Patents by Inventor Petrus T. Appelman

Petrus T. Appelman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6218722
    Abstract: An improved antifuse which employs the base-emitter junction of a silicided single polysilicon bipolar transistor. The distance between the base metal and emitter metal is shortened and results from self aligning process steps rather than lithographic steps, resulting in a lower and better controlled programming voltage, programming energy and ON state resistance. Typically the conductive filament formed in the new antifuse is about 0.65 microns long and is formed by a voltage pulse having a relatively slow rise time (e.g. 150 microseconds), resulting in improved properties which provide advantages in circuit design and in manufacturing circuits using the new antifuse.
    Type: Grant
    Filed: June 29, 1999
    Date of Patent: April 17, 2001
    Assignee: Gennum Corporation
    Inventors: Andrew V. C. Cervin-Lawry, James D. Kendall, Petrus T. Appelman, Efim Roubakha
  • Patent number: 5920771
    Abstract: An improved antifuse which employs the base-emitter junction of a silicided single polysilicon bipolar transistor. The distance between the base metal and emitter metal is shortened and results from self aligning process steps rather than lithographic steps, resulting in a lower and better controlled programming voltage, programming energy and ON state resistance. Typically the conductive filament formed in the new antifuse is about 0.65 microns long and is formed by a voltage pulse having a relatively slow rise time (e.g. 150 microseconds), resulting in improved properties which provide advantages in circuit design and in manufacturing circuits using the new antifuse.
    Type: Grant
    Filed: March 17, 1997
    Date of Patent: July 6, 1999
    Assignee: Gennum Corporation
    Inventors: Petrus T. Appelman, Andrew V. C. Cervin-Lawry, James D. Kendall, Efim Roubakha