Patents by Inventor Petrus Anton Willem Cornelia Maria Van Eijck

Petrus Anton Willem Cornelia Maria Van Eijck has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate placement in immersion lithography
    Patent number: 10345711
    Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
    Type: Grant
    Filed: August 21, 2017
    Date of Patent: July 9, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Christiaan Alexander Hoogendam, Gerrit Johannes Nijmeijer, Minne Cuperus, Petrus Anton Willem Cornelia Maria Van Eijck
  • SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY
    Publication number: 20180067401
    Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
    Type: Application
    Filed: August 21, 2017
    Publication date: March 8, 2018
    Inventors: Christiaan Alexander HOOGENDAM, Gerrit Johannes Nijmeijer, Minne Cuperus, Petrus Anton Willem Cornelia Maria Van Eijck
  • Substrate placement in immersion lithography
    Patent number: 9740106
    Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
    Type: Grant
    Filed: November 3, 2015
    Date of Patent: August 22, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Christiaan Alexander Hoogendam, Gerrit Johannes Nijmeijer, Minne Cuperus, Petrus Anton Willem Cornelia Maria Van Eijck
  • SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY
    Publication number: 20160054665
    Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
    Type: Application
    Filed: November 3, 2015
    Publication date: February 25, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christiaan Alexander HOOGENDAM, Gerrit Johannes NIJMEIJER, Minne CUPERUS, Petrus Anton Willem Cornelia Maria VAN EIJCK
  • Substrate placement in immersion lithography
    Patent number: 9182222
    Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
    Type: Grant
    Filed: November 8, 2012
    Date of Patent: November 10, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Christiaan Alexander Hoogendam, Gerrit Johannes Nijmeijer, Minne Cuperus, Petrus Anton Willem Cornelia Maria Van Eijck
  • SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY
    Publication number: 20130182231
    Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
    Type: Application
    Filed: November 8, 2012
    Publication date: July 18, 2013
    Applicant: ASML Netherlands B.V.
    Inventors: Christiaan Alexander Hoogendam, Gerrit Johannes Nijmeijer, Minne Cuperus, Petrus Anton Willem Cornelia Maria Van Eijck
  • Substrate placement in immersion lithography
    Patent number: 8441617
    Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
    Type: Grant
    Filed: November 3, 2011
    Date of Patent: May 14, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Christiaan Alexander Hoogendam, Gerrit Johannes Nijmeijer, Minne Cuperus, Petrus Anton Willem Cornelia Maria Van Eijck
  • SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY
    Publication number: 20120050740
    Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
    Type: Application
    Filed: November 3, 2011
    Publication date: March 1, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: CHRISTIAAN ALEXANDER HOOGENDAM, Gerrit Johannes Nijmeijer, Minne Cuperus, Petrus Anton Willem Cornelia Maria Van Eijck
  • Object Alignment Measurement Method and Apparatus
    Publication number: 20110013188
    Abstract: A lithographic apparatus includes apparatus for measuring the alignment of an object. The measuring apparatus includes a plurality of alignment sensors, each including an alignment detector for measuring the position of an alignment mark over an alignment detection area. The measuring apparatus further includes a leveling sensor for measuring the height and/or tilt of an object in a leveling sensor detection area, and a feed-forward connection between said leveling sensor and said alignment sensors.
    Type: Application
    Filed: July 16, 2010
    Publication date: January 20, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Daan Maurits SLOTBOOM, Petrus Anton Willem Cornelia Maria Van Eijck
  • Substrate placement in immersion lithography
    Patent number: 7352440
    Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
    Type: Grant
    Filed: December 10, 2004
    Date of Patent: April 1, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Christiaan Alexander Hoogendam, Gerrit Johannes Nijmeijer, Minne Cuperus, Petrus Anton Willem Cornelia Maria Van Eijck