Patents by Inventor Petrus Marinus Christianus Maria Van Der Biggelaar

Petrus Marinus Christianus Maria Van Der Biggelaar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Modulated lithographic beam to reduce sensitivity to fluctuating scanning speed
    Patent number: 7016013
    Abstract: A lithographic apparatus capable of reducing sensitivity to fluctuating scanning speed and improve lithographic scanning processing time, is presented herein. In one embodiment, the apparatus comprises a modulator that modulates a patterned lithographic beam based on the scanning speed as the beam and substrate move relative to each other. The modulator is configured to modulate an attribute of a patterned lithographic beam, such as, the intensity or size of the beam.
    Type: Grant
    Filed: January 13, 2004
    Date of Patent: March 21, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Petrus Marinus Christianus Maria Van Der Biggelaar, Henrikus Herman Marie Cox, Johannes Heintze, Tim Tso
  • Modulated lithographic beam to reduce sensitivity to fluctuating scanning speed
    Publication number: 20050151946
    Abstract: A lithographic apparatus capable of reducing sensitivity to fluctuating scanning speed and improve lithographic scanning processing time, is presented herein. In one embodiment, the apparatus comprises a modulator that modulates a patterned lithographic beam based on the scanning speed as the beam and substrate move relative to each other. The modulator is configured to modulate an attribute of a patterned lithographic beam, such as, the intensity or size of the beam.
    Type: Application
    Filed: January 13, 2004
    Publication date: July 14, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Petrus Marinus Christianus Maria Van Der Biggelaar, Henrikus Herman Marie Cox, Johannes Heintze, Tim Tso