Patents by Inventor Peter Weissbrodt

Peter Weissbrodt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7453078
    Abstract: A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.
    Type: Grant
    Filed: September 7, 2007
    Date of Patent: November 18, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Haico Victor Kok, Marcus Adrianus Van De Kerhof, Borgert Kruizinga, Timotheus Franciscus Sengers, Bearrach Moest, Marc Antonius Maria Haast, Peter Weissbrodt, Manfred Schrenk, Torsten Harzendorf
  • Publication number: 20080007844
    Abstract: A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.
    Type: Application
    Filed: September 7, 2007
    Publication date: January 10, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Haico Kok, Marcus Van De Kerhof, Borgert Kruizinga, Timotheus Sengers, Bearrach Moest, Marc Haast, Peter Weissbrodt, Manfred Schrenk, Torsten Harzendorf
  • Patent number: 7282701
    Abstract: A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.
    Type: Grant
    Filed: February 28, 2005
    Date of Patent: October 16, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Haico Victor Kok, Marcus Adrianus Van De Kerhof, Borgert Kruizinga, Timotheus Franciscus Sengers, Bearrach Moest, Marc Antonius Maria Haast, Peter Weissbrodt, Manfred Schrenk, Torsten Harzendorf
  • Publication number: 20070108377
    Abstract: A sensor for use at substrate level in a high numerical aperture lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The improved coupling elements include a flowing liquid medium disposed between the transparent plate and the sensing element.
    Type: Application
    Filed: November 2, 2006
    Publication date: May 17, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Haico Kok, Marcus Van De Kerkhof, Borgert Kruizinga, Timotheus Sengers, Bearrach Moest, Marc Antonius Haast, Peter Weissbrodt, Manfred Helmut Gustav Schrenk, Torsten Harzendorf
  • Publication number: 20060192093
    Abstract: A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.
    Type: Application
    Filed: February 28, 2005
    Publication date: August 31, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Haico Kok, Marcus Van De Kerhof, Borgert Kruizinga, Timotheus Sengers, Bearrach Moest, Marc Haast, Peter Weissbrodt, Manfred Schrenk, Torsten Harzendorf
  • Patent number: 6324897
    Abstract: A partial pressure sensor is disclosed which is suitable for determining the partial pressure of a gas or vapor in a thermally uncontrolled gas atmosphere over a large measurement range and with high measuring accuracy.
    Type: Grant
    Filed: October 11, 2000
    Date of Patent: December 4, 2001
    Assignee: Jenoptik Aktiengesellschaft
    Inventors: Manfred Schrenk, Peter Weissbrodt, Erich Hacker, Dirk Mademann