Patents by Inventor Petrus Martinus Gerardus Johannes Arts
Petrus Martinus Gerardus Johannes Arts has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11086239Abstract: A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.Type: GrantFiled: March 13, 2019Date of Patent: August 10, 2021Assignee: ASML Netherlands B.V.Inventors: Miao Yu, Petrus Martinus Gerardus Johannes Arts, Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Maarten Holtrust, Han Henricus Aldegonda Lempens, Ferdy Migchelbrink, Theodorus Wilhelmus Polet, Gheorghe Tanasa
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Patent number: 10725390Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.Type: GrantFiled: January 16, 2019Date of Patent: July 28, 2020Assignee: ASML Netherlands B.V.Inventors: Seerwan Saeed, Petrus Martinus Gerardus Johannes Arts, Harold Sebastiaan Buddenberg, Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Floor Lodewijk Keukens, Ferdy Migchelbrink, Jeroen Arnoldus Leonardus Johannes Raaymakers, Arnoldus Johannes Martinus Jozeph Ras, Gheorghe Tanasa, Jimmy Matheus Wilhelmus Van De Winkel, Daan Daniel Johannes Antonius Van Sommeren, Marijn Wouters, Miao Yu
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Publication number: 20190146352Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.Type: ApplicationFiled: January 16, 2019Publication date: May 16, 2019Applicant: ASML Netherlands B.V.Inventors: Seerwan Saeed, Petrus Martinus Gerardus Johannes Arts, Harold Sebastiaan Buddenberg, Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Floor Lodewijk Keukens, Ferdy Migchelbrink, Jeroen Arnoldus Leonardus Johannes Raaymakers, Arnoldus Johannes Martinus Jozeph Ras, Gheorghe Tanasa, Jimmy Matheus Wilhelmus Van De Winkel, Daan Daniel Johannes Antonius Van Sommeren, Marijn Wouters, Miao Yu
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Patent number: 10216100Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.Type: GrantFiled: June 16, 2016Date of Patent: February 26, 2019Assignee: ASML Netherlands B.V.Inventors: Seerwan Saeed, Petrus Martinus Gerardus Johannes Arts, Harold Sebastiaan Buddenberg, Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Floor Lodewijk Keukens, Ferdy Migchelbrink, Jeroen Arnoldus Leonardus Johannes Raaymakers, Arnoldus Johannes Martinus Jozeph Ras, Gheorghe Tanasa, Jimmy Matheus Wilhelmus Van De Winkel, Daan Daniel Johannes Antonius Van Sommeren, Marijn Wouters, Miao Yu
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Publication number: 20180181004Abstract: An inspection substrate for inspecting a component, e.g. a liquid confinement system, of an apparatus for processing production substrates, e.g. a lithographic apparatus, the inspection substrate comprising: a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus; an illumination device, e.g. light emitting diodes, embedded in the body; a sensor, e.g. an imaging device or a pressure sensor, for generating inspection information relating to a parameter of a component of the apparatus proximate to the inspection substrate, the sensor embedded in the body; and a storage device embedded in the body, the storage device configured to store the inspection information, e.g. image data.Type: ApplicationFiled: June 16, 2016Publication date: June 28, 2018Applicant: ASML Netherlands B.V.Inventors: Seerwan SAEED, Petrus Martinus Gerardus Johannes ARTS, Harold Sebastiaan BUDDENBERG, Erik Henricus Egidius Catharina EUMMELEN, Giovanni Luca GATTOBIGIO, Floor Lodewijk KEUKENS, Ferdy MIGCHELBRINK, Jeroen Arnoldus Leonardus Johanne RAAYMAKERS, Arnoldus Johannes Martinus Jozeph RAS, Gheorghe TANASA, Jimmy Matheus Wilhelmus VAN DE WINKEL, Daan Daniel Johannes Antonius VAN SOMMEREN, Marijn WOUTERS, Miao YU
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Patent number: 8405819Abstract: In an all-wet immersion lithographic apparatus, the immersion liquid is allowed to flow off an edge of the substrate table. The immersion liquid is moved with the substrate table during exposure. The motion of the immersion liquid may result in a disturbance and/or de-wetting. A geometry of the substrate table is proposed that may reduce such a disturbance and/or de-wetting. The cross-sectional edge profile of the substrate table and/or the plan shape of the substrate table are considered.Type: GrantFiled: May 6, 2010Date of Patent: March 26, 2013Assignee: ASML Netherlands B.V.Inventors: Laurentius Johannes Adrianus Van Bokhoven, Nicolaas Ten Kate, Raymond Wilhelmus Louis Lafarre, Henricus Jozef Castelijns, Petrus Martinus Gerardus Johannes Arts
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Publication number: 20100283981Abstract: In an all-wet immersion lithographic apparatus, the immersion liquid is allowed to flow off an edge of the substrate table. The immersion liquid is moved with the substrate table during exposure. The motion of the immersion liquid may result in a disturbance and/or de-wetting. A geometry of the substrate table is proposed that may reduce such a disturbance and/or de-wetting. The cross-sectional edge profile of the substrate table and/or the plan shape of the substrate table are considered.Type: ApplicationFiled: May 6, 2010Publication date: November 11, 2010Applicant: ASML Netherlands B.V.Inventors: Laurentius Johannes Adrianus Van Bokhoven, Nicolaas Ten Kate, Raymond Wilhelmus Louis Lafarre, Henricus Jozef Castelijns, Petrus Martinus Gerardus Johannes Arts
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Publication number: 20090296068Abstract: A table is disclosed in which an opening is provided for the provision of immersion fluid onto a top surface of the table. In an embodiment, there are two such openings. The first of the openings surrounds a substrate support of the table and the second of the openings extends around an outer edge of the table.Type: ApplicationFiled: June 1, 2009Publication date: December 3, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Henricus Jozef CASTELIJNS, Nicolaas Ten Kate, Sergei Shulepov, Petrus Martinus Gerardus Johannes Arts