Patents by Inventor Petros Miltiades Kopalidis

Petros Miltiades Kopalidis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • In-situ wafer temperature measurement and control
    Patent number: 10903097
    Abstract: A thermal chuck selectively retains a workpiece on a clamping surface. The thermal chuck has one or more heaters to selectively heat the clamping surface and the workpiece. A thermal monitoring device determines a temperature of a surface of the workpiece when the workpiece resides on the clamping surface, defining one or more measured temperatures. A controller selectively energizes the one or more heaters based on the one or more measured temperatures. The thermal monitoring device may be one or more of a thermocouple or RTD in selective contact with the surface of the workpiece and an emissivity sensor or pyrometer not in contact with the surface. The thermal chuck can be part of an ion implantation system configured to implant ions into the workpiece. The controller can be further configured to control the heaters based on the measured temperatures.
    Type: Grant
    Filed: March 28, 2019
    Date of Patent: January 26, 2021
    Assignee: Axcelis Technologies, Inc.
    Inventors: John F. Baggett, Ronald N. Reece, Petros Miltiades Kopalidis
  • IN-SITU WAFER TEMPERATURE MEASUREMENT AND CONTROL
    Publication number: 20190304820
    Abstract: A thermal chuck selectively retains a workpiece on a clamping surface. The thermal chuck has one or more heaters to selectively heat the clamping surface and the workpiece. A thermal monitoring device determines a temperature of a surface of the workpiece when the workpiece resides on the clamping surface, defining one or more measured temperatures. A controller selectively energizes the one or more heaters based on the one or more measured temperatures. The thermal monitoring device may be one or more of a thermocouple or RTD in selective contact with the surface of the workpiece and an emissivity sensor or pyrometer not in contact with the surface. The thermal chuck can be part of an ion implantation system configured to implant ions into the workpiece. The controller can be further configured to control the heaters based on the measured temperatures.
    Type: Application
    Filed: March 28, 2019
    Publication date: October 3, 2019
    Inventors: John F. Baggett, Ronald N. Reece, Petros Miltiades Kopalidis