Patents by Inventor Phil M. Salzman
Phil M. Salzman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6599076Abstract: A workpiece loading interface is included within a workpiece processing system which processes workpieces, typically wafers, in a vacuum. The workpiece loading interface includes two separate chambers. Each chamber may be separately pumped down. Thus, while a first cassette of wafers, from a first chamber is being accessed, a second cassette of wafers may be loaded in the second chamber and the second chamber pumped down. Each chamber is designed to minimize intrusion to a clean room. Thus a door to each chamber has a mechanism which, when opening the door, first moves the door slightly away from an opening in the chamber and then the door is moved down parallel to the chamber. After the door is opened, a cassette of wafers is lowered through the opening in a motion much like a drawbridge. The cassette may be pivoted within the chamber when the position from which wafers are accessed from the cassette differs from the position from which the cassette is lowered out of the chamber.Type: GrantFiled: August 19, 2002Date of Patent: July 29, 2003Assignee: Applied Materials, Inc.Inventors: Masato M. Toshima, Phil M. Salzman, Steven C. Murdoch, Cheng Wang, Mark A. Stenholm, James Howard, Leonard Hall
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Publication number: 20030002959Abstract: A workpiece loading interface is included within a workpiece processing system which processes workpieces, typically wafers, in a vacuum. The workpiece loading interface includes two separate chambers. Each chamber may be separately pumped down. Thus, while a first cassette of wafers, from a first chamber is being accessed, a second cassette of wafers may be loaded in the second chamber and the second chamber pumped down. Each chamber is designed to minimize intrusion to a clean room. Thus a door to each chamber has a mechanism which, when opening the door, first moves the door slightly away from an opening in the chamber and then the door is moved down parallel to the chamber. After the door is opened, a cassette of wafers is lowered through the opening in a motion much like a drawbridge. The cassette may be pivoted within the chamber when the position from which wafers are accessed from the cassette differs from the position from which the cassette is lowered out of the chamber.Type: ApplicationFiled: August 19, 2002Publication date: January 2, 2003Inventors: Masato M. Toshima, Phil M. Salzman, Steven C. Murdoch, Cheng Wang, Mark A. Stenholm, James Howard, Leonard Hall
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Publication number: 20030002960Abstract: A workpiece loading interface is included within a workpiece processing system which processes workpieces, typically wafers, in a vacuum. The workpiece loading interface includes two separate chambers. Each chamber may be separately pumped down. Thus, while a first cassette of wafers, from a first chamber is being accessed, a second cassette of wafers may be loaded in the second chamber and the second chamber pumped down. Each chamber is designed to minimize intrusion to a clean room. Thus a door to each chamber has a mechanism which, when opening the door, first moves the door slightly away from an opening in the chamber and then the door is moved down parallel to the chamber. After the door is opened, a cassette of wafers is lowered through the opening in a motion much like a drawbridge. The cassette may be pivoted within the chamber when the position from which wafers are accessed from the cassette differs from the position from which the cassette is lowered out of the chamber.Type: ApplicationFiled: August 19, 2002Publication date: January 2, 2003Inventors: Masato M. Toshima, Phil M. Salzman, Steven C. Murdoch, Cheng Wang, Mark A. Stenholm, James Howard, Leonard Hall
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Patent number: 6454508Abstract: A workpiece loading interface is included within a workpiece processing system which processes workpieces, typically wafers, in a vacuum. The workpiece loading interface includes two separate chambers. Each chamber may be separately pumped down. Thus, while a first cassette of wafers, from a first chamber is being accessed, a second cassette of wafers may be loaded in the second chamber and the second chamber pumped down. Each chamber is designed to minimize intrusion to a clean room. Thus a door to each chamber has a mechanism which, when opening the door, first moves the door slightly away from an opening in the chamber and then the door is moved down parallel to the chamber. After the door is opened, a cassette of wafers is lowered through the opening in a motion much like a drawbridge. The cassette may be pivoted within the chamber when the position from which wafers are accessed from the cassette differs from the position from which the cassette is lowered out of the chamber.Type: GrantFiled: May 1, 1998Date of Patent: September 24, 2002Assignee: Applied Materials, Inc.Inventors: Masato M. Toshima, Phil M. Salzman, Steven C. Murdoch, Cheng Wang, Mark A. Stenholm, James Howard, Leonard Hall
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Patent number: 6454519Abstract: A workpiece loading interface is included within a workpiece processing system which processes workpieces, typically wafers, in a vacuum. The workpiece loading interface includes two separate chambers. Each chamber may be separately pumped down. Thus, while a first cassette of wafers, from a first chamber is being accessed, a second cassette of wafers may be loaded in the second chamber and the second chamber pumped down. Each chamber is designed to minimize intrusion to a clean room. Thus a door to each chamber has a mechanism which, when opening the door, first moves the door slightly away from an opening in the chamber and then the door is moved down parallel to the chamber. After the door is opened, a cassette of wafers is lowered through the opening in a motion much like a drawbridge. The cassette may be pivoted within the chamber when the position from which wafers are accessed from the cassette differs from the position from which the cassette is lowered out of the chamber.Type: GrantFiled: March 7, 1997Date of Patent: September 24, 2002Assignee: Applied Materials, Inc.Inventors: Masato M. Toshima, Phil M. Salzman, Steven C. Murdoch, Cheng Wang, Mark A. Stenholm, James Howard, Leonard Hall, David Cheng
