Patents by Inventor Peter Simon Antonius KNAPEN
Peter Simon Antonius KNAPEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240027893Abstract: A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.Type: ApplicationFiled: July 11, 2023Publication date: January 25, 2024Applicant: ASML NETHERLANDS B.V.Inventors: David Ferdinand VLES, Chaitanya Krishna ANDE, Antonius Franciscus Johannes DE GROOT, Adrianus Johannes Maria GIESBERS, Johannes Joseph JANSSEN, Paul JANSSEN, Johan Hendrik KLOOTWIJK, Peter Simon Antonius KNAPEN, Evgenia KURGANOVA, Marcel Peter MEIJER, Wouter Rogier MEIJERINK, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Raymond OLSMAN, Hrishikesh PATEL, Mária PÉTER, Gerrit VAN DEN BOSCH, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, Hendrikus Jan WONDERGEM, Aleksandar Nikolov ZDRAVKOV
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Patent number: 11754918Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.Type: GrantFiled: December 13, 2021Date of Patent: September 12, 2023Assignee: ASML NETHERLANDS B.V.Inventors: David Ferdinand Vles, Chaitanya Krishna Ande, Antonius Franciscus Johannes De Groot, Adrianus Johannes Maria Giesbers, Johannes Joseph Janssen, Paul Janssen, Johan Hendrik Klootwijk, Peter Simon Antonius Knapen, Evgenia Kurganova, Marcel Peter Meijer, Wouter Rogier Meijerink, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Raymond Olsman, Hrishikesh Patel, Mária Péter, Gerrit Van Den Bosch, Wilhelmus Theodorus Anthonius Johannes Van Den Einden, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, Hendrikus Jan Wondergem, Aleksandar Nikolov Zdravkov
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Publication number: 20220121111Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.Type: ApplicationFiled: December 13, 2021Publication date: April 21, 2022Applicant: ASML NETHERLANDS B.V.Inventors: David Ferdinand VLES, Chaitanya Krishna ANDE, Antonius Franciscus Johannes DE GROOT, Adrianus Johannes Maria GIESBERS, Johannes Joseph JANSSEN, Paul JANSSEN, Johan Hendrik KLOOTWIJK, Peter Simon Antonius KNAPEN, Evgenia KURGANOVA, Marcel Peter MEIJER, Wouter Rogier MEIJERINK, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Raymond OLSMAN, Hrishikesh PATEL, Mária PÉTER, Gerrit VAN DEN BOSCH, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, Hendrikus Jan WONDERGEM, Aleksandar Nikolov ZDRAVKOV
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Publication number: 20220035239Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.Type: ApplicationFiled: October 2, 2019Publication date: February 3, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Pieter-Jan VAN ZWOL, Sander BALTUSSEN, Dennis DE GRAAF, Johannes Christiaan Leonardus FRANKEN, Adrianus Johannes Maria GIESBERS, Alexander Ludwig KLEIN, Johan Hendrik KLOOTWIJK, Peter Simon Antonius KNAPEN, Evgenia KURGANOVA, Alexey Sergeevich KUZNETSOV, Arnoud Willem NOTENBOOM, Mahdiar VALEFI, Marcus Adrianus VAN DE KERKHOF, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Ties Wouter VAN DER WOORD, Hendrikus Jan WONDERGEM, Aleksandar Nikolov ZDRAVKOV
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Patent number: 11231646Abstract: A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.Type: GrantFiled: June 8, 2018Date of Patent: January 25, 2022Assignee: ASML Netherlands B.V.Inventors: David Ferdinand Vles, Chaitanya Krishna Ande, Antonius Franciscus Johannes De Groot, Adrianus Johannes Maria Giesbers, Johannes Joseph Janssen, Paul Janssen, Johan Hendrik Klootwijk, Peter Simon Antonius Knapen, Evgenia Kurganova, Marcel Peter Meijer, Wouter Rogier Meijerink, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Raymond Olsman, Hrishikesh Patel, Mária Péter, Gerrit Van Den Bosch, Wilhelmus Theodorus Anthonius Johannes Van Den Einden, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, Hendrikus Jan Wondergem, Aleksandar Nikolov Zdravkov
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Publication number: 20200209736Abstract: A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.Type: ApplicationFiled: June 8, 2018Publication date: July 2, 2020Applicant: ASML NETHERLANDS B.V.Inventors: David Ferdinand VLES, Chaitanya Krishna ANDE, Antonius Franciscus Johannes DE GROOT, Adrianus Johannes Maria GIESBERS, Johannes Joseph JANSSEN, Paul JANSSEN, Johan Flendrik KLOOTWIJK, Peter Simon Antonius KNAPEN, Evgenia KURGANOVA, Marcel Peter MEIJER, Wouter Rogier MEIJERINK, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Raymond OLSMAN, Hrishikesh PATEL, Maria PETER, Gerrit VAN DEN BOSCH, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, Hendrikus Jan WONDERGEM, Aleksandar Nikolov ZDRAVKOV
