Patents by Inventor Peter Stallhofer

Peter Stallhofer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for treating a semiconductor wafer with a gaseous medium, and semiconductor wafer treated by this process
    Publication number: 20060138539
    Abstract: A process for treating a semiconductor wafer with a gaseous medium containing hydrogen fluoride and at least one oxidizing agent which oxidizes the surface of the semiconductor wafer, involves flowing the gaseous medium onto the surface of the semiconductor wafer at a relative velocity in the range from 40 mm/s to 300 m/s. Semiconductor wafers and an SOI wafers prepared by the process have a low roughness and metal concentration in the absence of a subsequent polishing step.
    Type: Application
    Filed: December 21, 2005
    Publication date: June 29, 2006
    Applicant: Siltronic AG
    Inventors: Maximilian Stadler, Guenter Schwab, Christoph Frey, Peter Stallhofer