Abstract: In a claw-type gearshift, a blocking ring is arranged axially between a hub body having a sliding sleeve and a clutch body such that it is rotatable between a release position and two locking positions. The blocking ring is adapted to be displaced toward the clutch body until conical friction surfaces on the blocking ring and on the clutch body come into contact. The blocking ring constitutes a form-locking blockade for the sliding sleeve against displacement of the sliding sleeve teeth between the clutch body teeth when an axial shifting force is applied in the non-synchronized state. When the claw clutch is shifted, a difference in speed between the clutch body and the hub body is reduced and the sliding sleeve is deflected in the axial direction toward the speed change gear to be shifted, as a result of which a friction surface of the blocking ring and a mating friction surface of the clutch body come into contact.

Abstract: The invention relates to methods and an apparatus for passivating defects of a semiconductor substrate, in particular a silicon based solar cell. According to the method, the substrate is irradiated with electromagnetic radiation during a first process phase, wherein the radiation directed onto the substrate has wavelengths at least in the region below 1200 nm and an intensity of at least 8000 Watt/m2. This can lead to a heating of the substrate, or a temperature control can be provided. Subsequently, the substrate is irradiated with electromagnetic radiation during a temperature-holding phase following the first process phase, wherein the radiation directed onto the substrate has wavelengths primarily in the region below 1200 nm and an intensity of at least 8000 Watt/m2, while a side of the substrate facing away from a source of the electromagnetic radiation is cooled via a contact with a support cooled by a cooling device.

Abstract: The invention relates to a plate element for a wafer boat for the plasma treatment of disk-shaped wafers, in particular semiconductor wafers for semiconductor or photovoltaic applications. The plate element is electrically conductive and has at least one holding unit on each side, for holding a wafer in a wafer holding region. The plate element has at least one recess in at least one side of the plate element and/or at least one opening in the plate element, wherein the at least one recess and/or the at least one opening in the plate element lies at least partially radially outside of the wafer holding region and directly adjacent thereto. The invention further relates to a wafer boat that has a plurality of plate elements of the above type arranged parallel to each other, wherein plate elements arranged adjacent are electrically insulated from each other.

Abstract: The invention relates to methods and an apparatus for passivating defects of a semiconductor substrate, in particular a silicon based solar cell. According to the method, the substrate is irradiated with electromagnetic radiation during a first process phase, wherein the radiation directed onto the substrate has wavelengths at least in the region below 1200 nm and an intensity of at least 8000 Watt/m2. This can lead to a heating of the substrate, or a temperature control can be provided. Subsequently, the substrate is irradiated with electromagnetic radiation during a temperature-holding phase following the first process phase, wherein the radiation directed onto the substrate has wavelengths primarily in the region below 1200 nm and an intensity of at least 8000 Watt/m2, while a side of the substrate facing away from a source of the electromagnetic radiation is cooled via a contact with a support cooled by a cooling device.

Abstract: A retainer has a coating composed of silicon carbide, glassy carbon or pyrolytic carbon on its surface. A method for producing the retainer and the use of the retainer in a plasma-driven vapor deposition are also provided.

Abstract: A method and device for separation of chalcogens from waste gases in process installations are provided so that complete and reliable removal of chalcogens occurs continuously during nonstop operation of the process installation in the most effective manner possible. The process installation is connected via a pipeline to an input connector of the device for separation of chalcogens arranged outside of the process installation. The pipeline and the input connector have a heat connection to the process chamber. The device for separation of chalcogens is provided with an outlet connector as well as a gas outlet is equipped with a cooling device so that the input connector is excluded from cooling.

Abstract: The invention relates to a plasma reactor with high productivity for surface coating or modification of objects and/or substrates by plasma processes in a processing chamber, preferably as vacuum processes at reduced pressure, having an entrance lock to the processing chamber and an exit lock. The invention is to create a plasma reactor of high productivity, which, with uniformly high productivity, will make possible a rapid simple and selective cleaning of the plasma sources and adjacent parts of the processing chamber. According to the invention, two plasma sources (1, 2) are provided, each alternately couplable to a reaction chamber (7) or a re-etching chamber (8). The plasma sources (1, 2) are fixed for this purpose to an alternating means (6) in such manner that the plasma sources (1, 2) are positionable by a rotatory motion of the alternating means (6) in the reaction chamber (7) or the re-etching chamber (8).

