Patents by Inventor Petr Hlavenka

Petr Hlavenka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240027377
    Abstract: A method of examining a sample using a charged particle microscope is provided comprising scanning a charged particle beam over an area of the sample, detecting spectral emissions from the sample in response to scanning of the charged particle beam, and identifying a first plurality of substantially similar spectral emissions. A first chemical element is determined that is associated with the substantially similar spectral emissions. A first base spectral number value associated with said first chemical element is provided that is related to the number of similar spectral emissions that are required for confidently determining said first chemical element. The first base spectral number value is used for dividing at least a part of the scanned area of the sample into a first number of segments. The method includes providing a graphical representation of the sample, wherein said graphical representation includes said first chemical element and corresponding segments.
    Type: Application
    Filed: July 20, 2023
    Publication date: January 25, 2024
    Inventors: Jan Klusácek, Petr Hlavenka, Ondrej Vaverka, Marek Vanatka
  • Patent number: 11676795
    Abstract: The invention relates to system and method of inspecting a specimen with a plurality of charged particle beamlets. The method comprises the steps of providing a specimen, providing a plurality of charged particle beamlets and focusing said plurality of charged particle beamlets onto said specimen, and detecting a flux of radiation emanating from the specimen in response to said irradiation by said plurality of charged particle beamlets.
    Type: Grant
    Filed: March 3, 2021
    Date of Patent: June 13, 2023
    Assignee: FEI Company
    Inventors: Pavel Stejskal, Bohuslav Sed'a, Petr Hlavenka, Libor Novák, Jan Stopka
  • Patent number: 11373839
    Abstract: Responsive to irradiation of a charged particle beam, emission from sample is acquired in the form of spectral data. The spectral data is decomposed by a machine learning estimator to abundances and spectral components based on a character of the detector. Images showing compositional information of the sample are generated based on the abundances and the spectral components.
    Type: Grant
    Filed: February 3, 2021
    Date of Patent: June 28, 2022
    Assignee: FEI Company
    Inventors: Petr Hlavenka, Jan Klusacek, Ondrej Sembera
  • Publication number: 20210296088
    Abstract: The invention relates to system and method of inspecting a specimen with a plurality of charged particle beamlets. The method comprises the steps of providing a specimen, providing a plurality of charged particle beamlets and focusing said plurality of charged particle beamlets onto said specimen, and detecting a flux of radiation emanating from the specimen in response to said irradiation by said plurality of charged particle beamlets.
    Type: Application
    Filed: March 3, 2021
    Publication date: September 23, 2021
    Applicant: FEI Company
    Inventors: Pavel Stejskal, Bohuslav Sed'a, Petr Hlavenka, Libor Novák, Jan Stopka
  • Patent number: 11002692
    Abstract: The disclosure relates to a method of examining a sample using a charged particle microscope. The method comprises the steps of detecting using a first detector emissions of a first type from the sample in response to the beam scanned over the area of the sample. Then, using spectral information of detected emissions of the first type, at least a part of the scanned area of the sample is divided into multiple segments. According to the disclosure, emissions of the first type at different positions along the scan in at least one of said multiple segments may be combined to produce a combined spectrum of the sample in said one of said multiple segments. In an embodiment, a second detector is used to detect emissions of a second type, and this is used to divide the area of the sample into multiple regions. The first detector may be an EDS, and the second detector may be based on EM. This way, EDS data and EM data can be effectively combined for producing colored images.
    Type: Grant
    Filed: August 6, 2019
    Date of Patent: May 11, 2021
    Assignee: FEI Company
    Inventors: Tomas Tuma, Jan Hradil, Petr Hlavenka
  • Patent number: 10937627
    Abstract: An electron microscope comprising: A specimen holder, for holding a specimen; An electron beam column, for producing an array of electron beams and concurrently irradiating an array of target areas of said specimen therewith; A scanning assembly, for producing relative scanning motion of said beam array with respect to the specimen; A detector, for detecting radiation emanating from the specimen in response to said irradiation, wherein said detector is: A backscattered electron detector that can be disposed proximal to the specimen at a side thereof facing said electron beam column; Provided with an array of apertures that allow passage of said electron beams from said column to the specimen; Provided with a functionally sub-divided detection surface that enables segregated detection of a backscattered electron flux produced by each individual beam.
