Patents by Inventor Peter Leunissen

Peter Leunissen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of reducing the impact of stray light during optical lithography, devices obtained thereof and masks used therewith
    Patent number: 7838209
    Abstract: A method of reducing the influence of the spread of the transmitted light on the feature size during optical lithography is disclosed. The method comprises at least two irradiation steps. During a first irradiation the resist is exposed with the original mask, i.e., comprising substantially the pattern to be obtained in the layer. Thereafter, without developing the exposed resist, an irradiation with at least one exposure is performed whereby the resist is exposed with a second mask, being at least partly the inverse of the original mask. The exposures of the second irradiation step are defocused compared to the first irradiation.
    Type: Grant
    Filed: July 20, 2005
    Date of Patent: November 23, 2010
    Assignee: IMEC
    Inventors: Peter Leunissen, Young-Chang Kim
  • Method of reducing the impact of stray light during optical lithography, devices obtained thereof and masks used therewith
    Publication number: 20060019179
    Abstract: A method of reducing the influence of the spread of the transmitted light on the feature size during optical lithography is disclosed. The method comprises at least two irradiation steps. During a first irradiation the resist is exposed with the original mask, i.e., comprising substantially the pattern to be obtained in the layer. Thereafter, without developing the exposed resist, an irradiation with at least one exposure is performed whereby the resist is exposed with a second mask, being at least partly the inverse of the original mask. The exposures of the second irradiation step are defocused compared to the first irradiation.
    Type: Application
    Filed: July 20, 2005
    Publication date: January 26, 2006
    Inventors: Peter Leunissen, Young-Chang Kim