Patents by Inventor Petrus Matthijs Henricus Vosters

Petrus Matthijs Henricus Vosters has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20040061844
    Abstract: A linear seal seals over a slot formed in a wall of a vacuum chamber of a lithographic projection apparatus. The linear seal includes an elongate sealing member which is locally displaced from the slot at a selectable position such that conduits may pass from outside of the vacuum chamber to the inside of the vacuum chamber at the local displacement of the elongate sealing member.
    Type: Application
    Filed: June 11, 2003
    Publication date: April 1, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Petrus Matthijs Henricus Vosters, Hernes Jacobs, Harmen Klaas Van Der Schoot, Peter Rutgers
  • Lithographic apparatus, device manufacturing method, and device manufactured thereby
    Publication number: 20040031932
    Abstract: A lithographic projection apparatus in which a vacuum chamber provided with a vacuum generator constructed and arranged to generate a vacuum beam path for the projection beam, wherein the apparatus is provided with a collision protection apparatus for reducing the effects of a collision of an object table with the wall of the vacuum chamber or with another object table. These collisions may occur during a power failure or an error in a programmed control logic in a controller of the apparatus.
    Type: Application
    Filed: June 11, 2003
    Publication date: February 19, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Petrus Matthijs Henricus Vosters, Hernes Jacobs, Mark Van Heumen, Nicolaas Rudolf Kemper
  • Lithographic apparatus and device manufacturing method
    Publication number: 20040008331
    Abstract: A lithographic projection apparatus in which a reaction force is generated between a balance mass and a substrate table. The balance mass is elastically coupled to the base frame with a suspension eigenfrequency of between 0.3 and 10 Hz.
    Type: Application
    Filed: June 5, 2003
    Publication date: January 15, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Henrikus Herman Marie Cox, Robertus Nicodemus Jacobus Van Ballegoij, Petrus Matthijs Henricus Vosters, Sven Antoin Johan Hol, Sebastiaan Maria Johannes Cornelissen
  • Lithographic apparatus and device manufacturing method
    Publication number: 20030132400
    Abstract: A lithographic projection apparatus, in which movement of a substrate table in a plane is accomplished by a planar magnetic positioning device, has a mechanical limiter that limits rotation of the substrate table about a direction orthogonal to the plane.
    Type: Application
    Filed: December 9, 2002
    Publication date: July 17, 2003
    Applicant: ASML NETHERLANDS, B.V.
    Inventors: Hernes Jacobs, Harmen Klaas Van Der Schoot, Petrus Matthijs Henricus Vosters, Ton De Groot