Patents by Inventor Peter Wiedemuth
Peter Wiedemuth has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10209294Abstract: A method for producing an arc detection signal on the basis of a plurality of observation signals comprises producing an arc detection part-signal for each of at least two observation signals. Producing each of the part-signals includes correlating the respective observation signal with a correlation signal by influencing the correlation signal with the respective observation, thereby producing a correlation result; producing or modifying a coefficient on the basis of the correlation result; and weighting the respective observation signal with the coefficient. The arc detection part-signals are added to form the arc detection signal.Type: GrantFiled: December 5, 2013Date of Patent: February 19, 2019Assignee: TRUMPF Huettinger GmbH + Co. KGInventors: Markus Bannwarth, Christian Fritsch, Ulrich Heller, Daniel Krausse, Rolf Merte, Moritz Nitschke, Peter Wiedemuth, Christian Bock, Michael Glueck, Thomas Kirchmeier, Ekkehard Mann, Krishna Kishore Nedunuri, Martin Steuber, Markus Winterhalter
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Patent number: 9484189Abstract: An arc discharge detection device is used for detecting arc discharges in a plasma process. The arc discharge detection device includes a comparator configured to emit an arc discharge detection signal and receive an instantaneous value of the signal or a signal proportional thereto, a minimum or maximum value detection device configured to receive the signal and to determine a minimum or maximum value of the signal within a predetermined time period, a setting means configured to receive the minimum or maximum value and to generate a reference signal from the minimum or maximum value, such that the reference signal is supplied to the comparator, and such that the comparator changes the signal level of the arc discharge detection signal when the comparator detects that the instantaneous value has reached the reference signal.Type: GrantFiled: July 27, 2011Date of Patent: November 1, 2016Assignee: TRUMPF Huettinger GmbH + Co. KGInventors: Markus Winterhalter, Peter Wiedemuth
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Patent number: 8890413Abstract: In an ignition circuit for igniting a plasma fed with alternating power in a gas discharge chamber, having two line sections for connection to an alternating power source and at least one line section for connection to a housing earth of the gas discharge chamber, at least one series connection of a non-linear element and an energy store is connected between the line sections for connection to an alternating power source, and the line section for connection to a housing earth of the gas discharge chamber is connected to a connection node between an energy store and a non-linear element.Type: GrantFiled: January 29, 2013Date of Patent: November 18, 2014Assignee: TRUMPF Huettinger GmbH + Co. KGInventors: Ulrich Richter, Gerhard Zaehringer, Peter Wiedemuth
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Publication number: 20140159741Abstract: A method for producing an arc detection signal on the basis of a plurality of observation signals comprises producing an arc detection part-signal for each of at least two observation signals. Producing each of the part-signals includes correlating the respective observation signal with a correlation signal by influencing the correlation signal with the respective observation, thereby producing a correlation result; producing or modifying a coefficient on the basis of the correlation result; and weighting the respective observation signal with the coefficient. The arc detection part-signals are added to form the arc detection signal.Type: ApplicationFiled: December 5, 2013Publication date: June 12, 2014Applicant: TRUMPF Huettinger GmbH + Co. KGInventors: Markus Bannwarth, Christian Fritsch, Ulrich Heller, Daniel Krausse, Rolf Merte, Moritz Nitschke, Peter Wiedemuth, Christian Bock, Michael Glueck, Thomas Kirchmeier, Ekkehard Mann, Krishna Kishore Nedunuri, Martin Steuber, Markus Winterhalter
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Publication number: 20110279121Abstract: An arc discharge detection device is used for detecting arc discharges in a plasma process. The arc discharge detection device includes a comparator configured to emit an arc discharge detection signal and receive an instantaneous value of the signal or a signal proportional thereto, a minimum or maximum value detection device configured to receive the signal and to determine a minimum or maximum value of the signal within a predetermined time period, a setting means configured to receive the minimum or maximum value and to generate a reference signal from the minimum or maximum value, such that the reference signal is supplied to the comparator, and such that the comparator changes the signal level of the arc discharge detection signal when the comparator detects that the instantaneous value has reached the reference signal.Type: ApplicationFiled: July 27, 2011Publication date: November 17, 2011Applicant: HUETTINGER ELEKTRONIK GMBH + CO. KGInventors: Markus Winterhalter, Peter Wiedemuth
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Patent number: 8033246Abstract: An arc suppression arrangement suppresses arcs in a gas discharge device that is operated with an alternating voltage from a power supply. The arc suppression arrangement includes an arc suppression device and an arc identification device that controls the arc suppression device. The arc suppression device includes at least one controllable resistor that is connected in series in an electrical line that extends from an alternating voltage source to an electrode of the gas discharge device. An arc can thereby be prevented from being provided with energy.Type: GrantFiled: May 5, 2006Date of Patent: October 11, 2011Assignee: HUETTINGER Elektronik GmbH + Co. KGInventors: Peter Wiedemuth, Markus Bannwarth, Lothar Wolf