    Type: Grant
    Filed: May 28, 2019
    Date of Patent: March 2, 2021
    Assignee: FEI Company
    Inventors: Pavel Stejskal, Petr Hlavenka, Bohuslav Sed'a
  • Publication number: 20200312610
    Abstract: The invention relates to a charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets. The charged particle beam device comprises a specimen holder for holding a specimen, a source for producing a beam of charged particles, and an illuminator for converting said beam of charged particles into a plurality of charged particle beamlets and focusing said plurality of charged particle beamlets onto said specimen. Furthermore, a detector assembly for detecting a flux of radiation emanating from the specimen in response to said irradiation by said plurality of charged particle beamlets is provided. As defined herein, the charged particle beam device is arranged for directing said plurality of charged particle beamlets onto said specimen in an essentially 1D pattern, wherein said essentially 1D pattern forms part of an edge of an essentially 2D geometric shape.
    Type: Application
    Filed: March 20, 2020
    Publication date: October 1, 2020
    Applicant: FEI Company
    Inventors: Petr Hlavenka, Bohuslav Sed'a
  • Publication number: 20200057011
    Abstract: The disclosure relates to a method of examining a sample using a charged particle microscope. The method comprises the steps of detecting using a first detector emissions of a first type from the sample in response to the beam scanned over the area of the sample. Then, using spectral information of detected emissions of the first type, at least a part of the scanned area of the sample is divided into multiple segments. According to the disclosure, emissions of the first type at different positions along the scan in at least one of said multiple segments may be combined to produce a combined spectrum of the sample in said one of said multiple segments. In an embodiment, a second detector is used to detect emissions of a second type, and this is used to divide the area of the sample into multiple regions. The first detector may be an EDS, and the second detector may be based on EM. This way, EDS data and EM data can be effectively combined for producing colored images.
    Type: Application
    Filed: August 6, 2019
    Publication date: February 20, 2020
    Applicant: FEI Company
    Inventors: Tomas Tuma, Jan Hradil, Petr Hlavenka
  • Publication number: 20190378681
    Abstract: An electron microscope comprising: A specimen holder, for holding a specimen; An electron beam column, for producing an array of electron beams and concurrently irradiating an array of target areas of said specimen therewith; A scanning assembly, for producing relative scanning motion of said beam array with respect to the specimen; A detector, for detecting radiation emanating from the specimen in response to said irradiation, wherein said detector is: A backscattered electron detector that can be disposed proximal to the specimen at a side thereof facing said electron beam column; Provided with an array of apertures that allow passage of said electron beams from said column to the specimen; Provided with a functionally sub-divided detection surface that enables segregated detection of a backscattered electron flux produced by each individual beam.
    Type: Application
    Filed: May 28, 2019
    Publication date: December 12, 2019
    Applicant: FEI Company
    Inventors: Pavel Stejskal, Petr Hlavenka, Bohuslav Sed'a
  • Publication number: 20180061613
    Abstract: A charged-particle microscope having a vacuum chamber comprises a specimen holder, a particle-optical column, a detector and an exchangeable column extending element. The specimen holder is for holding a specimen. The particle-optical column is for producing and directing a beam of charged particles along an axis so as to irradiate the specimen. The column has a terminal pole piece at an extremity facing the specimen holder. The detector is for detecting a flux of radiation emanating from the specimen in response to irradiation by the beam. The exchangeable column extending element is magnetically mounted on the pole piece in a space between the pole piece and the specimen holder. Methods of using the microscope are also disclosed.
