Abstract: A plasma deposition apparatus for making high purity silicon, including a chamber for depositing said high purity silicon, the chamber including a top defining substantially an upper end of the chamber; one or more sides having an upper end and a lower end, the top substantially sealingly joining the upper end of the one or more sides; a base defining substantially a lower end of the chamber, the base substantially sealingly joining the lower end of the one or more sides; and at least one induction coupled plasma torch disposed in the top, the at least one induction coupled plasma torch oriented in a substantially vertical position producing a plasma flame downward from the top towards the base, the plasma flame defining a reaction zone for reacting one or more reactants to produce the high purity.

Abstract: A hole cutter adapted for cutting holes through the sidewalls of medical catheters is fashioned from a hollow tube having a distal cutting end, a proximal ejection end and a lumen of smaller diameter near the cutting end. Slugs formed at the cutting end are extracted by suction applied to the ejection end, and are captured by a filter.

Abstract: A hole cutter adapted for cutting holes through the sidewalls of medical catheters is fashioned from a hollow tube having a distal cutting end, a proximal ejection end and a lumen of smaller diameter near the cutting end. Slugs formed at the cutting end are extracted by suction applied to the ejection end, and are captured by a filter.