Abstract: A machine may form all or part of a network-based system configured to provide media service to one or more user devices. The machine may be configured to define a station library within a larger collection of media files. In particular, the machine may access metadata that describes a seed that forms the basis on which the station library is to be defined. The machine may determine a genre composition for the station library based on the metadata. The machine may generate a list of media files from the metadata based on a relevance of each media file to the station library. The machine may determine the relevance of each media file based on a similarity of the media file to the genre composition of the station library as well as a comparison of metadata describing the media file to the accessed metadata that describes the seed.

Abstract: Systems and methods are provided for filtering at least one media content catalog based on criteria for a station library to generate a first list of candidate tracks for the station library, combining a similarity score and a popularity score for each track of the first list of candidate tracks to generate a total score for each track of the first list of candidate tracks, generating a list of top ranked tracks for the first genre, and returning the list of top ranked tracks of the first genre as part of the station library.

Abstract: Described herein are systems and methods of for measuring and assuring performance in networked applications where edge computing is utilized, which may comprise determining or improving network and computational performance by the use of edge probing. Edge probing enables rapid measurement and assessment of networking and computational performance, where performance comprises speed latency, for a device using an edge compute node. Edge probing can be used to assess performance of and assign converged networking and computing infrastructure to applications and devices.

Abstract: A Digital Subscriber Line (DSL) Management Center (DMC) coupled to a DSL network includes a data collection module that receives information regarding the DSL network from a plurality of sources. An analysis module is coupled to the data collection module to analyze the received information and issue a command for one or more of a plurality of DSL performance enhancement devices to optimize their operation. A command signal generation module is coupled to the analysis module to receive the issued command from the analysis module and generate a corresponding command signal for transmission to one or more of the DSL performance enhancement devices.

Abstract: A Digital Subscriber Line (DSL) Management Center (DMC) coupled to a DSL network includes a data collection module that receives information regarding the DSL network from a plurality of sources. An analysis module is coupled to the data collection module to analyze the received information and issue a command for one or more of a plurality of DSL performance enhancement devices to optimize their operation. A command signal generation module is coupled to the analysis module to receive the issued command from the analysis module and generate a corresponding command signal for transmission to one or more of the DSL performance enhancement devices.

Abstract: A Digital Subscriber Line (DSL) Management Center (DMC) coupled to a DSL network includes a data collection module that receives information regarding the DSL network from a plurality of sources. An analysis module is coupled to the data collection module to analyze the received information and issue a command for one or more of a plurality of DSL performance enhancement devices to optimize their operation. A command signal generation module is coupled to the analysis module to receive the issued command from the analysis module and generate a corresponding command signal for transmission to one or more of the DSL performance enhancement devices.

Abstract: A Digital Subscriber Line (DSL) Management Center (DMC) coupled to a DSL network includes a data collection module that receives information regarding the DSL network from a plurality of sources. An analysis module is coupled to the data collection module to analyze the received information and issue a command for one or more of a plurality of DSL performance enhancement devices to optimize their operation. A command signal generation module is coupled to the analysis module to receive the issued command from the analysis module and generate a corresponding command signal for transmission to one or more of the DSL performance enhancement devices.

Abstract: Methods, techniques, computer program products, apparatus, devices, etc., used in connection with DSL Management Interfaces, significantly improve the management capabilities of a DSL network and/or improve testing relating to DSL equipment and services by permitting better control and operation of a DSL system, including implementation of timestamping for more accurate measurement, monitoring and control of a system. Timestamping further allows customized data collection techniques, where a DSL line can be measured or monitored at intervals whose frequency depends on the line's stability. Moreover, data parameter read and control parameter write operations are presented in conjunction with the use of timestamping. Also, control and operation of a DSL system is enhanced by implementing bit-loading that minimizes, eliminates or otherwise mitigates the amount by which the SNR margin per tone exceeds a maximum SNR margin quantity, where such bit-loading can be selected through an appropriate interface.

Abstract: Techniques, methods, and structures disclosed in relation to extreme ultraviolet (EUV) lithography in semiconductor processing. In one exemplary implementation, a method may comprise using ion beam deposition to deposit a first multilayer stack of thin films on a substrate to planarize and smooth surface defects on the substrate. The method includes using atomic layer deposition to deposit a second multilayer stack of thin films on the first multilayer stack of thin films. The second multilayer stack of thin films may comprise an extreme ultraviolet reflective multilayer stack. The second multilayer stack of thin films may comprise fewer surface defects than the first multilayer stack of thin films. The method may further comprise processing an extreme ultraviolet mask blank to form an extreme ultraviolet reflective mask.

Abstract: An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

Abstract: Operator-controlled implementations of user preferences are provided when feasible. User preference data is obtained by the operator and compared to operational characteristics and parameters of a communication system, such as a DSL system, to determine whether one or more of the user preferences can be implemented in the communication system. When implementation of a user preference would violate operational rules of the system, or where implementation would adversely affect system operation, the preference need not be implemented. However, when a user preference can be implemented in the system without causing problems, the operator can implement (or permit another party to implement) the user preference to effect the user's desires. The user preference data can be obtained directly from users (for example, by surveys and other direct user feedback) or can be obtained indirectly (for example, by constructing a Hidden Markov Model that shows user preferences).

Abstract: Methods, apparatus and computer program products allow a user of DSL or the like to implement user preferences to the extent feasible in light of operational limits and conditions. In some embodiments, an operational profile is imposed on the user. User preference data is evaluated to determine the extent to which one or more user preferences can be implemented in light of the operational profile. One or more controllers can assist in collecting user preference data, evaluating the user preference data, operational data and other data and information, and implementing user preferences as feasible. Evaluation of the user preference data and operational profile and/or data can include considering the compatibility of the user's preferences and the operational profile and/or data.

Abstract: A system and method for collecting radiation, which may be used in a lithography illumination system. The system comprises a first surface shaped to reflect radiation in a first hemisphere of a source to illuminate in a second hemisphere of the source; and a second surface shaped to reflect radiation in the second hemisphere of the source to an output plane.

Abstract: An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

Abstract: An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

Abstract: An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

Abstract: Embodiments of the invention provide a beam generator to produce an atomic beam that travels across a patterned surface of a reticle. The beam may interact with particles to prevent the particles from contaminating the reticle.

Abstract: Techniques, methods, and structures disclosed in relation to extreme ultraviolet (EUV) lithography in semiconductor processing. In one exemplary implementation, a method may comprise using ion beam deposition to deposit a first multilayer stack of thin films on a substrate to planarize and smooth surface defects on the substrate. The method includes using atomic layer deposition to deposit a second multilayer stack of thin films on the first multilayer stack of thin films. The second multilayer stack of thin films may comprise an extreme ultraviolet reflective multilayer stack. The second multilayer stack of thin films may comprise fewer surface defects than the first multilayer stack of thin films. The method may further comprise processing an extreme ultraviolet mask blank to form an extreme ultraviolet reflective mask.