Patents by Inventor Peter VAN PUTTEN

Peter VAN PUTTEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Actuation mechanism for accurately controlling distance in OVJP printing
    Patent number: 12043042
    Abstract: A device for use in organic vapor jet printing (OVJP) and similar arrangements includes a print head moveable in more than one degree of freedom with sufficient thermal insulation that there is little to no movement in the Z direction. One or more sensors may be used to monitor and adjust the distance between the substrate and the print head.
    Type: Grant
    Filed: April 28, 2021
    Date of Patent: July 23, 2024
    Assignee: Universal Display Corporation
    Inventors: Peter van Putten, Sven Pekelder, Mark Meuwese, Maurits Willenbroek, Piet van Rens
  • ACTUATION MECHANISM FOR ACCURATELY CONTROLLING DISTANCE IN OVJP PRINTING
    Publication number: 20210245533
    Abstract: A device for use in organic vapor jet printing (OVJP) and similar arrangements includes a print head moveable in more than one degree of freedom with sufficient thermal insulation that there is little to no movement in the Z direction. One or more sensors may be used to monitor and adjust the distance between the substrate and the print head.
    Type: Application
    Filed: April 28, 2021
    Publication date: August 12, 2021
    Inventors: Peter van Putten, Sven Pekelder, Mark Meuwese, Maurits Willenbroek, Piet van Rens
  • Actuation mechanism for accurately controlling distance in OVJP printing
    Patent number: 11014386
    Abstract: A device for use in organic vapor jet printing (OVJP) and similar arrangements includes a print head movable in more than one degree of freedom with sufficient thermal insulation that there is little to no movement in the Z direction. One or more sensors may be used to monitor and adjust the distance between the substrate and the print head.
    Type: Grant
    Filed: April 10, 2017
    Date of Patent: May 25, 2021
    Assignee: Universal Display Corporation
    Inventors: Peter van Putten, Sven Pekelder, Mark Meuwese, Maurits Willenbroek, Piet van Rens
  • Radiation source and lithographic apparatus
    Patent number: 10394141
    Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.
    Type: Grant
    Filed: July 27, 2017
    Date of Patent: August 27, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Michel Riepen, Dzmitry Labetski, Wilbert Jan Mestrom, Wim Ronald Kampinga, Jan Okke Nieuwenkamp, Jacob Brinkert, Henricus Jozef Castelijns, Nicolaas Ten Kate, Hendrikus Gijsbertus Schimmel, Hans Jansen, Dennis Jozef Maria Paulussen, Brian Vernon Virgo, Reinier Theodorus Martinus Jilisen, Ramin Badie, Albert Pieter Rijpma, Johannes Christiaan Leonardus Franken, Peter Van Putten, Gerrit Van Der Straaten
  • Radiation Source and Lithographic Apparatus
    Publication number: 20170322499
    Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.
    Type: Application
    Filed: July 27, 2017
    Publication date: November 9, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Michel RIEPEN, Dzmitry Labetski, Wilbert Jan Mestrom, Wim Ronald Kampinga, Jan Okke Nieuwenkamp, Jacob Brinkert, Henricus Jozef Castelijns, Nicolaas Ten Kate, Hendrikus Gijsbertus Schimmel, Hans Jansen, Dennis Jozef Maria Paulussen, Brian Vernon Virgo, Reinier Theodorus Martinus Jilisen, Ramin Badie, Albert Pieter Rijpma, Johannes Christiaan Leonardus Franken, Peter Van Putten, Gerrit Van Der Straaten
  • ACTUATION MECHANISM FOR ACCURATELY CONTROLLING DISTANCE IN OVJP PRINTING
    Publication number: 20170291187
    Abstract: A device for use in OVJP and similar arrangements includes a print head movable in more than one degree of freedom with sufficient thermal insulation that there is little to no movement in the Z direction. One or more sensors may be used to monitor and adjust the distance between the substrate and the print head.
    Type: Application
    Filed: April 10, 2017
    Publication date: October 12, 2017
    Inventors: Peter van Putten, Sven Pekelder, Mark Meuwese, Maurits Willenbroek, Piet van Rens
  • Radiation source and lithographic apparatus
    Patent number: 9753383
    Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.
    Type: Grant
    Filed: June 13, 2013
    Date of Patent: September 5, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Michel Riepen, Dzmitry Labetski, Wilbert Jan Mestrom, Wim Ronald Kampinga, Jan Okke Nieuwenkamp, Jacob Brinkert, Henricus Jozef Castelijns, Nicolaas Ten Kate, Hendrikus Gijsbertus Schimmel, Hans Jansen, Dennis Jozef Maria Paulussen, Brian Vernon Virgo, Reinier Theodorus Martinus Jilisen, Ramin Badie, Albert Pieter Rijpma, Johannes Christiaan Leonardus Franken, Peter Van Putten, Gerrit Van Der Straaten
  • Radiation Source and Lithographic Apparatus
    Publication number: 20150338753
    Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.
    Type: Application
    Filed: June 13, 2013
    Publication date: November 26, 2015
    Applicant: ASML Netherlands B.V.
    Inventors: Michel RIEPEN, Dzmitry LEBETSKI, Wilbert Jan MESTROM, Wim Ronald KAMPINGA, Jan Okke NIEUWENKAMP, Jacob BRINKERT, Henricus Jozef CASTELIJNS, Nicolaas TEN KATE, Hendrikus Gijsbertus SCHIMMEL, Hans JANSEN, Dennis Jozef Maria PAULUSSEN, Brian Vernon VIRGO, Reinier Theodorus Martinus JILISEN, Ramin BADIE, Albert Pieter RIJPMA, Johannes Christiaan Leonardus FRANKEN, Peter VAN PUTTEN, Gerrit VAN DER STRAATEN