Patents by Inventor Peter Kloesch

Peter Kloesch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY INCLUDING AN ACTUATOR SYSTEM
    Publication number: 20190121238
    Abstract: The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the heat input into the component that is due to heat arising during the operation of the actuator system.
    Type: Application
    Filed: October 18, 2018
    Publication date: April 25, 2019
    Inventors: Benjamin Sigel, Andreas Bertele, Peter Kloesch, Martin Mahlmann, Jochen Weber
  • PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY INCLUDING AN ACTUATOR SYSTEM
    Publication number: 20150316855
    Abstract: The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the heat input into the component that is due to heat arising during the operation of the actuator system.
    Type: Application
    Filed: April 9, 2015
    Publication date: November 5, 2015
    Inventors: Benjamin Sigel, Andreas Bertele, Peter Kloesch, Martin Mahlmann, Jochen Weber
  • Projection exposure apparatus for semiconductor lithography including an actuator system
    Patent number: 9030644
    Abstract: The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the heat input into the component that is due to heat arising during the operation of the actuator system.
    Type: Grant
    Filed: August 2, 2011
    Date of Patent: May 12, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Benjamin Sigel, Andreas Bertele, Peter Kloesch, Martin Mahlmann, Jochen Weber
  • Device for damping vibrations in projection exposure apparatuses for semiconductor lithography
    Patent number: 8212992
    Abstract: A changeable assembly for a projection exposure apparatus for semiconductor lithography contains at least one damping element. Projection exposure apparatus for semiconductor lithography and measuring assemblies for a projection exposure apparatus for semiconductor lithography can include at least one sensor for detecting parameters and vibrations of the projection exposure apparatus, wherein the measuring assembly is embodied in such a way that it can be inserted into an exchange opening, provided for an optical element, in the projection exposure apparatus.
    Type: Grant
    Filed: March 11, 2011
    Date of Patent: July 3, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Peter Kloesch, Michael Ringel, Markus Weiss
  • PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY INCLUDING AN ACTUATOR SYSTEM
    Publication number: 20110317140
    Abstract: The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the heat input into the component that is due to heat arising during the operation of the actuator system.
    Type: Application
    Filed: August 2, 2011
    Publication date: December 29, 2011
    Applicant: Carl Zeiss SMT GmbH
    Inventors: Benjamin Sigel, Andreas Bertele, Peter Kloesch, Martin Mahlmann, Jochen Weber
  • DEVICE FOR DAMPING VIBRATIONS IN PROJECTION EXPOSURE APPARATUSES FOR SEMICONDUCTOR LITHOGRAPHY
    Publication number: 20110205507
    Abstract: A changeable assembly for a projection exposure apparatus for semiconductor lithography contains at least one damping element. Projection exposure apparatus for semiconductor lithography and measuring assemblies for a projection exposure apparatus for semiconductor lithography can include at least one sensor for detecting parameters and vibrations of the projection exposure apparatus, wherein the measuring assembly is embodied in such a way that it can be inserted into an exchange opening, provided for an optical element, in the projection exposure apparatus.
    Type: Application
    Filed: March 11, 2011
    Publication date: August 25, 2011
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Peter Kloesch, Michael Ringel, Markus Weiss