    Type: Application
    Filed: August 22, 2017
    Publication date: March 1, 2018
    Inventors: Bohuslav Sed'a, Lubomír Tuma, Petr Hlavenka, Marek Uncovský, Radovan Vasina, Jan Trojek, Mostafa Maazouz
  • Publication number: 20170103868
    Abstract: A method of examining a specimen in a Charged Particle Microscope, comprising the following steps: Providing a specimen on a specimen holder; Heating the specimen to a temperature of at least 250° C.; Directing a beam of charged particles from a source through an illuminator so as to irradiate the specimen; Using a detector to detect a flux of electrons emanating from the specimen in response to said irradiation, wherein said detector comprises: A scintillator module, which produces photons in response to impingement by electrons in said flux; A photon sensor, for sensing said photons, and is configured to: Preferentially register a first category of photons, associated with impingement of electrons on said scintillator module; Selectively suppress a second category of photons, comprising thermal radiation from the heated specimen.
    Type: Application
    Filed: July 11, 2016
    Publication date: April 13, 2017
    Applicant: FEI Company
    Inventors: Libor Novak, Petr Hlavenka, Marek Uncovsky, Martin Cafourek
  • Patent number: 9490100
    Abstract: The invention relates to a compound objective lens for a Scanning Electron Microscope having a conventional magnetic lens excited by a first lens coil, an immersion magnetic lens excited by a second lens coil, and an immersion electrostatic lens excited by the voltage difference between the sample and the electrostatic lens electrode. For a predetermined excitation of the lens, the electron beam can be focused on the sample using combinations of excitations of the two lens coils. More BSE information can be obtained when the detector distinguishes between BSE's (202) that strike the detector close to the axis and BSE's (204) that strike the detector further removed from the axis. By tuning the ratio of the excitation of the two lens coils, the distance from the axis that the BSE's impinge on the detector can be changed, and the compound lens can be used as an energy selective detector.
    Type: Grant
    Filed: September 9, 2013
    Date of Patent: November 8, 2016
    Assignee: FEI COMPANY
    Inventors: Petr Syta{hacek over (r)}, Petr Hlavenka, Lubomír Tůma
  • Patent number: 9362086
    Abstract: The invention relates to an in-column back-scattered electron detector, the detector placed in a combined electrostatic/magnetic objective lens for a SEM. The detector is formed as a charged particle sensitive surface, preferably a scintillator disk that acts as one of the electrode faces forming the electrostatic focusing field. The photons generated in the scintillator are detected by a photon detector, such as a photo-diode or a multi-pixel photon detector. The objective lens may be equipped with another electron detector for detecting secondary electrons that are kept closer to the axis. A light guide may be used to offer electrical insulation between the photon detector and the scintillator.
    Type: Grant
    Filed: August 26, 2013
    Date of Patent: June 7, 2016
    Assignee: FEI Company
    Inventors: Lubomír Tůma, Petr Hlavenka, Petr Syta{hacek over (r)}, Radek {hacek over (C)}e{hacek over (s)}ka, Bohuslav Sed'a
  • Patent number: 9153416
    Abstract: A method of investigating a sample using a charged-particle microscope is disclosed. By directing an imaging beam of charged particles at a sample, a resulting flux of output radiation is detected from the sample. At least a portion of the output radiation is examined using a detector, the detector comprising a Solid State Photo-Multiplier. The Solid State Photo-Multiplier is biased so that its gain is matched to the magnitude of output radiation flux.
    Type: Grant
    Filed: May 23, 2014
    Date of Patent: October 6, 2015
    Assignee: FEI Company
    Inventors: Petr Hlavenka, Marek Uncovsky
  • Patent number: 9053899
    Abstract: The invention relates to a dual beam apparatus equipped with an ion beam column and an electron beam column having an electrostatic immersion lens. When tilting the sample, the electrostatic immersion field is distorted and the symmetry round the electron optical axis is lost. As a consequence tilting introduces detrimental effects such as traverse chromatic aberration and beam displacement. Also in-column detectors, detecting either secondary electrons or backscattered electrons in the non-tilted position of the sample, will, due to the loss of the symmetry of the immersion field, show a mix of these electrons when tilting the sample. The invention shows how, by biasing the stage with respect to the grounded electrodes closest to the sample, these disadvantages are eliminated, or at least reduced.
