Abstract: The present disclosure provides systems and methods for product handling and dispensing. In one aspect, the present disclosure provides a system comprising a plurality of storage units for storing one or more trays comprising one or more items; one or more dispense conveyors for lifting and dispensing at least one of the one or more items into one or more receiving units; and a shuttle comprising one or more tray retrieval mechanisms, wherein the shuttle is (a) movable relative to the plurality of storage units and (b) configured to (i) pick at least one tray of the one or more trays using the one or more tray retrieval mechanisms and (ii) transport the at least one tray to the one or more dispense conveyors.

Abstract: The present disclosure provides systems and methods for product handling and dispensing. In one aspect, the present disclosure provides a system comprising a tray comprising one or more lanes and one or more openings disposed on a bottom surface of the tray; one or more supports positioned within at least one of the one or more lanes, wherein the one or more supports are configured to support one or more items; and one or more dispensing units comprising one or more dispensing arms, wherein the one or more dispensing arms are configured to (i) couple to, engage with, or lift the one or more supports and (ii) transport (a) the one or more supports, (b) the one or more items on the one or more supports, or (c) both the one or more supports and the one or more items to one or more receiving areas or receiving units.

Abstract: Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.

Abstract: Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.

Abstract: The present disclosure provides systems and methods for product handling and dispensing. In one aspect, the present disclosure provides a system comprising a plurality of storage units for storing one or more trays comprising one or more items; one or more dispense conveyors for lifting and dispensing at least one of the one or more items into one or more receiving units; and a shuttle comprising one or more tray retrieval mechanisms, wherein the shuttle is (a) movable relative to the plurality of storage units and (b) configured to (i) pick at least one tray of the one or more trays using the one or more tray retrieval mechanisms and (ii) transport the at least one tray to the one or more dispense conveyors.

Abstract: Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.

Abstract: Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.

Abstract: Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.

Abstract: The present disclosure sets forth a marginal distillation approach to obtaining a unified name-entity recognition (NER) student model from a plurality of pre-trained teacher NER models with different tag sets. Knowledge from the teacher models is distilled into a student model without requiring access to the annotated training data used to train the teacher models. In particular, the system receives a tag hierarchy that combines the different teacher tag sets. The teacher models and the student model are applied to a set of input data sequence to obtain tag predictions for each of the models. A distillation loss is computed between the student and each of the teacher models. If teacher's predictions are less fine-grained than the student's with respect to a node in the tag hierarchy, the student's more fine-grained predictions for the node are marginalized in computing the distillation loss.

Abstract: Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.

Abstract: Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.

Abstract: Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.

Abstract: A torque link assembly for a shock strut includes an upper torque link that is selectively retained in a stowed position when uncoupled from a lower torque link. The upper torque link includes first and second coaxial lugs that rotatably couple the upper torque link to an alignment feature. A latch mechanism includes a latch fitting rotatably coupled to either the upper torque link or the alignment feature. The latch mechanism further includes a stop fitting fixedly coupled to the other of the upper torque link and the alignment feature. The latch fitting engages the stop fitting to maintain the upper torque link in the stowed position. At least one of the latch fitting and stop fitting is positioned between the first and second lugs of the upper torque link.

Abstract: A three-dimensional stacking structure is described. The stacking structure includes at least a bottom die, a top die and a spacer protective structure. The bottom die includes contact pads in the non-bonding region. The top die is stacked on the bottom die without covering the contact pads of the bottom die and the bottom die is bonded with the top die through bonding structures there-between. The spacer protective structure is disposed on the bottom die and covers the top die to protect the top die. By forming an anti-bonding layer before stacking the top dies to the bottom dies, the top die can be partially removed to expose the contact pads of the bottom die for further connection.

Abstract: Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.

Abstract: A technique for managing a Unified Extensible Firmware Interface (UEFI) Basic Input/Output System (BIOS)-controlled computing device from a separate mobile computing device is discussed.

Abstract: Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.

Abstract: An expandable luggage container includes a first compartment; a side cover formed on a side of the first compartment, a first zipping mechanism formed around three sides of the side cover; a second compartment coupled to the first compartment; and a top cover formed on a top side of the second compartment, a second zipping mechanism formed around three sides of the top cover. In the luggage container, a first opening of the first compartment and a second opening of the second compartment are directed to different directions; the second compartment is collapsible by a third zipping mechanism formed between the first compartment and second compartment; and the luggage container is in a compact mode when the second compartment is collapsed and is in an expanded mode when the second compartment is expanded by unzipping of the third zipping mechanism.