Abstract: A structured layer arrangement includes a planar carrier substrate, on the functional-effective side of which a structured chromium layer is arranged. This includes chromium areas alternating with uncoated areas of the carrier substrate. Above the chromium layer, a two-dimensional reactive layer is arranged, which has a higher photocatalytic activity in partial areas above the chromium areas than in partial areas above the uncoated areas of the carrier substrate.

Abstract: A grating structure for a diffractive optic includes grating lines, each of which is approximated by successive segments. Longitudinal axes of the segments each have an angle relative to a first coordinate axis of a reference coordinate system. A first section of a first one of the grating lines is approximated by a first group of the segments, and a second section adjacent to the first section of the first grating line is approximated by a second group of segments. The longitudinal axes of a major portion of the segments of the first group have a first predetermined angle relative to the first coordinate axis of the reference coordinate system, and the longitudinal axes of a major portion of the segments of the second group have a second predetermined angle different from the first predetermined angle relative to the first coordinate axis of the reference coordinate system.

Abstract: A scanning reticle for an optical position measuring device includes a substrate having an upper surface, operating in transmission, and having different functional regions. The upper surface includes at least one region having a grating made up of gaps and ribs, the ribs being formed in the substrate. The upper surface includes an antireflection layer, which is discontinuous in the region of the gaps.

Abstract: A grating structure for a diffractive optic includes grating lines, each of which is approximated by successive segments. Longitudinal axes of the segments each have an angle relative to a first coordinate axis of a reference coordinate system. A first section of a first one of the grating lines is approximated by a first group of the segments, and a second section adjacent to the first section of the first grating line is approximated by a second group of segments. The longitudinal axes of a major portion of the segments of the first group have a first predetermined angle relative to the first coordinate axis of the reference coordinate system, and the longitudinal axes of a major portion of the segments of the second group have a second predetermined angle different from the first predetermined angle relative to the first coordinate axis of the reference coordinate system.

Abstract: A method for machining a scale of a position-measuring system is provided for such a scale having, on a first surface, a measuring graduation and, on a second surface, is attachable to a carrier body. The first and second surfaces are bounded respectively by first and second edges in a region of a lateral peripheral side edge. The scale is machined to produce a defined outer contour of the scale such that a raised ridge of material is formed at each of the first and second edges. The scale is machined differently at the first edge than at the second edge in such a manner that a dimension of the raised ridge of material at the first edge perpendicular to the first surface is smaller than a dimension of the raised ridge of material at the second edge perpendicular to the second surface.

Abstract: A scanning reticle for an optical position measuring device includes a substrate having an upper surface, operating in transmission, and having different functional regions. The upper surface includes at least one region having a grating made up of gaps and ribs, the ribs being formed in the substrate. The upper surface includes an antireflection layer, which is discontinuous in the region of the gaps.

Abstract: An optical position-measuring device includes a scale and a scanning reticle, whose relative position is determinable in three linearly independent spatial directions using interfering light beams. A splitter grating is disposed on the scanning reticle and adapted to split light into sub-beams of different diffraction orders. An optical grating is disposed on the scale and adapted to further split the sub-beams and to recombine them after they have been reflected back from the scanning reticle. Grating fields configured as phase gratings are disposed on a side of the scanning reticle that faces the scale. The grating fields act as diffractive optics that influence the further split sub-beams. The grating fields have different step heights. An output grating is disposed on the scanning reticle and adapted to output, as interfering sub-beams, light that has been multiply reflected between the scale and the scanning reticle.

Abstract: An optical layer system for a position-measuring device includes at least first, second and third functional surfaces disposed on a surface of a transparent substrate. Each of the functional surfaces have a different optical function. The functional surfaces are composed of a first layer stack and a second layer stack.

Abstract: A scale for an optically scanning position-measuring device includes a carrier and a reflective layer disposed on the carrier. A transparent spacer layer is disposed on the reflective layer. The spacer layer has a patterned, partially transparent layer thereon which defines a bright/dark pattern in which regions having the partially transparent layer appear dark and regions without the partially transparent layer appear bright. A sealing layer is disposed on the patterned, partially transparent layer. Products of refractive index and layer thickness are the same for the spacer layer and the sealing layer, or differ by an odd multiple.

Abstract: A method for machining a scale of a position-measuring system is provided for such a scale having, on a first surface, a measuring graduation and, on a second surface, is attachable to a carrier body. The first and second surfaces are bounded respectively by first and second edges in a region of a lateral peripheral side edge. The scale is machined to produce a defined outer contour of the scale such that a raised ridge of material is formed at each of the first and second edges. The scale is machined differently at the first edge than at the second edge in such a manner that a dimension of the raised ridge of material at the first edge perpendicular to the first surface is smaller than a dimension of the raised ridge of material at the second edge perpendicular to the second surface.

