Patents by Inventor Petrus Johannes Maria Broodbakker

Petrus Johannes Maria Broodbakker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, level sensor, method of inspection, device manufacturing method, and device manufactured thereby
    Patent number: 7646471
    Abstract: A level sensor for a lithographic projection apparatus according to one embodiment of the invention includes a light source, a first reflector, a second reflector and a detector. The first reflector is positioned to direct light from the light source towards a wafer surface, and the second reflector is positioned to direct light reflected from the wafer surface to the detector. The first and second reflectors are selected to incur a minimal process dependent apparent surface depression.
    Type: Grant
    Filed: June 15, 2007
    Date of Patent: January 12, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Paulus Antonius Andreas Teunissen, Petrus Johannes Maria Broodbakker, Rene Marinus Gerardus Johan Queens
  • Lithographic apparatus, level sensor, method of inspection, device manufacturing method, and device manufactured thereby
    Patent number: 7248337
    Abstract: A level sensor for a lithographic projection apparatus according to one embodiment of the invention includes a light source, a first reflector, a second reflector and a detector. The first reflector is positioned to direct light from the light source towards a wafer surface, and the second reflector is positioned to direct light reflected from the wafer surface to the detector. The first and second reflectors are selected to incur a minimal process dependent apparent surface depression.
    Type: Grant
    Filed: January 14, 2004
    Date of Patent: July 24, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Paulus Antonius Andreas Teunissen, Petrus Johannes Maria Broodbakker, Rene Marinus Gerardus Johan Queens
  • Off-axis leveling in lithographic projection apparatus
    Patent number: 6924884
    Abstract: In an off-axis leveling procedure a height map of a mask is generated at a measurement station. The height map is referenced to a physical reference surface of a mask support. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of the mask support to position the exposure area on the mask in best focus during exposure.
    Type: Grant
    Filed: October 14, 2003
    Date of Patent: August 2, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Marcus Emile Joannes Boonman, Petrus Johannes Maria Broodbakker, Gerrit Johannes Nijmeijer, Mingcheng Zong, Jozef Cornelus Antonius Roijers
  • Lithographic apparatus, level sensor, method of inspection, device manufacturing method, and device manufactured thereby
    Publication number: 20040165169
    Abstract: A level sensor for a lithographic projection apparatus according to one embodiment of the invention includes a light source, a first reflector, a second reflector and a detector. The first reflector is positioned to direct light from the light source towards a wafer surface, and the second reflector is positioned to direct light reflected from the wafer surface to the detector. The first and second reflectors are selected to incur a minimal process dependent apparent surface depression.
    Type: Application
    Filed: January 14, 2004
    Publication date: August 26, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Paulus Antonius Andreas Teunissen, Petrus Johannes Maria Broodbakker, Rene Marinus Gerardus Johan Queens
  • Off-axis levelling in lithographic projection apparatus
    Publication number: 20040130691
    Abstract: In an off-axis leveling procedure a height map of a mask is generated at a measurement station. The height map is referenced to a physical reference surface of a mask support. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of the mask support to position the exposure area on the mask in best focus during exposure.
    Type: Application
    Filed: October 14, 2003
    Publication date: July 8, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marcus Emile Joannes Boonman, Petrus Johannes Maria Broodbakker, Gerrit Johannes Nijmeijer, Mingcheng Zong, Jozef Cornelus Antonius Roijers