Abstract: A therapy system includes a therapy output device that includes light sources and a controller. The light sources are configured to output electromagnetic radiation at different peak wavelengths. The controller is configured to operate the light sources to output the electromagnetic radiation to differ between a first therapy program and second therapy program by at least one of peak wavelengths, irradiance of one or more of the peak wavelengths, or energy density of the one or more peak wavelengths.

Abstract: A cleaning device includes an enclosure, an ozone-generating light source, a UVC germicidal light source, and a control system. The ozone-generating light source is configured to generate ozone in the enclosure. The UVC germicidal light source configured to emit UVC germicidal light in the enclosure. The control system is configured to, during a predetermined cleaning cycle, operate the ozone-generating light source for a first time period and to operate the UVC germicidal light source for a second time period, the second time period being at least 10 times longer than the first time period and terminating after the first time period.

Abstract: Wafers are aligned with one another by reference to features formed on or in each wafer. A method includes forming a first pivot-notch, a first stop-notch, and a first bias-notch in a first wafer by reference to first features formed on or in the first wafer. Also formed is a second pivot-notch, a second stop-notch, and a second bias-notch in a second wafer by reference to second features formed on or in the second wafer. A first wafer is mounted in an aligning device, wherein a two-contact element enters into the first pivot-notch, and a single-contact element enters the first stop-notch. The second wafer is mounted in the aligning device, wherein the two-contact element enters into the second pivot-notch, and the single-contact element enters the second stop-notch. A biasing force is exerted onto surfaces of the first and second bias-notches to align the first features with the second features.

Abstract: Wafers are aligned with one another by reference to features formed on or in each wafer. A method includes forming a first pivot-notch, a first stop-notch, and a first bias-notch in a first wafer by reference to first features formed on or in the first wafer. Also formed is a second pivot-notch, a second stop-notch, and a second bias-notch in a second wafer by reference to second features formed on or in the second wafer. A first wafer is mounted in an aligning device, wherein a two-contact element enters into the first pivot-notch, and a single-contact element enters the first stop-notch. The second wafer is mounted in the aligning device, wherein the two-contact element enters into the second pivot-notch, and the single-contact element enters the second stop-notch. A biasing force is exerted onto surfaces of the first and second bias-notches to align the first features with the second features.

Abstract: The following label is usable in kitchen environments. The label has a reusable surface layer, a contrasting structural layer, and an adhesive layer for adhering to storage and serving containers, such as bins, buckets, and trays. The label materials are waterproof so that the label is erased but not removed by routine washing of the storage containers.

Abstract: Wafers are aligned with one another by reference to features formed on or in each wafer. Notches are formed in each wafer, including a pivot-notch that allows for two-point contact, and a stop-notch that provides for single-point contact. A bias-notch is formed for pressing the wafers into engagement with the two-contact element when it is in the pivot-notch and with the single-contact element when it is in the stop-notch. The wafers may be bonded to one another to maintain the alignment of the referenced features.

Abstract: Wafers are aligned with one another by reference to features formed on or in each wafer. Notches are formed in each wafer, including a pivot-notch that allows for two-point contact, and a stop-notch that provides for single-point contact. A bias-notch is formed for pressing the wafers into engagement with the two-contact element when it is in the pivot-notch and with the single-contact element when it is in the stop-notch. The wafers may be bonded to one another to maintain the alignment of the referenced features.

Abstract: A protective device for mounting on and encasing a lock operating member, such as, a door knob to preclude access thereto and operation thereof. The casing includes a generally rectangular front opening through which the knob projects and a slide member vertically slidable therein which is adaptable to receive a locking means for securing the casing in position to prevent the locking mechanism of the knob from being actuated or removal of the knob.