Patents by Inventor Peter Paul Steijaert

Peter Paul Steijaert has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 10620553
    Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.
    Type: Grant
    Filed: February 25, 2019
    Date of Patent: April 14, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Jan Steven Christiaan Westerlaken, Gerardus Arnoldus Hendricus Franciscus Janssen, Peter Paul Steijaert, Engelbertus Antonius Fransiscus Van Der Pasch, Franciscus Van De Mast
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20190235398
    Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.
    Type: Application
    Filed: February 25, 2019
    Publication date: August 1, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jan Steven Christiaan WESTERLAKEN, Gerardus Arnoldus Hendricus Franciscus JANSSEN, Peter Paul STEIJAERT, Engelbertus Antonius Fransiscus VAN DER PASCH, Franciscus VAN DE MAST
  • Lithographic apparatus and device manufacturing method
    Patent number: 10216102
    Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.
    Type: Grant
    Filed: February 12, 2018
    Date of Patent: February 26, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Jan Steven Christiaan Westerlaken, Gerardus Arnoldus Hendricus Franciscus Janssen, Peter Paul Steijaert, Engelbertus Antonius Fransiscus Van Der Pasch, Franciscus Van De Mast
  • Lithographic apparatus and a method of operating the apparatus
    Patent number: 10175585
    Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.
    Type: Grant
    Filed: August 29, 2014
    Date of Patent: January 8, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Robert Douglas Watso, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Peter Paul Steijaert, Antonius Martinus Cornelis Petrus De Jong, Jimmy Matheus Wilhelmus Van De Winkel, Joao Paulo Da Paz Sena, Maurice Martinus Johannes Van Der Lee, Henricus Martinus Dorotheus Van Lier, Gheorghe Tanasa
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20180164705
    Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet,
    Type: Application
    Filed: February 12, 2018
    Publication date: June 14, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jan Steven Christiaan WESTERLAKEN, Gerardus Arnoldus Hendricus Franciscus JANSSEN, Peter Paul STEIJAERT, Engelbertus Antonius Fransiscus VAN DER PASCH, Franciscus VAN DE MAST
  • Lithographic apparatus and device manufacturing method
    Patent number: 9891542
    Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.
    Type: Grant
    Filed: December 21, 2016
    Date of Patent: February 13, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jan Steven Christiaan Westerlaken, Gerardus Arnoldus Hendricus Franciscus Janssen, Peter Paul Steijaert, Engelbertus Antonius Fransiscus Van Der Pasch, Franciscus Van De Mast
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170242349
    Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.
    Type: Application
    Filed: December 21, 2016
    Publication date: August 24, 2017
    Inventors: Jan Steven Christiaan Westerlaken, Gerardus Arnoldus Hendricus Franciscus Janssen, Peter Paul Steijaert, Engelbertus Antonius Fransiscus Van Der Pasch, Franciscus Van De Mast
  • Lithographic apparatus and device manufacturing method
    Patent number: 9529277
    Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.
    Type: Grant
    Filed: March 13, 2015
    Date of Patent: December 27, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jan Steven Christiaan Westerlaken, Gerardus Arnoldus Hendricus Franciscus Janssen, Peter Paul Steijaert, Engelbertus Antonius Fransiscus Van Der Pasch, Franciscus Van De Mast
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150185624
    Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.
    Type: Application
    Filed: March 13, 2015
    Publication date: July 2, 2015
    Inventors: Jan Steven Christiaan WESTERLAKEN, Gerardus Arnoldus Hendricus Franciscus JANSSEN, Peter Paul STEIJAERT, Engelbertus Antonius Fransiscus VAN DER PASCH, Franciscus VAN DE MAST
  • Lithographic apparatus and device manufacturing method
    Patent number: 8988650
    Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.
    Type: Grant
    Filed: August 22, 2011
    Date of Patent: March 24, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Jan Steven Christiaan Westerlaken, Engelbertus Antonius Fransiscus Van Der Pasch, Peter Paul Steijaert, Franciscus Van De Mast, Gerardus Arnoldus Hendricus Franciscus Janssen
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20150055102
    Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.