    Type: Grant
    Filed: June 3, 2014
    Date of Patent: June 9, 2015
    Assignee: FEI COMPANY
    Inventors: Bohuslav Sed'a, Lubomír T{dot over (u)}ma, Petr Hlavenka, Petr Syta{hacek over (r)}
  • Publication number: 20140374593
    Abstract: A method of investigating a sample using a charged-particle microscope is disclosed. By directing an imaging beam of charged particles at a sample, a resulting flux of output radiation is detected from the sample. At least a portion of the output radiation is examined using a detector, the detector comprising a Solid State Photo-Multiplier. The Solid State Photo-Multiplier is biased so that its gain is matched to the magnitude of output radiation flux.
    Type: Application
    Filed: May 23, 2014
    Publication date: December 25, 2014
    Applicant: FEI Company
    Inventors: Petr Hlavenka, Marek Uncovsky
  • Publication number: 20140361165
    Abstract: The invention relates to a dual beam apparatus equipped with an ion beam column and an electron beam column having an electrostatic immersion lens. When tilting the sample, the electrostatic immersion field is distorted and the symmetry round the electron optical axis is lost. As a consequence tilting introduces detrimental effects such as traverse chromatic aberration and beam displacement. Also in-column detectors, detecting either secondary electrons or backscattered electrons in the non-tilted position of the sample, will, due to the loss of the symmetry of the immersion field, show a mix of these electrons when tilting the sample. The invention shows how, by biasing the stage with respect to the grounded electrodes closest to the sample, these disadvantages are eliminated, or at least reduced.
    Type: Application
    Filed: June 3, 2014
    Publication date: December 11, 2014
    Applicant: FEI Company
    Inventors: Bohuslav Sed'a, Lubomír Tùma, Petr Hlavenka, Petr Sytar
  • Patent number: 8735849
    Abstract: A method of investigating a sample using a charged-particle microscope is disclosed. By directing an imaging beam of charged particles at a sample, a resulting flux of output radiation is detected from the sample. At least a portion of the output radiation is examined using a detector, the detector comprising a Solid State Photo-Multiplier. The Solid State Photo-Multiplier is biased so that its gain is matched to the magnitude of output radiation flux.
    Type: Grant
    Filed: February 14, 2012
    Date of Patent: May 27, 2014
    Assignee: FEI Company
    Inventors: Petr Hlavenka, Marek Uncovsky
  • Publication number: 20140097341
    Abstract: The invention relates to an in-column back-scattered electron detector, the detector placed in a combined electrostatic/magnetic objective lens for a SEM. The detector is formed as a charged particle sensitive surface, preferably a scintillator disk that acts as one of the electrode faces forming the electrostatic focusing field. The photons generated in the scintillator are detected by a photon detector, such as a photo-diode or a multi-pixel photon detector. The objective lens may be equipped with another electron detector for detecting secondary electrons that are kept closer to the axis. A light guide may be used to offer electrical insulation between the photon detector and the scintillator.
    Type: Application
    Filed: August 26, 2013
    Publication date: April 10, 2014
    Applicant: FEI Company
    Inventors: Lubomír Tuma, Petr Hlavenka, Petr Sytar, Radek Ceska, Bohuslav Sed'a
  • Publication number: 20140070098
    Abstract: The invention relates to a compound objective lens for a Scanning Electron Microscope having a conventional magnetic lens excited by a first lens coil, an immersion magnetic lens excited by a second lens coil, and an immersion electrostatic lens excited by the voltage difference between the sample and the electrostatic lens electrode. For a predetermined excitation of the lens, the electron beam can be focused on the sample using combinations of excitations of the two lens coils. More BSE information can be obtained when the detector distinguishes between BSE's (202) that strike the detector close to the axis and BSE's (204) that strike the detector further removed from the axis. By tuning the ratio of the excitation of the two lens coils, the distance from the axis that the BSE's impinge on the detector can be changed, and the compound lens can be used as an energy selective detector.
    Type: Application
    Filed: September 9, 2013
    Publication date: March 13, 2014
    Applicant: FEI Company
    Inventors: Petr Sytar, Petr Hlavenka, Lubomir Tûma