Patents by Inventor Peter Peeters

Peter Peeters has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11918332
    Abstract: An inductive sensing device comprises first (16) and second (24) loops, the first loop (16) being coupled with a capacitor to form a resonator circuit (20), and the resonator circuit and second loop being coupled via an active buffering component (28). The active buffering component provides voltage to current amplification, and an output of the buffering component drives a current in the second loop. Conductive lines forming each of the first and second loop parts are radially spaced apart.
    Type: Grant
    Filed: August 28, 2019
    Date of Patent: March 5, 2024
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventors: Wouter Herman Peeters, Jacobus Josephus Leijssen, Gerardus Johannes Nicolaas Doodeman, Rick Bezemer, Mark Peter Paul Kleijnen, Ronny Hubertus Johannes Grosfeld
  • Publication number: 20230149077
    Abstract: According to an aspect, there is provided a personal care device (52) for performing a light-based hair removal or photo-epilation operation on a body of a subject. The personal care device (52) comprises a housing (54) that includes a first window or opening (68), a light source configured to generate light to perform the light-based hair removal or photo-epilation operation, wherein the light source is arranged in the housing such that light emitted by the light source illuminates a part of the body, a receiving member in or on the housing (54) for receiving and retaining a consumer electronic device (62) in or on the personal care device (52), and an optical system (80) in the housing (54) for enabling an imaging unit (78) of a consumer electronic device (62) retained in the recess (60) to obtain images of a part of the body via the first window or opening (68).
    Type: Application
    Filed: April 14, 2021
    Publication date: May 18, 2023
    Inventors: Edgar VAN GOOL, Felix Godfried Peter PEETERS, Marjolein Yvonne JANSEN, Eyob Atanfu AMRA, Eric Gerard Marie VAN KEMPEN, Lars Christian CASPER, Wilbert Bernard Roger PENNINGS, Tim TIELEMANS
  • Patent number: 10705432
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: March 15, 2019
    Date of Patent: July 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Publication number: 20190212662
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Application
    Filed: March 15, 2019
    Publication date: July 11, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich KOLESNYCHENKO, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Patent number: 10234768
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: May 3, 2018
    Date of Patent: March 19, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Publication number: 20180246418
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Application
    Filed: May 3, 2018
    Publication date: August 30, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Patent number: 9989861
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: November 27, 2017
    Date of Patent: June 5, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Publication number: 20180140329
    Abstract: The invention provides a microdermabrasion device (1) comprising a vacuum system (100) and a device tip (200), wherein the vacuum system (100) is in fluid communication with a channel inlet (120) at an inlet zone (1200) of the device tip (200), wherein the vacuum system (100) is configured to apply a vacuum to the inlet zone (1200), wherein the inlet zone (1200) further comprises an sensor (400) configured to measure a skin parameter of a part of a skin in the inlet zone (1200) and to provide a corresponding sensor signal, wherein the device tip (200) further comprises a microdermabrasion zone (1240) configured to abrade a part of said skin, and wherein the microdermabrasion device (1) further comprises a control unit (500) configured to control the vacuum as function of sensor signal information derived from the sensor signal and a predetermined relation between the sensor signal information and a vacuum setting.
    Type: Application
    Filed: May 26, 2016
    Publication date: May 24, 2018
    Inventors: LINDA GOVERDINA MARIA BEIJENS, MARTIN JURNA, MARJOLEIN YVONNE JANSEN, FELIX GODFRIED PETER PEETERS
  • Publication number: 20180081282
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Application
    Filed: November 27, 2017
    Publication date: March 22, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich KOLESNYCHENKO, Johannes Jacobus Matheus BASELMANS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Hans JANSEN, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Felix Godfried Peter PEETERS, Bob STREEFKERK, Franciscus Johannes Herman Maria TEUNISSEN, Helmar VAN SANTEN
  • Publication number: 20170360464
    Abstract: The present invention relates to a device for microdermabrasive treatment comprising, a treatment head (16) having a cavity (18) with inner walls (20), an opening (22) in said inner walls, and a treatment head tip (24) for placing the treatment head (16) on a skin (48) of the user, wherein the treatment head tip (24) comprises a first abrasive surface (26) and the inner walls (20) comprise a second abrasive surface (28), wherein the opening (22) is configured to be connected to a vacuum source (30) for applying an under-pressure (58) within the cavity (18), when the treatment head tip (24) is placed on the skin (48) of the user, and herein the first abrasive surface (26) comprises a different roughness than the second abrasive surface (28).
    Type: Application
    Filed: December 3, 2015
    Publication date: December 21, 2017
    Applicant: KONINKLIJKE PHILIPS N.V.
    Inventors: MARTIN JURNA, LINDA GOVERDINA MARIA BEIJENS, FELIX GODFRIED PETER PEETERS
  • Patent number: 9829799
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: February 13, 2017
    Date of Patent: November 28, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Publication number: 20170153557
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Application
    Filed: February 13, 2017
    Publication date: June 1, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich KOLESNYCHENKO, Johannes Jacobus Matheus BASELMANS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Hans JANSEN, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Felix Godfried Peter PEETERS, Bob STREEFKERK, Franciscus Johannes Herman Maria TEUNISSEN, Helmar VAN SANTEN
  • Patent number: 9568840
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: December 1, 2015
    Date of Patent: February 14, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Patent number: 9304401
    Abstract: A radiation spot measurement system for a lithographic apparatus, the system having a target onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target. The system further includes a radiation detector to detect radiation from one of the spots, and a controller to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.
    Type: Grant
    Filed: February 22, 2012
    Date of Patent: April 5, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Felix Godfried Peter Peeters, Jozef Petrus Henricus Benschop, Michael Jozef Mathijs Renkens, Gregor Edward Van Baars, Jeroen Dekkers
  • Publication number: 20160085161
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Application
    Filed: December 1, 2015
    Publication date: March 24, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich KOLESNYCHENKO, Johannes Jacobus Matheus BASELMANS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Hans JANSEN, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Felix Godfried Peter PEETERS, Bob STREEFKERK, Franciscus Johannes Herman Maria TEUNISSEN, Helmar VAN SANTEN
  • Patent number: 9207543
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: May 8, 2014
    Date of Patent: December 8, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Publication number: 20140296179
    Abstract: The present invention provides a method and composition for the treatment and/or prevention of infection, said method comprising orally administering a composition to a mammal, said composition comprising a galactose containing indigestible oligosaccharide and immunoglobulin from the milk or colostrum of hyperimmunized cows.
    Type: Application
    Filed: March 5, 2014
    Publication date: October 2, 2014
    Applicant: N.V. NUTRICIA
    Inventors: Günther BOEHM, Laura M'RABET, Bernd STAHL, Johan GARSSEN, Antony William SCAMMELL, Raymonde Peter PEETERS
  • Publication number: 20140253890
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Application
    Filed: May 8, 2014
    Publication date: September 11, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich KOLESNYCHENKO, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Patent number: 8755033
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: September 22, 2011
    Date of Patent: June 17, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Patent number: 8704998
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: January 24, 2011
    Date of Patent: April 22, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen