Patents by Inventor Peter Maschwitz

Peter Maschwitz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10290474
    Abstract: The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.
    Type: Grant
    Filed: September 15, 2014
    Date of Patent: May 14, 2019
    Assignees: AGC FLAT GLASS NORTH AMERICA, INC., ASAHI GLASS CO., LTD., AGC GLASS EUROPE
    Inventor: Peter Maschwitz
  • Patent number: 10290473
    Abstract: The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.
    Type: Grant
    Filed: January 6, 2014
    Date of Patent: May 14, 2019
    Assignees: AGC FLAT GLASS NORTH AMERICA, INC., ASAHI GLASS CO., LTD., AGC GLASS EUROPE
    Inventor: Peter Maschwitz
  • Patent number: 10242846
    Abstract: An ion source includes a chamber. The ion source further includes a first hollow cathode having a first hollow cathode cavity and a first plasma exit orifice and a second hollow cathode having a second hollow cathode cavity and a second plasma exit orifice. The first and second hollow cathodes are disposed adjacently in the chamber. The ion source further includes a first ion accelerator between and in communication with the first plasma exit orifice and the chamber. The first ion accelerator forms a first ion acceleration cavity. The ion source further includes a second ion accelerator between and in communication with the second plasma orifice and the chamber. The second ion accelerator forms a second ion acceleration cavity. The first hollow cathode and the second hollow cathode are configured to alternatively function as electrode and counter-electrode to generate a plasma.
    Type: Grant
    Filed: December 18, 2015
    Date of Patent: March 26, 2019
    Assignees: AGC FLAT GLASS NORTH AMERICA, INC., ASAHI GLASS CO., LTD., AGC GLASS EUROPE
    Inventors: John Chambers, Peter Maschwitz
  • Patent number: 10163608
    Abstract: The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.
    Type: Grant
    Filed: September 15, 2014
    Date of Patent: December 25, 2018
    Assignees: AGC FLAT GLASS NORTH AMERICA, INC., ASAHI GLASS CO., LTD., AGC GLASS EUROPE
    Inventor: Peter Maschwitz
  • Patent number: 10115570
    Abstract: The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.
    Type: Grant
    Filed: September 15, 2014
    Date of Patent: October 30, 2018
    Assignees: AGC FLAT GLASS NORTH AMERICA, INC., ASAHI GLASS CO., LTD., AGC GLASS EUROPE
    Inventor: Peter Maschwitz
  • Patent number: 10083821
    Abstract: The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.
    Type: Grant
    Filed: September 15, 2014
    Date of Patent: September 25, 2018
    Assignees: AGC FLAT GLASS NORTH AMERICA, INC., ASAHI GLASS CO., LTD., AGC GLASS EUROPE
    Inventor: Peter Maschwitz
  • Publication number: 20180025892
    Abstract: The present invention relates to a hollow cathode plasma source and to methods for surface treating or coating using such a plasma source, comprising first and second electrodes (1, 2), each electrode comprising an elongated cavity (4), wherein dimensions for at least one of the following parameters is selected so as to ensure high electron density and/or low amount of sputtering of plasma source cavity surfaces, those parameters being cavity cross section shape, cavity cross section area cavity distance (11), and outlet nozzle width (12).
    Type: Application
    Filed: December 5, 2014
    Publication date: January 25, 2018
    Applicants: AGC GLASS EUROPE, S.A., AGC FLAT GLASS NORTH AMERICA, INC., ASAHI GLASS CO., LTD.
    Inventors: Thomas BIQUET, Peter MASCHWITZ, John CHAMBERS, Hughes WIAME
  • Publication number: 20170338083
    Abstract: The present invention relates generally to a plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction for deposition of thin film coatings and modification of surfaces. More particularly, the present invention relates to a plasma source comprising one or more plasma-generating electrodes, wherein a macro-particle reduction coating is deposited on at least a portion of the plasma-generating surfaces of the one or more electrodes to shield the plasma-generating surfaces of the electrodes from erosion by the produced plasma and to resist the formation of particulate matter, thus enhancing the performance and extending the service life of the plasma source.
    Type: Application
    Filed: December 5, 2014
    Publication date: November 23, 2017
    Applicants: AGC FLAT GLASS NORTH AMERICA, INC., AGC GLASS EUROPE, S.A., ASAHI GLASS CO., LTD.