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Patent number: 8007641Abstract: An arc discharge detection device is used for detecting arc discharges in a plasma process. The arc discharge detection device includes a comparator to which an instantaneous signal and a reference value are supplied. The reference value is formed by a setting means from an extreme value of the signal. The extreme value is determined by an extreme value detection device within a predetermined time period, and the comparator changes the state of an arc discharge detection signal when the comparison between the reference value and an instantaneous value of the signal shows that an arc discharge has occurred.Type: GrantFiled: September 22, 2006Date of Patent: August 30, 2011Assignee: HUETTINGER Elektronik GmbH + Co. KGInventors: Markus Winterhalter, Peter Wiedemuth
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Patent number: 7929261Abstract: For suppressing arc discharges in a plasma process, a method includes monitoring of at least one parameter of the plasma process, determining a temporal feature of a first countermeasure and performing the first countermeasure. The temporal feature is determined as a function of, for example, at least one of an interval in time from at least one previous countermeasure, a development of the at least one parameter since a relevant time of introduction of the countermeasure, or since a variable period of time ahead of the relevant time of introduction of the countermeasure, and a differentiation as to whether a previous countermeasure was triggered based on the behavior of the at least one parameter, or based on the interval in time from at least one previous countermeasure.Type: GrantFiled: March 7, 2008Date of Patent: April 19, 2011Assignee: HUETTINGER Elektronik GmbH + Co. KGInventor: Peter Wiedemuth
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Patent number: 7898238Abstract: A method of generating an output DC voltage of a gas discharge process voltage supply unit, in which in a first voltage transformation stage a first DC voltage is transformed into a second DC voltage of a predetermined voltage range, and the output DC voltage is generated from the second DC voltage in a second voltage transformation stage. A switching element of at least one boost converter is switched with a controlled pulse-duty factor for generating the output DC voltage in the second voltage transformation stage. This method permits striking and maintenance of a plasma process.Type: GrantFiled: July 1, 2008Date of Patent: March 1, 2011Assignee: HUETTINGER Elektronik GmbH + Co. KGInventors: Peter Wiedemuth, Stefan Schirmaier, Markus Winterhalter
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Patent number: 7640120Abstract: An arc detection means for detecting arcs in a plasma process includes at least one comparator to which an evaluation signal such as an output signal or an internal signal of an AC generator relating to the output signal and a reference value are supplied. The comparator is connected to a logic component that generates a signal for an arc suppression device.Type: GrantFiled: December 19, 2006Date of Patent: December 29, 2009Assignee: Huettinger Elektronik GmbH + Co. KGInventors: Sven Axenbeck, Markus Bannwarth, Martin Steuber, Peter Wiedemuth, Lothar Wolf
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Patent number: 7586210Abstract: A plasma process machine includes at least two electrodes disposed in a processing chamber and in contact with targets, an alternating current source connected to supply power to the electrodes, and a power delivery controller adapted to control power delivered by the alternating current source to the electrodes. The power delivery controller is configured to determine a control value from a comparison between actual power delivery as detected by a detector and a desired power delivery, and to adjust power delivery based on the control value.Type: GrantFiled: August 15, 2005Date of Patent: September 8, 2009Assignee: HUETTINGER Elektronik GmbH + Co. KGInventors: Peter Wiedemuth, Alfred Trusch, Dieter Meier, Gerhard Zaehringer
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Patent number: 7586099Abstract: A vacuum plasma generator (VPG) includes an output connector for electrical connection of the VPG to at least one electrode of a plasma chamber. The VPG includes a mains connector for connection of the VPG to a mains power supply, a mains input filter coupled to the mains connector, a voltage converter coupled to the mains input filter for generating an output signal, a voltage converter control input for connection to a voltage converter control, a shield that surrounds at least the voltage converter, the mains power supply, and the mains input filter, and a connection device that provides an electrical connection between the shield and the plasma chamber.Type: GrantFiled: March 30, 2006Date of Patent: September 8, 2009Assignee: HUETTINGER Elektronik GmbH + Co. KGInventors: Thorsten Eyhorn, Moritz Nitschke, Peter Wiedemuth, Gerhard Zahringer
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Patent number: 7508093Abstract: A current supply system includes one or more, or a plurality of current supply modules that each includes an input terminal and an output terminal and that each has a maximum output power. Multiple current supply modules are electrically combined to form a current supply unit having a maximum output power that is greater than the maximum output power of the individual current supply modules, and a control unit is connected to the current supply unit. A data connection connects the control unit to all the current supply modules of the current supply unit.Type: GrantFiled: December 23, 2003Date of Patent: March 24, 2009Assignee: Huettinger Elektronik GmbH + Co. KGInventors: Peter Wiedemuth, Stefan Schirmaier, Markus Winterhalter