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Publication number: 20010014266Abstract: A workpiece loading interface is included within a workpiece processing system which processes workpieces, typically wafers, in a vacuum. The workpiece loading interface includes two separate chambers. Each chamber may be separately pumped down. Thus, while a first cassette of wafers, from a first chamber is being accessed, a second cassette of wafers may be loaded in the second chamber and the second chamber pumped down. Each chamber is designed to minimize intrusion to a clean room. Thus a door to each chamber has a mechanism which, when opening the door, first moves the door slightly away from an opening in the chamber and then the door is moved down parallel to the chamber. After the door is opened, a cassette of wafers is lowered through the opening in a motion much like a drawbridge. The cassette may be pivoted within the chamber when the position from which wafers are accessed from the cassette differs from the position from which the cassette is lowered out of the chamber.Type: ApplicationFiled: May 1, 1998Publication date: August 16, 2001Inventors: MASATO M. TOSHIMA, PHIL M. SALZMAN, STEVEN C. MURDOCH, CHENG WANG, MARK A. STENHOLM, JAMES HOWARD, LEONARD HALL
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Patent number: 5769588Abstract: A workpiece loading interface is included within a workpiece processing system which processes workpieces, typically wafers, in a vacuum. The workpiece loading interface includes two separate chambers. Each chamber may be separately pumped down. Thus, while a first cassette of wafers, from a first chamber is being accessed, a second cassette of wafers may be loaded in the second chamber and the second chamber pumped down. Each chamber is designed to minimize intrusion to a clean room. Thus a door to each chamber has a mechanism which, when opening the door, first moves the door slightly away from an opening in the chamber and then the door is moved down parallel to the chamber. After the door is opened, a cassette of wafers is lowered through the opening in a motion much like a drawbridge. The cassette may be pivoted within the chamber when the position from which wafers are accessed from the cassette differs from the position from which the cassette is lowered out of the chamber.Type: GrantFiled: August 20, 1996Date of Patent: June 23, 1998Assignee: Applied Materials, Inc.Inventors: Masato M. Toshima, Phil M. Salzman, Steven C. Murdoch, Cheng Wang, Mark A. Stenholm, James Howard, Leonard Hall, David Cheng
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Patent number: 5753044Abstract: An inductively coupled RF plasma reactor for processing semiconductor wafer includes a reactor chamber having a side wall and a ceiling, a wafer pedestal for supporting the wafer in the chamber, an RF power source, apparatus for introducing a processing gas into the reactor chamber, and a coil inductor adjacent the reactor chamber connected to the RF power source, the coil inductor including (a) a side section facing a portion of the side wall and including a bottom winding and a top winding, the top winding being at a height corresponding at least approximately to a top height of the ceiling, and (b) a top section extending radially inwardly from the top winding of the side section so as to overlie at least a substantial portion of the ceiling.Type: GrantFiled: February 15, 1995Date of Patent: May 19, 1998Assignee: Applied Materials, Inc.Inventors: Hiroji Hanawa, Gerald Zheyao Yin, Diana X. Ma, Phil M. Salzman, Peter Loewenhardt, Allen Zhao
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Patent number: 5525759Abstract: A feedthrough extending through the wall of an enclosure includes a body portion having a stem portion extending through the wall and a head portion abutting against the wall. The feedthrough assembly further includes a seal member and a biasing member to bias at least a portion of the head against the seal member. The body portion may be conductive, to form an electric current path through the wall of the enclosure, or may form a non-conductive passage to route a feed member, such as an optic cable, or tubular gas or liquid supply conduits, into the enclosure.Type: GrantFiled: April 19, 1994Date of Patent: June 11, 1996Inventor: Phil M. Salzman
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Patent number: 5186594Abstract: A workpiece loading interface is included within a workpiece processing system which processes workpieces, typically wafers, in a vacuum. The workpiece loading interface includes two separate chambers. Each chamber may be separately pumped down. Thus, while a first cassette of wafers, from a first chamber is being accessed, a second cassette of wafers may be loaded in the second chamber and the second chamber pumped down. Each chamber is designed to minimize intrusion to a clean room. Thus a door to each chamber has a mechanism which, when opening the door, first moves the door slightly away from an opening in the chamber and then the door is moved down parallel to the chamber. After the door is opened, a cassette of wafers is lowered through the opening in a motion much like a drawbridge. The cassette may be pivoted within the chamber when the position from which wafers are accessed from the cassette differs from the position from which the cassette is lowered out of the chamber.Type: GrantFiled: April 19, 1990Date of Patent: February 16, 1993Assignee: Applied Materials, Inc.Inventors: Masato M. Toshima, Phil M. Salzman, Steven C. Murdoch, Cheng Wang, Mark A. Stenholm, James Howard, Leonard Hall, David Cheng