    Inventors: John CHAMBERS, Peter MASCHWITZ, Yuping LIn, Herb JOHNSON
  • Publication number: 20170309458
    Abstract: A plasma source is provided. The plasma source includes at least three hollow cathodes, including a first hollow cathode, a second hollow cathode, and a third hollow cathode, each hollow cathode having a plasma exit region. The plasma source includes a source of power capable of producing multiple output waves, including a first output wave, a second output wave, and a third output wave, wherein the first output wave and the second output wave are out of phase, the second output wave and the third output wave are out of phase, and the first output wave and the third output wave are out of phase. Each hollow cathode is electrically connected to the source of power such that the first hollow cathode is electrically connected to the first output wave, the second hollow cathode is electrically connected to the second output wave, and the third hollow cathode is electrically connected to the third output wave. Electrical current flows between the at least three hollow cathodes that are out of electrical phase.
    Type: Application
    Filed: July 10, 2017
    Publication date: October 26, 2017
    Applicants: AGC Flat Glass North America, Inc., Asahi Glass Co., Ltd., AGC Glass Europe
    Inventors: John CHAMBERS, Peter MASCHWITZ
  • Patent number: 9721764
    Abstract: A method of producing a plasma is provided. The method includes providing at least three hollow cathodes, including a first hollow cathode, a second hollow cathode, and a third hollow cathode. Each hollow cathode has a plasma exit region. The method further includes providing a source of power capable of producing multiple output waves, including a first output wave, a second output wave, and a third output wave. The first output wave and the second output wave are out of phase, the second output wave and the third output wave are out of phase, and the first output wave and the third output wave are out of phase. Each hollow cathode is electrically connected to the source of power such that the first hollow cathode is electrically connected to the first output wave, the second hollow cathode is electrically connected to the second output wave, and the third hollow cathode is electrically connected to the third output wave.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: August 1, 2017
    Assignees: AGC FLAT GLASS NORTH AMERICA, INC., ASAHI GLASS CO., LTD., AGC GLASS EUROPE S.A.
    Inventors: John Chambers, Peter Maschwitz
  • Patent number: 9721765
    Abstract: A plasma source is provided. The plasma source includes at least three hollow cathodes, including a first hollow cathode, a second hollow cathode, and a third hollow cathode, each hollow cathode having a plasma exit region. The plasma source includes a source of power capable of producing multiple output waves, including a first output wave, a second output wave, and a third output wave, wherein the first output wave and the second output wave are out of phase, the second output wave and the third output wave are out of phase, and the first output wave and the third output wave are out of phase. Each hollow cathode is electrically connected to the source of power such that the first hollow cathode is electrically connected to the first output wave, the second hollow cathode is electrically connected to the second output wave, and the third hollow cathode is electrically connected to the third output wave. Electrical current flows between the at least three hollow cathodes that are out of electrical phase.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: August 1, 2017
    Assignees: AGC FLAT GLASS NORTH AMERICA, INC., ASAHI GLASS CO., LTD., AGC GLASS EUROPE S.A.
    Inventors: John Chambers, Peter Maschwitz
  • Publication number: 20170178869
    Abstract: An ion source includes a chamber. The ion source further includes a first hollow cathode having a first hollow cathode cavity and a first plasma exit orifice and a second hollow cathode having a second hollow cathode cavity and a second plasma exit orifice. The first and second hollow cathodes are disposed adjacently in the chamber. The ion source further includes a first ion accelerator between and in communication with the first plasma exit orifice and the chamber. The first ion accelerator forms a first ion acceleration cavity. The ion source further includes a second ion accelerator between and in communication with the second plasma orifice and the chamber. The second ion accelerator forms a second ion acceleration cavity. The first hollow cathode and the second hollow cathode are configured to alternatively function as electrode and counter-electrode to generate a plasma.
    Type: Application
    Filed: December 18, 2015
    Publication date: June 22, 2017
    Applicants: AGC Flat Glass North America, Inc., Asahi Glass Co., Ltd., AGC Glass Europe S.A.
    Inventors: John Chambers, Peter MASCHWITZ
  • Publication number: 20170178870
    Abstract: A method of extracting and accelerating ions is provided. The method includes providing a ion source. The ion source includes a chamber. The ion source further includes a first hollow cathode having a first hollow cathode cavity and a first plasma exit orifice and a second hollow cathode having a second hollow cathode cavity and a second plasma exit orifice, the first and second hollow cathodes being disposed adjacently in the chamber. The ion source further includes a first ion accelerator between and in communication with the first plasma exit orifice and the chamber. The first ion accelerator forms a first ion acceleration cavity. The ion source further includes a second ion accelerator between and in communication with the second plasma orifice and the chamber. The second ion accelerator forms a second ion acceleration cavity. The method further includes generating a plasma using the first hollow cathode and the second hollow cathode.
