Patents by Inventor Peter Schaap

Peter Schaap has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for compensating for an exposure error, a device manufacturing method, a substrate table, a lithographic apparatus, a control system, a method for measuring reflectivity and a method for measuring a dose of EUV radiation
    Patent number: 9983489
    Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.
    Type: Grant
    Filed: April 24, 2015
    Date of Patent: May 29, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Christianus Wilhelmus Johannes Berendsen, Marcel Beckers, Henricus Jozef Castelijns, Hubertus Antonius Geraets, Adrianus Hendrik Koevoets, Leon Martin Levasier, Peter Schaap, Bob Streefkerk, Siegfried Alexander Tromp
  • Method For Compensating for an Exposure Error, a Device Manufacturing Method, a Substrate Table, a Lithographic Apparatus, a Control System, a Method for Measuring Reflectivity and a Method for Measuring a Dose of EUV Radiation
    Publication number: 20170115578
    Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.
    Type: Application
    Filed: April 24, 2015
    Publication date: April 27, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Christianus Wilhelmus Johannes BERENDSEN, Marcel BECKERS, Henricus Jozef CASTELIJNS, Hubertus Antonius GERAETS, Adrianus Hendrik KOEVOETS, Leon Martin LEVASIER, Peter SCHAAP, Bob STREEFKERK, Siegfried Alexander TROMP
  • Lithographic apparatus, device manufacturing method and exchangeable optical element
    Patent number: 7724351
    Abstract: A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.
    Type: Grant
    Filed: January 30, 2006
    Date of Patent: May 25, 2010
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Erik Roelof Loopstra, Adrianus Franciscus Petrus Engelen, Bernardus Antonius Johannes Luttikhuis, Maria Johanna Agnes Rubingh, Johannes Martinus Andreas Hazenberg, Laurentius Catrinus Jorritsma, Johannes Wilhelmus De Klerk, Bernhard Geuppert, Aart Adrianus Van Beuzekom, Petrus Franciscus Wilhelmus Maria Mandigers, Franz Sorg, Peter Deufel, Peter Schaap
  • Stage apparatus, lithographic apparatus and device manufacturing method
    Patent number: 7459701
    Abstract: A stage apparatus for displacing an object having a substantially flat surface is described. The apparatus includes an object table for supporting the object and a positioning device for displacing the object table in a first direction. The apparatus further includes a clamping device for clamping the object to the object table by a first clamping force, the first clamping force being controlled by an electronic control unit based upon a state of the object.
    Type: Grant
    Filed: June 8, 2005
    Date of Patent: December 2, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Marcel Koenraad Marie Baggen, Dirk-Jan Bijvoet, Sjoerd Nicolaas Lambertus Donders, Jan Frederik Hoogkamp, Albert Johannes Maria Jansen, Jan-Jaap Kuit, Peter Schaap, Joep Janssen, Hubrecht Bastiaan Jasperse, Arjan Martin Van Der Wel
  • Lithographic apparatus, device manufacturing method and device manufactured thereby
    Patent number: 7440076
    Abstract: A lithographic apparatus arranged to transfer a pattern from a patterning structure onto a substrate is disclosed that includes a substrate holder configured to hold a substrate and a substrate temperature conditioner configured to condition a temperature of the substrate prior to, during, or both, a transfer of the substrate to the substrate holder to substantially match a temperature of the substrate holder.
    Type: Grant
    Filed: September 29, 2005
    Date of Patent: October 21, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Jan Jaap Kuit, Peter Schaap
  • Lithographic apparatus, device manufacturing method and device manufactured thereby
    Publication number: 20070070324
    Abstract: A lithographic apparatus arranged to transfer a pattern from a patterning structure onto a substrate is disclosed that includes a substrate holder configured to hold a substrate and a substrate temperature conditioner configured to condition a temperature of the substrate prior to, during, or both, a transfer of the substrate to the substrate holder to substantially match a temperature of the substrate holder.
    Type: Application
    Filed: September 29, 2005
    Publication date: March 29, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jan Jaap Kuit, Peter Schaap
  • Stage apparatus, lithographic apparatus and device manufacturing method
    Publication number: 20060279721
    Abstract: A stage apparatus for displacing an object having a substantially flat surface is described. The apparatus includes an object table for supporting the object and a positioning device for displacing the object table in a first direction. The apparatus further includes a clamping device for clamping the object to the object table by a first clamping force, the first clamping force being controlled by an electronic control unit based upon a state of the object.
    Type: Application
    Filed: June 8, 2005
    Publication date: December 14, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marcel Baggen, Dirk-Jan Bijvoet, Sjoerd Donders, Jan Hoogkamp, Albert Jansen, Jan-Jaap Kuit, Peter Schaap, Joep Janssen, Hubrecht Jasperse, Arjan Van Der Wel