Abstract: An arrangement for the contactless transport of flat substrates, particularly of square or rectangular plates having high breakability along a transport path, is provided. With the arrangement, the substrates can be reliably accelerated, transported and slowed down even in the overhead position, independently from the ambient atmosphere and ambient temperature. This is achieved by a plurality of Bernoulli grippers being arranged on both sides along a transport path at a distance behind each other such that the substrate to be transported covers the Bernoulli grippers on both sides of the transport path only partially. The Bernoulli grippers each create a gas flow rotating clockwise or counterclockwise relative to the substrate and directed in the transport direction, wherein the Bernoulli grippers of each pair create each a differently rotating gas flow. Mechanical lateral guide elements are provided on both sides of the transport path.

Abstract: A method and device for separation of chalcogens from waste gases in process installations are provided so that complete and reliable removal of chalcogens occurs continuously during nonstop operation of the process installation in the most effective manner possible. The process installation is connected via a pipeline to an input connector of the device for separation of chalcogens arranged outside of the process installation. The pipeline and the input connector have a heat connection to the process chamber. The device for separation of chalcogens is provided with an outlet connector as well as a gas outlet is equipped with a cooling device so that the input connector is excluded from cooling.

Abstract: An adjusting apparatus and method for a folding-unit cylinder is disclosed. The apparatus includes a linkage which can be set longitudinally by an adjusting drive which is arranged in the folding-unit cylinder. An adjusting member is articulated on the output side of the linkage and is mounted so as to be rotatable about the axis of the folding-unit cylinder and actuates the members which guide folded products.

Abstract: A pressure-measuring device is configured for use in vacuum systems, which are used for surface coating or modification of objects and/or substrates in an inner receptacle inside a processing chamber. Elastic elements or portions are fabricated in the inner receptacle. The pressure-measuring device includes distance-measuring elements designed to measure the deformation of the elastic elements of the inner receptacle. The deformation measurements are related to the pressure in the inner receptacle. The pressure-measuring device provides a continuous and secure determination of the pressure.

Abstract: An adjusting apparatus and method for a folding-unit cylinder is disclosed. The apparatus includes a linkage which can be set longitudinally by an adjusting drive which is arranged in the folding-unit cylinder. An adjusting member is articulated on the output side of the linkage and is mounted so as to be rotatable about the axis of the folding-unit cylinder and actuates the members which guide folded products.

Abstract: A plasma reactor is configured for rapid, simple and selective cleaning of plasma sources and adjacent areas of the processing chamber. The plasma reactor includes a processing chamber having a plurality of plasma zones, each associated with its own plasma source and/or a remote or downstream plasma source. The plasma reactor is configured so that substrates can be transported past the individual plasma sources in a processing mode in which the substrates are exposed to processing gasses chemically activated by the plasmas of the individual plasma sources. The plasma sources or zones can be selectively isolated or shielded from the substrates.

Abstract: The invention relates to a plasma reactor with high productivity for surface coating or modification of objects and/or substrates by plasma processes in a processing chamber, preferably as vacuum processes at reduced pressure, having an entrance lock to the processing chamber and an exit lock. The invention is to create a plasma reactor of high productivity, which, with uniformly high productivity, will make possible a rapid simple and selective cleaning of the plasma sources and adjacent parts of the processing chamber. According to the invention, two plasma sources (1, 2) are provided, each alternately couplable to a reaction chamber (7) or a re-etching chamber (8). The plasma sources (1, 2) are fixed for this purpose to an alternating means (6) in such manner that the plasma sources (1, 2) are positionable by a rotatory motion of the alternating means (6) in the reaction chamber (7) or the re-etching chamber (8).

Abstract: A transport device for transporting to-be-processed elements through a high-temperature zone and a corresponding method is described. The transport device operates according to the walking beam principle, with thin, elongated carrier elements made of a flexible material, which are maintained under tensile stress along the longitudinal axis of the carrier elements, being provided instead of conventional walking beams. The device permits low contamination transport of the elements through a high-temperature zone and improved utilization of energy as well as the ability to use a RTP process.