    Type: Application
    Filed: December 18, 2015
    Publication date: June 22, 2017
    Applicants: AGC Flat Glass North America, Inc., Asahi Glass Co., Ltd., AGC Glass Europe S.A.
    Inventors: John Chambers, Peter MASCHWITZ
  • Publication number: 20170140904
    Abstract: A plasma source is provided. The plasma source includes at least three hollow cathodes, including a first hollow cathode, a second hollow cathode, and a third hollow cathode, each hollow cathode having a plasma exit region. The plasma source includes a source of power capable of producing multiple output waves, including a first output wave, a second output wave, and a third output wave, wherein the first output wave and the second output wave are out of phase, the second output wave and the third output wave are out of phase, and the first output wave and the third output wave are out of phase. Each hollow cathode is electrically connected to the source of power such that the first hollow cathode is electrically connected to the first output wave, the second hollow cathode is electrically connected to the second output wave, and the third hollow cathode is electrically connected to the third output wave. Electrical current flows between the at least three hollow cathodes that are out of electrical phase.
    Type: Application
    Filed: November 16, 2015
    Publication date: May 18, 2017
    Applicants: AGC Flat Glass North America, Inc., Asahi Glass Co., Ltd., AGC Glass Europe S.A.
    Inventors: John Chambers, Peter MASCHWITZ
  • Publication number: 20170140903
    Abstract: A method of producing a plasma is provided. The method includes providing at least three hollow cathodes, including a first hollow cathode, a second hollow cathode, and a third hollow cathode. Each hollow cathode has a plasma exit region. The method further includes providing a source of power capable of producing multiple output waves, including a first output wave, a second output wave, and a third output wave. The first output wave and the second output wave are out of phase, the second output wave and the third output wave are out of phase, and the first output wave and the third output wave are out of phase. Each hollow cathode is electrically connected to the source of power such that the first hollow cathode is electrically connected to the first output wave, the second hollow cathode is electrically connected to the second output wave, and the third hollow cathode is electrically connected to the third output wave.
    Type: Application
    Filed: November 16, 2015
    Publication date: May 18, 2017
    Applicants: AGC Flat Glass North America, Inc., Asahi Glass Co., Ltd., AGC Glass Europe S.A.
    Inventors: John CHAMBERS, Peter MASCHWITZ
  • Patent number: 9478401
    Abstract: The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.
    Type: Grant
    Filed: January 6, 2014
    Date of Patent: October 25, 2016
    Assignees: AGC FLAT GLASS NORTH AMERICA, INC., ASAHI GLASS CO., LTD., AGC GLASS EUROPE S.A.
    Inventor: Peter Maschwitz
  • Patent number: 9067822
    Abstract: The invention provides low-emissivity stacks being characterized by a low solar heat gain coefficient (SHGC), enhanced aesthetics, mechanical and chemical durability, and a tolerance for tempering or heat strengthening. The invention moreover provides low-emissivity coatings comprising, in order outward from the substrate a first dielectric layer; a first nucleation layer; a first Ag layer; a first barrier layer; a second dielectric layer; a second nucleation layer; a second Ag layer; a second barrier layer; a third dielectric layer; and optionally, a topcoat layer, and methods for depositing such coatings on substrates.
    Type: Grant
    Filed: February 2, 2011
    Date of Patent: June 30, 2015
    Assignee: AGC FLAT GLASS NORTH AMERICA, INC.
    Inventors: Peter Maschwitz, Keith Grubb, Dominique Coster, Daniel Decroupet
  • Publication number: 20150002021
    Abstract: The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.
    Type: Application
    Filed: September 15, 2014
    Publication date: January 1, 2015
    Applicants: AGC Flat Glass North America, Inc., Asahi Glass Co., Ltd., AGC Glass Europe S.A.
    Inventor: Peter MASCHWITZ
  • Publication number: 20150004330
    Abstract: The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.
    Type: Application
    Filed: September 15, 2014
    Publication date: January 1, 2015
    Applicants: AGC Flat Glass North America, Inc., Asahi Glass Co., Ltd., AGC Glass Europe S.A.
    Inventor: Peter Maschwitz
  • Publication number: 20140216343
    Abstract: The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.
    Type: Application
    Filed: January 6, 2014
    Publication date: August 7, 2014
    Applicants: AGC Flat Glass North America, Inc., AGC Glass Europe, Asahi Glass Co., Ltd.
    Inventor: Peter MASCHWITZ