: Adrian Murrell, Peter Banks, Matthew Dobson, Peter Kindersley, Takao Sakase, Marvin Farley, Shu Satoh, Geoffrey Ryding
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Publication number: 20060197016Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.Type: ApplicationFiled: May 4, 2006Publication date: September 7, 2006Inventors: Adrian Murrell, Bernard Harrison, Peter Edwards, Peter Kindersley, Craig Lowrie, Peter Banks, Takao Sakase, Marvin Farley, Shu Satoh, Geoffrey Ryding
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Patent number: 7049210Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.Type: GrantFiled: January 12, 2004Date of Patent: May 23, 2006Assignee: Applied Materials, Inc.Inventors: Adrian Murrell, Bernard Harrison, Peter Ivor Tudor Edwards, Peter Kindersley, Craig Lowrie, Peter Michael Banks, Takao Sakase, Marvin Farley, Shu Satoh, Geoffrey Ryding
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Publication number: 20060097212Abstract: A rotary valve actuator that effects rotary movement of a rotary valve from 0 to 90°, or to 120°, or to 180°, or even more. The actuator includes a heavy plate member coupled with a linear motive source, which reciprocates the plate member between a first position and a second position. First and second coaxial wheels are fastened together on a single shaft and are rotatably supported tangent to one side of the plate member. A first flexible pull connector, such as a length of roller chain, is attached to the end of the plate member farthest from the linear motive source, and wraps around the first wheel. A second flexible pull connector is attached to the end of the plate member closest to the linear motive source, and wraps around the second wheel, in the opposite direction of winding as for the first flexible connector.Type: ApplicationFiled: October 28, 2005Publication date: May 11, 2006Applicant: Engineered Valves International Inc.Inventor: Peter Kindersley
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Publication number: 20050269527Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.Type: ApplicationFiled: May 24, 2005Publication date: December 8, 2005Inventors: Adrian Murrell, Bernard Harrison, Peter Edwards, Peter Kindersley, Takao Sakase, Marvin Farley, Shu Satoh, Geoffrey Ryding
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Publication number: 20050191409Abstract: This invention relates to an ion beam monitoring arrangement for use in an ion implanter where it is desirable to monitor the flux and/or a cross-sectional profile of the ion beam used for implantation. It is often desirable to measure the flux and/or cross-sectional profile of an ion beam in an ion implanter in order to improve control of ion implantation of a semiconductor wafer or similar. The present invention describes adapting the wafer holder to allow such beam profiling to be performed. The substrate holder may be used progressively to occlude the ion beam from a downstream flux monitor or a flux monitor may be located on the wafer holder that is provided with a slit entrance aperture.Type: ApplicationFiled: January 5, 2005Publication date: September 1, 2005Inventors: Adrian Murrell, Bernard Harrison, Peter Edwards, Peter Kindersley, Robert Mitchell, Theodore Smick, Geoffrey Ryding, Marvin Farley, Takao Sakase
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Publication number: 20050181584Abstract: This invention relates to a method of implanting ions in a substrate using an ion beam where instabilities in the ion beam may be present and to an ion implanter for use with such a method. This invention also relates to an ion source for generating an ion beam that can be switched off rapidly. In essence, the invention provides a method of implanting ions comprising switching off the ion beam when an instability has been detected whilst continuing motion of the substrate relative to the ion beam to leave an unimplanted portion of a scan line across the substrate, establishing a stable ion beam once more and finishing the scan line by implanting the unimplanted portion of the path.Type: ApplicationFiled: January 6, 2005Publication date: August 18, 2005Inventors: Majeed Foad, Bernard Harrison, Marvin Farley, Peter Kindersley, Stephen Wells, Geoffrey Ryding, Takao Sakase
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Patent number: 6908836Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.Type: GrantFiled: September 23, 2002Date of Patent: June 21, 2005Assignee: Applied Materials, Inc.Inventors: Adrian Murrell, Bernard Harrison, Peter Edwards, Peter Kindersley, Takao Sakase, Marvin Farley, Shu Satoh, Geoffrey Ryding
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Publication number: 20040191931Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.Type: ApplicationFiled: January 12, 2004Publication date: September 30, 2004Applicant: APPLIED MATERIALS INC.Inventors: Adrian Murrell, Bernard F. Harrison, Peter Ivor Tudor Edwards, Peter Kindersley, Craig Lowrie, Peter Michael Banks, Takao Sakase, Marvin Farley, Shu Satoh, Geoffrey Ryding
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Publication number: 20040058513Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.Type: ApplicationFiled: September 23, 2002Publication date: March 25, 2004Inventors: Adrian Murrell, Bernard Harrison, Peter Edwards, Peter Kindersley, Takao Sakase, Marvin Farley, Shu Satoh, Geoffrey Ryding
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Patent number: 6525327Abstract: A beam stop (23) has a charge collecting member (40) which extends in the direction of scanning of a scanned beam by less than the total distance scanned, so that variation in the charge signal derived from the collecting member can provide a timing signal for use in monitoring alignment of the scanned beam. In a preferred embodiment, the beam stop plate (42) has slits (65-69) leading to apertures (60-64) containing charge collecting rods (73-75) located within the thickness of the beam stop plate (42).Type: GrantFiled: October 12, 2000Date of Patent: February 25, 2003Assignee: Applied Materials, Inc.Inventors: Robert John Clifford Mitchell, Michael T. Wauk, John Ruffell, Hilton Glavish, Peter Kindersley
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Patent number: 6066237Abstract: In a coke drum an outlet arrangement is provided which allows removal of the coke from the drum without endangering the health or safety of workers heading or unheading the coke drum. Instead of using a manually removable bottom flange for the drum, a semiautomatic bottom flange removal system is provided. A spool is attached to the conventional, pre-existing, about 6 feet in diameter drum stationary bottom flange. The spool includes a tapered clamping surface. A new style removable bottom flange also includes a tapered clamping surface. The tapered clamping surfaces cooperate with clamp ring sectors movable by externally mounted hydraulic cylinders into contact with the spool and the flange, and other hydraulic cylinders mounted directly on the ring sectors move male locking surfaces into locking engagement with cooperating female locking surfaces formed on adjacent clamp ring sectors.Type: GrantFiled: November 19, 1998Date of Patent: May 23, 2000Inventor: Peter Kindersley
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Patent number: 5947157Abstract: A throttling element, and throttling device utilizing the throttle element, provide absolute minimum possible resistance when in the fully opened position yet easily and effectively throttles the flow, so as to introduce a variable pressure drop, upon rotation utilizing conventional actuators. The device cannot be closed off completely, and it is possible to produce it in the same cost range as for butterfly valves yet having significant advantages thereover. The throttling element includes an annular metal substantially spherical segment having an exterior arcuate extent of about 80.degree. or less (e.g. about 60-70.degree.) with first and second elongated metal shaft stubs extending radially outwardly from the exterior of the annular substantially spherical segment, on opposite of the segment the dimension of elongation of the shaft stubs.Type: GrantFiled: December 11, 1995Date of Patent: September 7, 1999Inventor: Peter Kindersley