Patents by Inventor Peter Lao

Peter Lao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Edge-coupled semiconductor photodetector
    Patent number: 10175099
    Abstract: A device is disclosed for monitoring power from a laser diode. The device includes a substrate having a top surface and a first facet perpendicular to the top surface through which light enters the substrate. The device further includes a second facet onto which light that has entered the substrate through the first facet along an optical axis that is non-normal to the first facet is incident. The device further includes a photodiode fabricated on the top surface of the substrate for measuring an intensity of the light that enters the first facet of the substrate along the optical axis that is non-normal to the first facet. The light that has entered the substrate through the first facet along the optical axis that is non-normal to the first facet is reflected by the second facet toward a photoactive region of the photodiode.
    Type: Grant
    Filed: August 3, 2017
    Date of Patent: January 8, 2019
    Assignee: GLOBAL COMMUNICATION SEMICONDUCTORS, LLC
    Inventors: Samuel C. Wang, Peter Lao, Dhiraj Kumar
  • Edge-Coupled Semiconductor Photodetector
    Publication number: 20180180468
    Abstract: A device is disclosed for monitoring power from a laser diode. The device includes a substrate having a top surface and a first facet perpendicular to the top surface through which light enters the substrate. The device further includes a second facet onto which light that has entered the substrate through the first facet along an optical axis that is non-normal to the first facet is incident. The device further includes a photodiode fabricated on the top surface of the substrate for measuring an intensity of the light that enters the first facet of the substrate along the optical axis that is non-normal to the first facet. The light that has entered the substrate through the first facet along the optical axis that is non-normal to the first facet is reflected by the second facet toward a photoactive region of the photodiode.
    Type: Application
    Filed: August 3, 2017
    Publication date: June 28, 2018
    Inventors: Samuel C. Wang, Peter Lao, Dhiraj Kumar
  • Ethylene terephthalate polymer retaining ring for a chemical mechanical polishing head
    Publication number: 20080051011
    Abstract: Embodiments of a retaining ring for use with a chemical mechanical polishing process with a body including a polyethylene terephthalate polymer or polymer including ethylene terephthalate monomers are disclosed.
    Type: Application
    Filed: October 2, 2006
    Publication date: February 28, 2008
    Inventors: Gerard Stephen Moloney, Peter Lao
  • Vertically adjustable chemical mechanical polishing head and method for use thereof
    Patent number: 7326103
    Abstract: The invention provides a vertically adjustable chemical mechanical polishing head having a pivot mechanism and method for use thereof.
    Type: Grant
    Filed: November 4, 2003
    Date of Patent: February 5, 2008
    Assignee: Ebara Technologies Incorporated
    Inventors: Kunihiko Sakurai, Gerard Moloney, Huey-Ming Wang, Jun Liu, Peter Lao
  • Chemical mechanical polishing and pad dressing method
    Patent number: 7004822
    Abstract: The invention provides a chemical mechanical polishing and pad dressing method based on differing the rotational of a pad dresser, head, and/or polishing pad to improve center removal slow profiling.
    Type: Grant
    Filed: February 28, 2003
    Date of Patent: February 28, 2006
    Assignee: Ebara Technologies, Inc.
    Inventors: Gerard Stephen Moloney, Huey-Ming Wang, Peter Lao
  • Vertically adjustable chemical mechanical polishing head having a pivot mechanism and method for use thereof
    Publication number: 20040121704
    Abstract: The invention provides a vertically adjustable chemical mechanical polishing head having a pivot mechanism and method for use thereof.
    Type: Application
    Filed: November 4, 2003
    Publication date: June 24, 2004
    Applicant: Ebara Technologies Incorporated
    Inventors: Kunihiko Sakurai, Gerard Moloney, Huey-Ming Wang, Jun Liu, Peter Lao
  • Chemical mechanical polishing and pad dressing method
    Publication number: 20040023602
    Abstract: The invention provides a chemical mechanical polishing and pad dressing method based on differing the rotational of a pad dresser, head, and/or polishing pad to improve center removal slow profiling.
    Type: Application
    Filed: February 28, 2003
    Publication date: February 5, 2004
    Applicant: Ebara Technologies Incorporated
    Inventors: Gerard Stephen Moloney, Huey-Ming Wang, Peter Lao