Abstract: A scale for an optically scanning position-measuring device includes a carrier and a reflective layer disposed on the carrier. A transparent spacer layer is disposed on the reflective layer. The spacer layer has a patterned, partially transparent layer thereon which defines a bright/dark pattern in which regions having the partially transparent layer appear dark and regions without the partially transparent layer appear bright. A sealing layer is disposed on the patterned, partially transparent layer. Products of refractive index and layer thickness are the same for the spacer layer and the sealing layer, or differ by an odd multiple.

Abstract: An optical position-measuring device includes a scale and a scanning reticle, whose relative position is determinable in three linearly independent spatial directions using interfering light beams. A splitter grating is disposed on the scanning reticle and adapted to split light into sub-beams of different diffraction orders. An optical grating is disposed on the scale and adapted to further split the sub-beams and to recombine them after they have been reflected back from the scanning reticle. Grating fields configured as phase gratings are disposed on a side of the scanning reticle that faces the scale. The grating fields act as diffractive optics that influence the further split sub-beams. The grating fields have different step heights. An output grating is disposed on the scanning reticle and adapted to output, as interfering sub-beams, light that has been multiply reflected between the scale and the scanning reticle.

Abstract: A position-measuring device includes a first scale and a second scale, which are arranged end-to-end to extend across a measurement range, as well as a scanning unit having a light source configured to emit a light beam. The first scale includes a reflective phase grating having first periodic marks which diffract an incident light beam into a predetermined diffraction order with a first diffraction efficiency. The second scale includes a reflective phase grating having second periodic marks that differ in shape from the first periodic marks. A reflectivity of the phase grating of the second scale is reduced compared to a reflectivity of the phase grating of the first scale to such an extent that the phase grating of the second scale diffracts the incident light beam into the predetermined diffraction order with the first diffraction efficiency.

Abstract: An optical layer system for a position-measuring device includes at least first, second and third functional surfaces disposed on a surface of a transparent substrate. Each of the functional surfaces have a different optical function. The functional surfaces are composed of a first layer stack and a second layer stack.

Abstract: A measuring graduation includes a phase grating for a photoelectric position measuring device for measuring positions in a first direction and in a second direction extending orthogonally to the first direction. The phase grating has a periodic array of grating elements in the first direction and in the second direction. The grating elements each have an outer contour that is formed by a continuous line which includes two mutually opposing first straight edges, two mutually opposing second straight edges extending perpendicularly to the first straight edges, and connecting lines extending between the first straight edges and the second straight edges. The connecting lines form an obtuse angle with the first straight edges and with the second straight edges.

Abstract: A position-measuring device includes a first scale and a second scale, which are arranged end-to-end to extend across a measurement range, as well as a scanning unit having a light source configured to emit a light beam. The first scale includes a reflective phase grating having first periodic marks which diffract an incident light beam into a predetermined diffraction order with a first diffraction efficiency. The second scale includes a reflective phase grating having second periodic marks that differ in shape from the first periodic marks. A reflectivity of the phase grating of the second scale is reduced compared to a reflectivity of the phase grating of the first scale to such an extent that the phase grating of the second scale diffracts the incident light beam into the predetermined diffraction order with the first diffraction efficiency.

Abstract: A measuring graduation includes a phase grating for a photoelectric position measuring device for measuring positions in a first direction and in a second direction extending orthogonally to the first direction. The phase grating has a periodic array of grating elements in the first direction and in the second direction. The grating elements each have an outer contour that is formed by a continuous line which includes two mutually opposing first straight edges, two mutually opposing second straight edges extending perpendicularly to the first straight edges, and connecting lines extending between the first straight edges and the second straight edges. The connecting lines form an obtuse angle with the first straight edges and with the second straight edges.

Abstract: An assembly including a substrate and a scale held on the substrate, wherein the scale has a measuring graduation, and the scale is held on the substrate by pneumatic suction. The scale is braced on the substrate via two-dimensionally distributed, spaced-apart supports, which are disposed facing a measurement area defined by the measuring graduation and wherein adjacent ones of the supports are spaced apart from one another at a mutual period that is less than a thickness of the scale. In addition, the supports have a structure such that a connection by optical contact bonding between the supports and the scale and/or between the supports and the substrate is prevented at least in the measurement area. A space between the scale and the substrate is sealed off from surroundings by a sealing structure.

Abstract: An arrangement for a scale, the arrangement including a scale having a measurement graduation that defines a measurement range and a support arranged opposite to the measurement graduation. The arrangement further includes spheres two-dimensionally distributed on the support, wherein the spheres are immovably fixed on the support and to the scale.

Abstract: An assembly including a substrate and a scale held on the substrate, wherein the scale has a measuring graduation, and the scale is held on the substrate by pneumatic suction. The scale is braced on the substrate via two-dimensionally distributed, spaced-apart supports, which are disposed facing a measurement area defined by the measuring graduation and wherein adjacent ones of the supports are spaced apart from one another at a mutual period that is less than a thickness of the scale. In addition, the supports have a structure such that a connection by optical contact bonding between the supports and the scale and/or between the supports and the substrate is prevented at least in the measurement area. A space between the scale and the substrate is sealed off from surroundings by a sealing structure.