Patents by Inventor Peter M. Dang

Peter M. Dang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11966340
    Abstract: To automate time series forecasting machine learning pipeline generation, a data allocation size of time series data may be determined based on one or more characteristics of a time series data set. The time series data may be allocated for use by candidate machine learning pipelines based on the data allocation size. Features for the time series data may be determined and cached by the candidate machine learning pipelines. Predictions of each of the candidate machine learning pipelines using at least the one or more features may be evaluated. A ranked list of machine learning pipelines may be automatically generated from the candidate machine learning pipelines for time series forecasting based upon evaluating predictions of each of the one or more candidate machine learning pipelines.
    Type: Grant
    Filed: March 15, 2022
    Date of Patent: April 23, 2024
    Assignee: International Business Machines Corporation
    Inventors: Long Vu, Bei Chen, Xuan-Hong Dang, Peter Daniel Kirchner, Syed Yousaf Shah, Dhavalkumar C. Patel, Si Er Han, Ji Hui Yang, Jun Wang, Jing James Xu, Dakuo Wang, Gregory Bramble, Horst Cornelius Samulowitz, Saket K. Sathe, Wesley M. Gifford, Petros Zerfos
  • Patent number: 7863587
    Abstract: A shaper for shaping an ion beam and that can be used for both deposition and etching is described. The shaper includes a plate that is placed between an ion beam grid and an ion beam source. The plate covers holes in the grid, and is shaped and dimensioned such that the plate does not partially cover any holes in the grid that are directly adjacent to the plate. A hole is configured to mount the shaper at a center of the grid and at least one other hole is configured to secure the shaper to the grid to prevent the shaper from rotating relative to the grid. A center mount portion covers holes in the grid. The plate has two axes of reflection symmetry. The uniformity of both deposition and etching is improved.
    Type: Grant
    Filed: January 31, 2007
    Date of Patent: January 4, 2011
    Assignee: Hitachi Global Storage Technologies, Netherlands, B.V.
    Inventors: Peter M. Dang, Jorge A. Goitia, Cherngye Hwang, Eduardo T. Mireles
  • Patent number: 7855861
    Abstract: A hard disk drive slider comprises an overcoat layer, which covers an air-bearing surface of the slider. The overcoat covers an exposed surface of a tunneling magnetoresistance transducer. An adhesion layer is coupled with the overcoat layer and the air-bearing surface. The adhesion layer comprises a compound of nitrogen. The compound of nitrogen reduces noise in read data from the tunneling magnetoresistance transducer.
    Type: Grant
    Filed: April 30, 2007
    Date of Patent: December 21, 2010
    Assignee: Hitachi Global Storage Technologies, Netherlands, B.V.
    Inventors: Peter M. Dang, Eric W. Flint, Daryl J. Pocker, Yongjian Sun, Jila Tabib, Brian R. York
  • Publication number: 20080266719
    Abstract: A hard disk drive slider comprises a tunneling magnetoresistance transducer, which comprises an insulator barrier. A nitrogen atom from a nitrogen atmosphere occupies an oxygen atom vacancy within the insulator barrier, such that noise in read data from the tunneling magnetoresistance transducer is reduced.
    Type: Application
    Filed: April 30, 2007
    Publication date: October 30, 2008
    Inventors: Peter M. Dang, Eric W. Flint, Daryl J. Pocker, Yongjian Sun, Jila Tabib, Brian R. York
  • Publication number: 20080179535
    Abstract: A shaper for shaping an ion beam and that can be used for both deposition and etching is described. The shaper includes a plate that is placed between an ion beam grid and an ion beam source. The plate has two axes of reflection symmetry. The uniformity of both deposition and etching is improved.
    Type: Application
    Filed: January 31, 2007
    Publication date: July 31, 2008
    Inventors: Peter M. Dang, Jorge A. Goitia, Cherngye Hwang, Eduardo T. Mireles