Abstract: A workpiece loading interface is included within a workpiece processing system which processes workpieces, typically wafers, in a vacuum. The workpiece loading interface includes two separate chambers. Each chamber may be separately pumped down. Thus, while a first cassette of wafers, from a first chamber is being accessed, a second cassette of wafers may be loaded in the second chamber and the second chamber pumped down. Each chamber is designed to minimize intrusion to a clean room. Thus a door to each chamber has a mechanism which, when opening the door, first moves the door slightly away from an opening in the chamber and then the door is moved down parallel to the chamber. After the door is opened, a cassette of wafers is lowered through the opening in a motion much like a drawbridge. The cassette may be pivoted within the chamber when the position from which wafers are accessed from the cassette differs from the position from which the cassette is lowered out of the chamber.

Abstract: Disclosed is an apparatus and method for transporting objects between process chambers, and for transferring objects to and from process chambers with minimal handoff operations. The invention discloses a trolley type system (rail and car) for moving an external magnet adjacent a transfer chamber so as to cause corresponding movement of an object transport device contained within the transfer chamber, via magnetic coupling. In one aspect, the object transport device is a blade type device that may transfer the object directly into a process chamber, and in a second aspect the object transport device is a telescoping type device that may extend between transport planes and chamber load/unload planes. A further aspect of the invention includes the networking of numerous transport and processing systems. A network node is provided that has rotatably mounted rails for altering the direction of the trolley car's movement.

Abstract: An improved particle monitoring sensor is described which uses a variety of techniques to prolong the effective life of the optical surfaces within the particle monitoring'sensor. Substantially inert purging gas is directed over the particle monitoring sensor windows, which are normally exposed to a harsh operating environment. The surfaces of these windows are heated by heating elements in direct thermal contact with the windows. In addition, a restrictive slit is placed over the detector window to reduce the exposed area and to increase the velocity of gas flowing over the window surface. While this slit reduces the detector's field of view, the signal loss is reduced by using a linearly polarized light source and aligning the elongated slit's major axis with the direction of polarization.

Abstract: Apparatus for lifting a wafer, or other such workpiece, from the surface of pedestal in a semiconductor wafer processing system. More specifically, the apparatus relates to a lift pin that is guided by a guide bushing and a guide pin. Preferably, the lift pin is hollow and is slideably engaged with a guide pin. The guide pin is fixed relative to the pedestal and coaxially aligned with a lift pin bore in the pedestal. An actuator drives the lift pin along the guide pin from a fully retracted lift pin position to a fully extended lift pin position. A guide bushing, located in the pedestal proximate the lift pin, also guides the lift pin as the pin passes through the lift pin bore. The guide bushing forms a lip seal between the lift pin and the pedestal. Furthermore, a bellows surrounding the lift pin and the guide pin, can also be used to preserve the integrity of the chamber environment.

Abstract: An improved particle monitoring sensor is described which uses a variety of techniques to prolong the effective life of the optical surfaces within the particle monitoring sensor. Substantially inert purging gas is directed over the particle monitoring sensor windows, which are normally exposed to a harsh operating environment. The surfaces of these windows are heated by heating elements in direct thermal contact with the windows. In addition, a restrictive slit is placed over the detector window to reduce the exposed area and to increase the velocity of gas flowing over the window surface. While this slit reduces the detector's field of view, the signal loss is reduced by using a linearly polarized light source and aligning the elongated slit's major axis with the direction of polarization.

Abstract: An improved particle monitoring sensor is described which uses a variety of techniques to prolong the effective life of the optical surfaces within the particle monitoring sensor. Substantially inert purging gas is directed over the particle monitoring sensor windows, which are normally exposed to a harsh operating environment. The surfaces of these windows are heated by heating elements in direct thermal contact with the windows. In addition, a restrictive slit is placed over the detector window to reduce the exposed area and to increase the velocity of gas flowing over the window surface. While this slit reduces the detector's field of view, the signal loss is reduced by using a linearly polarized light source and aligning the elongated slit's major axis with the direction of polarization.