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Publication number: 20080284344Abstract: A method of generating an output DC voltage of a gas discharge process voltage supply unit, in which in a first voltage transformation stage a first DC voltage is transformed into a second DC voltage of a predetermined voltage range, and the output DC voltage is generated from the second DC voltage in a second voltage transformation stage. A switching element of at least one boost converter is switched with a controlled pulse-duty factor for generating the output DC voltage in the second voltage transformation stage. This method permits striking and maintenance of a plasma process.Type: ApplicationFiled: July 1, 2008Publication date: November 20, 2008Applicant: HUETTINGER ELEKTRONIK GMBH + CO. KGInventors: Peter Wiedemuth, Stefan Schirmaier, Markus Winterhalter
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Publication number: 20080218923Abstract: For suppressing arc discharges in a plasma process, a method includes monitoring of at least one parameter of the plasma process, determining a temporal feature of a first countermeasure and performing the first countermeasure. The temporal feature is determined as a function of, for example, at least one of an interval in time from at least one previous countermeasure, a development of the at least one parameter since a relevant time of introduction of the countermeasure, or since a variable period of time ahead of the relevant time of introduction of the countermeasure, and a differentiation as to whether a previous countermeasure was triggered based on the behavior of the at least one parameter, or based on the interval in time from at least one previous countermeasure.Type: ApplicationFiled: March 7, 2008Publication date: September 11, 2008Applicant: HUETTINGER ELEKTRONIK GMBH + CO. KGInventor: Peter Wiedemuth
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Publication number: 20080216745Abstract: An arc suppression arrangement suppresses arcs in a gas discharge device that is operated with an alternating voltage from a power supply. The arc suppression arrangement includes an arc suppression device and an arc identification device that controls the arc suppression device. The arc suppression device includes at least one controllable resistor that is connected in series in an electrical line that extends from an alternating voltage source to an electrode of the gas discharge device. An arc can thereby be prevented from being provided with energy.Type: ApplicationFiled: May 5, 2006Publication date: September 11, 2008Inventors: Peter Wiedemuth, Markus Bannwarth, Lothar Wolf
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Patent number: 7408329Abstract: A method of generating an output DC voltage of a gas discharge process voltage supply unit, in which in a first voltage transformation stage a first DC voltage is transformed into a second DC voltage of a predetermined voltage range, and the output DC voltage is generated from the second DC voltage in a second voltage transformation stage. A switching element of at least one boost converter is switched with a controlled pulse-duty factor for generating the output DC voltage in the second voltage transformation stage. This method permits striking and maintenance of a plasma process.Type: GrantFiled: September 15, 2005Date of Patent: August 5, 2008Assignee: Huettinger Elektronik GmbH + Co. KGInventors: Peter Wiedemuth, Stefan Schirmaier, Markus Winterhalter
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Publication number: 20080048498Abstract: A plasma process machine includes at least two electrodes disposed in a processing chamber and in contact with targets, an alternating current source connected to supply power to the electrodes, and a power delivery controller adapted to control power delivered by the alternating current source to the electrodes. The power delivery controller is configured to determine a control value from a comparison between actual power delivery as detected by a detector and a desired power delivery, and to adjust power delivery based on the control.Type: ApplicationFiled: May 15, 2007Publication date: February 28, 2008Applicant: HUETTINGER ELEKTRONIK GMBH + CO. KGInventors: Peter Wiedemuth, Alfred Trusch, Dieter Meier, Gerhard Zaehringer
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Publication number: 20070241287Abstract: A vacuum plasma generator (VPG) includes an output connector for electrical connection of the VPG to at least one electrode of a plasma chamber. The VPG includes a mains connector for connection of the VPG to a mains power supply, a mains input filter coupled to the mains connector, a voltage converter coupled to the mains input filter for generating an output signal, a voltage converter control input for connection to a voltage converter control, a shield that surrounds at least the voltage converter, the mains power supply, and the mains input filter, and a connection device that provides an electrical connection between the shield and the plasma chamber.Type: ApplicationFiled: March 30, 2006Publication date: October 18, 2007Inventors: Thorsten Eyhorn, Moritz Nitschke, Peter Wiedemuth, Gerhard Zahringer
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Publication number: 20070217148Abstract: A cooling device is provided for an electronic unit. In some implementations, the cooling device includes a cooling body, arranged in an essentially airtight sealed housing of the electronic unit, through which a cooling medium may flow. Heat generating elements, for example electronic components, are mounted on the cooling device so as to release the heat to the cooling body by contact transmission. Additional heat exchange means for cooling the air enclosed in the housing are connected to the cooling body with a thermal conducting connection and arranged on said cooling body. Such a cooling device can be produced with a compact construction with effective heat extraction.Type: ApplicationFiled: September 8, 2006Publication date: September 20, 2007Applicant: HUETTINGER Elektronik GmbH + Co. KGInventors: Steffen Omnitz, Stefan Schirmaier, Markus Winterhalter, Peter Wiedemuth