    Type: Application
    Filed: August 29, 2014
    Publication date: February 26, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Robert Douglas WATSO, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Peter Paul Steijaert, Antonius Martinus Cornelis Petrus De Jong, Jimmy Matheus Wilhelmus Van De Winkel, Joao Paulo Da Paz Sena, Maurice Martinus Johannes Van Der Lee, Henricus Martinus Dorotheus Van Lier, Gheorghe Tanasa
  • Lithographic apparatus having an encoder type position sensor system
    Patent number: 8836913
    Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
    Type: Grant
    Filed: November 30, 2011
    Date of Patent: September 16, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Paul Steijaert, Wilhelmus Josephus Box, Emiel Jozef Eussen, Erik Roelof Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Ruud Antonius Catharina Maria Beerens, Albertus Adrianus Smits
  • Lithographic apparatus and a method of operating the apparatus
    Patent number: 8823918
    Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.
    Type: Grant
    Filed: April 22, 2009
    Date of Patent: September 2, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Robert Douglas Watso, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Peter Paul Steijaert, Anthonius Martinus Cornelis Petrus De Jong, Jimmy Matheus Wilhelmus Van De Winkel, Joao Paulo Da Paz Sena, Maurice Martinus Johannes Van Der Lee, Henricus Martinus Dorotheus Van Lier, Gheorghe Tanasa
  • Lithographic apparatus having encoder type position sensor system
    Patent number: 8760615
    Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
    Type: Grant
    Filed: May 23, 2008
    Date of Patent: June 24, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Paul Steijaert, Wilhelmus Josephus Box, Emiel Jozef Eussen, Erik Roelof Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Ruud Antonius Catharina Maria Beerens, Albertus Adrianus Smits
  • Lithographic apparatus having an encoder position sensor system
    Patent number: 8687166
    Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
    Type: Grant
    Filed: May 24, 2007
    Date of Patent: April 1, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Paul Steijaert, Wilhelmus Josephus Box, Emiel Jozef Melanie Eussen, Erik Roelof Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Ruud Antonius Catharina Maria Beerens, Albertus Adrianus Smits
  • Lithographic Apparatus Having an Encoder Type Position Sensor System
    Publication number: 20120075613
    Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
    Type: Application
    Filed: November 30, 2011
    Publication date: March 29, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Peter Paul STEIJAERT, Wilhelmus Josephus Box, Emiel Jozef Eussen, Erik Roelof Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Ruud Antonius Catharina Maria Beerens, Albertus Adrianus Smits
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120052447
    Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.
    Type: Application
    Filed: August 22, 2011
    Publication date: March 1, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jan Steven Christiaan WESTERLAKEN, Engelbertus Antonius Fransiscus VAN DER PASCH, Peter Paul STEIJAERT, Franciscus VAN DE MAST, Gerardus Arnoldus Hendricus Franciscus JANSSEN
  • Substrate support and lithographic process
    Patent number: 7791709
    Abstract: A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part positioned around the central part. The substrate support further includes a thermal decoupler arranged to decrease heat transport between the central part and the peripheral part.
    Type: Grant
    Filed: December 7, 2007
    Date of Patent: September 7, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Pieter Renaat Maria Hennus, Frits Van Der Meulen, Joost Jeroen Ottens, Peter Paul Steijaert, Hubert Matthieu Richard Steijns, Peter Smits
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100165319
    Abstract: An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
    Type: Application
    Filed: December 18, 2009
    Publication date: July 1, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Hernes Jacobs, Noud Jan Gilissen, Hans Jansen, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens, Harmen Klaas Van Der Schoot, Marco Koert Stavenga, Bob Streefkerk, Peter Paul Steijaert, Marcus Martinus Petrus Adrianus Vermeulen, Jan Cornelis Van Der Hoeven
  • Lithographic apparatus and device manufacturing method
    Patent number: 7656502
    Abstract: An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
    Type: Grant
    Filed: June 22, 2006
    Date of Patent: February 2, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Harmen Klaus Van Der Schoot, Noud Jan Gilissen, Peter Paul Steijaert, Erik Roelof Loopstra, Nicolaas Rudolf Kemper, Nicolaas Ten Kate, Johannes Catharinus Hubertus Mulkens, Martinus Hendrikus Antonius Leenders, Hans Jansen, Marco Koert Stavenga, Jan Cornelis Van Der Hoeven, Bob Streefkerk, Hernes Jacobs, Marcus Martinus Petrus Adrianus Vermeulen