Patents by Inventor Peter Wardenier

Peter Wardenier has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic projection apparatus and a device manufacturing method
    Publication number: 20070177123
    Abstract: A lithographic apparatus wherein a dipole illumination mode used for printing a line pattern, is arranged to provide quadrupole illumination. Radiation emanating from the two additional poles and passing the mask pattern without being affected by diffraction is prevented from reaching the wafer by a radiation blocking aperture disposed in the projection system. Astigmatism aberration due to lens heating associated with the dipole illumination mode is reduced by lens heating associated with the additional poles of the quadrupole illumination mode.
    Type: Application
    Filed: January 27, 2006
    Publication date: August 2, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Wim Tel, Johannes De Klerk, Peter Wardenier