Patents by Inventor Pey-Yuan Lee

Pey-Yuan Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Manufacturing method for microelectronic device
    Patent number: 7196006
    Abstract: A method of manufacturing a microelectronic device, including performing a first inspection of a device feature during an intermediate stage of manufacture, cleaning the device feature after the first inspection, and performing a second inspection of the device feature after cleaning the device feature.
    Type: Grant
    Filed: April 13, 2004
    Date of Patent: March 27, 2007
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Pey-Yuan Lee, Feng-Liang Lai, Cheng-Kuo Chu, Chi-Shen Lo
  • Carryover reduction in multiple CDSEM line matching
    Publication number: 20050224995
    Abstract: A method of manufacturing a microelectronic device, including performing a first inspection of a device feature during an intermediate stage of manufacture, cleaning the device feature after the first inspection, and performing a second inspection of the device feature after cleaning the device feature.
    Type: Application
    Filed: April 13, 2004
    Publication date: October 13, 2005
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Pey-Yuan Lee, Feng-Liang Lai, Cheng-Kuo Chu, Chi-Shen Lo
  • Linewidth measurement tool calibration method employing linewidth standard
    Patent number: 6862545
    Abstract: A method for calibrating a linewidth measurement tool and a system for calibrating the linewidth measurement tool each employ a correction of a series of periodic actual measurements of at least one single measurement location of a topographic feature within a linewidth standard with an exponentially weighted moving average of a series of deviations of the series of periodic actual measurements from a corresponding series of regressed data points derived from mathematical regression of the series of periodic actual measurements. Such a correction provides for a more accurate calibration of the linewidth measurement tool and a more accurate measurement of linewidths within microelectronic products while employing the calibrated linewidth measurement tool.
    Type: Grant
    Filed: April 3, 2003
    Date of Patent: March 1, 2005
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Pey-Yuan Lee, Hong-Ji Yang, Yi-Hung Chen, Chi-Shen Lo, Chen-Ning Fuh, Wen-Chung Lee
  • Method for improved dielectric layer metrology calibration
    Patent number: 6710889
    Abstract: A method for measuring a dielectric layer thickness calibration reference standard including providing a substrate having a dielectric layer for calibrating a dielectric layer thickness measuring tool; cleaning the dielectric layer according to a cleaning process including at least one of spraying and scrubbing; and, measuring the thickness of the dielectric layer with the dielectric layer thickness measuring tool including at least one portion of the dielectric layer displaced from the substrate center.
    Type: Grant
    Filed: July 2, 2002
    Date of Patent: March 23, 2004
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Pey-Yuan Lee, Chi-Shen Lo, Sian-Ren Horng, Han-Liang Tseng, Wei-Ming You, Yi-Hung Chen
  • METHOD FOR IMPROVED DIELECTRIC LAYER METROLOGY CALIBRATION
    Publication number: 20040004730
    Abstract: A method for measuring a dielectric layer thickness calibration reference standard including providing a substrate having a dielectric layer for calibrating a dielectric layer thickness measuring tool; cleaning the dielectric layer according to a cleaning process including at least one of spraying and scrubbing; and, measuring the thickness of the dielectric layer with the dielectric layer thickness measuring tool including at least one portion of the dielectric layer displaced from the substrate center.
    Type: Application
    Filed: July 2, 2002
    Publication date: January 8, 2004
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Pey-Yuan Lee, Chi-Shen Lo, Shean-Ren Horng, Han-Liang Tseng, Wei-Ming You, Yi-Hung Chen